A study on the adhesion of titanium nitride films produced by thermally activated chemical vapor deposition at low temperature (Koreanisch)
- Neue Suche nach: Min, W.S.
- Neue Suche nach: Park, J.I.
- Neue Suche nach: Lee, J.J.
- Neue Suche nach: Min, W.S.
- Neue Suche nach: Park, J.I.
- Neue Suche nach: Lee, J.J.
In:
Journal of the Korean Institute of Metals and Materials
;
33
, 8
;
1083-1090
;
1995
-
ISSN:
- Aufsatz (Zeitschrift) / Print
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Titel:A study on the adhesion of titanium nitride films produced by thermally activated chemical vapor deposition at low temperature
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Weitere Titelangaben:Eine Studie über die Adhäsion von durch thermisch aktiviertes chemisches Aufdampfen bei niedrigen Temperaturen erzeugten Titannitridfilmen
Titel koreanisch -
Beteiligte:
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Erschienen in:Journal of the Korean Institute of Metals and Materials ; 33, 8 ; 1083-1090
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Verlag:
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Erscheinungsdatum:1995
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Format / Umfang:8 Seiten, 11 Bilder, 3 Tabellen, 23 Quellen
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ISSN:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Print
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Sprache:Koreanisch
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Schlagwörter:
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Datenquelle:
Inhaltsverzeichnis – Band 33, Ausgabe 8
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