Infrared spectroscopy of thin silicon dioxide on silicon (Englisch)
- Neue Suche nach: Olsen, J.A.
- Neue Suche nach: Shimura, F.
- Neue Suche nach: Olsen, J.A.
- Neue Suche nach: Shimura, F.
In:
Applied Physics Letters
;
53
, 20
;
1934-1936
;
1988
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ISSN:
- Aufsatz (Zeitschrift) / Print
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Titel:Infrared spectroscopy of thin silicon dioxide on silicon
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Weitere Titelangaben:Infrarotspektrometrie duenner Siliziumdioxidschichten auf Silizium
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Beteiligte:Olsen, J.A. ( Autor:in ) / Shimura, F. ( Autor:in )
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Erschienen in:Applied Physics Letters ; 53, 20 ; 1934-1936
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Verlag:
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Erscheinungsdatum:1988
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Format / Umfang:3 Seiten, 2 Bilder, 25 Quellen
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ISSN:
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DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Print
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Sprache:Englisch
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Schlagwörter:
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Datenquelle:
Inhaltsverzeichnis – Band 53, Ausgabe 20
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