0.5 mu m GaAs metal semiconductor field effect transistor circuit fabrication using single layer I-line photoresists (Englisch)
- Neue Suche nach: Pomerene, A.T.S.
- Neue Suche nach: Greiner, J.H.
- Neue Suche nach: Connolly, J.J.
- Neue Suche nach: Pomerene, A.T.S.
- Neue Suche nach: Greiner, J.H.
- Neue Suche nach: Connolly, J.J.
In:
35th International Symposium on Electron, Ion and Photon Beams, 28-31 May 1991, Seattle, WA, USA
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2898-2903
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1991
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ISSN:
- Aufsatz (Zeitschrift) / Print
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Titel:0.5 mu m GaAs metal semiconductor field effect transistor circuit fabrication using single layer I-line photoresists
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Weitere Titelangaben:Herstellung einer 0,5-Mikrometer-GaAs-Metallhalbleiter-Feldeffekttransistorschaltung mittels einschichtiger I-Linien-Photoresists
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Beteiligte:
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Erschienen in:
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Verlag:
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Erscheinungsdatum:1991
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Format / Umfang:6 Seiten, 3 Quellen
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ISSN:
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DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Print
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Sprache:Englisch
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Schlagwörter:
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Datenquelle:
Inhaltsverzeichnis – Band 9, Ausgabe 6
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35th International Symposium on Electron, Ion and Photon Beams, 28-31 May 1991, Seattle, WA, USA| 1991
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Direct nanometer scale patterning of SiO2 with electron-beam irradiationAllee, D.R. / Umbach, C.P. / Broers, A.N. et al. | 1991
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Nanofabrication techniques for 100 nm-scale silicon metal oxide semiconductor field effect transistorReeves, C.M. / Hohn, F.J. / Wind, S.J. / Lii, Y.T. / Newman, T.H. / Bucchignano, J.J. / Klaus, D.P. / Chiong, K.N. et al. | 1991
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Fabrication of electroplated T gates with 60 nm gate length for pseudomorphic high electron mobility transistor devicesMarten, A. / Schneider, H. / Schweizer, H. / Nickel, H. / Schlapp, W. / Losch, R. / Dambkes, H. / Marschall, P. et al. | 1991
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First step towards application of high-temperature superconductors for planar magnetic lensesAdriaanse, J.P. / Mast, K.D. van der / Zuylen, P. van et al. | 1991
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Fabrication of sub-100-nm T gates with SiN passivation layerNummila, K. / Tong, M. / Ketterson, A.A. / Adesida, I. et al. | 1991
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High resolution patterning of high Tc superconductorsKern, D.P. / Lee, K.Y. / Laibowitz, R.B. / Gupta, A. et al. | 1991
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High quantum efficiency InGaAs/GaAs quantum wires defined by selective wet etchingGreus, C. / Forchel, A. / Straka, J. / Pieger, K. / Emmerling, M. et al. | 1991
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Full-water technology for large-scale laser processing and testingVoegeli, O. / Benedict, M.K. / Bona, G.L. / Buchmann, P. / Cahoon, N. / Datwyler, K. / Dietrich, H.P. / Moser, A. / Sasso, G. / Seitz, H.K. et al. | 1991
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Electric field coupling to quantum dot diodesRandall, J.N. / Seabaugh, A.C. / Kao, Y.C. / Luscombe, J.H. / Newell, B.L. et al. | 1991
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0.5 mu m GaAs metal semiconductor field effect transistor circuit fabrication using single layer I-line photoresistsPomerene, A.T.S. / Greiner, J.H. / Connolly, J.J. et al. | 1991
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Fabrication of 25 nm gold-bridges and observation of ballistic and quantum interference effectsLangheinrich, W. / Beneking, H. / Murek, U. / Braden, C. / Wohlleben, D. et al. | 1991
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Helium radio-frequency-plasma GaAs device isolation: application to an in-plane gated quantum wire transistorIngram, S.G. / Simpson, P.J. / Law, V.J. / Ritchie, D.A. / Jones, G.A.C. et al. | 1991
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Fabrication of open and buried quantum wires using a removable mask applicable for multiple processing stepsMenschig, A. / Kubler, P.A. / Prins, F.E. / Rudeloff, R. / Hommel, J. / Schweizer, H. et al. | 1991
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Low energy off-axis focused ion beam Ga+ implantation into SiSteckl, A.J. / Mogul, H.C. / Novak, S.W. / Magee, C.W. et al. | 1991
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Fabrication of sub-50 nm finger spacing and width high-speed metal-semiconductor-metal photodetectors using high-resolution electron beam lithography and molecular beam epitaxyChou, S.Y. / Yue Liu / Fischer, P.B. et al. | 1991
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100 kV Schottky electron gunMcGinn, J.B. / Swanson, L.W. / Martin, N.A. / Gesley, M.A. / McCord, M.A. / Viswanathan, R. / Hohn, F.J. / Wilson, A.D. / Naumann, R. / Utlaut, M. et al. | 1991
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High brightness limited area cathodesBroers, A. / Xia, S. / Maloney, C. / Xieqing Zhu / Munro, E. et al. | 1991
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Aberrations of electron focusing and deflection systems in the presence of three-dimensional perturbation fieldsRouse, J. / Xieqing Zhu / Munro, E. et al. | 1991
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Electron optics for high throughput electron beam lithography systemSohda, Y. / Nakayama, Y. / Saitou, N. / Itoh, H. / Todokoro, H. et al. | 1991
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A microwave eight-pole transmission line deflector for 100 keV electronsMulder, E.H. / Mast, K.D. van der / Tauritz, J.L. et al. | 1991
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MEBES IV thermal-field emission tandem optics for electron beam lithographyGesley, M. et al. | 1991
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Experimental evaluation of a scanning tunneling microscope-microlens systemMuray, I.P. / Staufer, U. / Bassous, E. / Kern, D.P. / Chang, T.H.P. et al. | 1991
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Investigation of emitter tips for scanning tunneling microscope-based microprobe systemsStaufer, U. / Muray, L.P. / Kern, D.P. / Chang, T.H.P. et al. | 1991
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Development of the field emission electron gun integrated in the sputter ion pumpYamazaki, Y. / Miyoshi, M. / Nagai, T. / Okumura, K. et al. | 1991
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A method of beam size approximation for field emission systemsSato, M. et al. | 1991
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On the design and effective strength of stigmators for electron beam lithographyGesley, M. / DeVore, W. et al. | 1991
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Advanced e-beam lithographyTakigawa, T. / Wada, H. / Ogawa, Y. / Yoshikawa, R. / Mori, I. / Abe, T. et al. | 1991
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Quantum lithographyMaluf, N.I. / Pease, R.F.W. et al. | 1991
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Preliminary analysis of electron-beam positioning errors in Lepton EBES4Waggener, H.A. / Peters, D.W. / Chen, G. / Rose, C.M. / Fowlis, D.C. / Chitayat, A. / Caracci, J. et al. | 1991
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Charging effects on trilevel resist and metal layer in electron-beam lithographyItoh, H. / Nakamura, K. / Hayakawa, H. et al. | 1991
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Proximity correction using computer aided proximity correction (CAPROX): evaluation and applicationHintermaier, M. / Hofmann, U. / Hubner, B. / Kalus, C.K. / Knapek, E. / Koops, H.W.P. / Schlager, R. / Seebald, E. / Weber, M. et al. | 1991
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Adaptive neural network algorithms for computing proximity effect correctionsFrye, R.C. et al. | 1991
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A low magnification focused ion beam system with 8 nm spot sizeKubena, R.L. / Ward, J.W. / Stratton, F.P. / Joyce, R.J. / Atkinson, G.M. et al. | 1991
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Control of diamond film microstructure by use of seeded focused ion beam crater arraysKirkpatrick, A.R. / Ward, B.W. et al. | 1991
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