High-conductivity p-type transparent copper aluminum oxide film prepared by plasma-enhanced MOCVD (Englisch)
- Neue Suche nach: Wang, Y.
- Neue Suche nach: Gong, H.
- Neue Suche nach: Wang, Y.
- Neue Suche nach: Gong, H.
In:
Advanced Materials, Weinheim
;
12
, 22
;
285-288
;
2000
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ISSN:
- Aufsatz (Zeitschrift) / Print
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Titel:High-conductivity p-type transparent copper aluminum oxide film prepared by plasma-enhanced MOCVD
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Beteiligte:
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Erschienen in:Advanced Materials, Weinheim ; 12, 22 ; 285-288
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Verlag:
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Erscheinungsdatum:2000
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Format / Umfang:4 Seiten, 3 Bilder, 2 Tabellen, 12 Quellen
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ISSN:
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Coden:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Print
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Sprache:Englisch
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Schlagwörter:
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Datenquelle:
Inhaltsverzeichnis – Band 12, Ausgabe 22
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High-conductivity p-type transparent copper aluminum oxide film prepared by plasma-enhanced MOCVDWang, Y. / Gong, H. et al. | 2000
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