Achieving Superior Electrocatalytic Performance by Surface Copper Vacancy Defects during Electrochemical Etching Process (Englisch)
- Neue Suche nach: Guo, Niankun
- Neue Suche nach: Xue, Hui
- Neue Suche nach: Bao, Amurisana
- Neue Suche nach: Wang, Zihong
- Neue Suche nach: Sun, Jing
- Neue Suche nach: Song, Tianshan
- Neue Suche nach: Ge, Xin
- Neue Suche nach: Zhang, Wei
- Neue Suche nach: Huang, Keke
- Neue Suche nach: He, Feng
- Neue Suche nach: Wang, Qin
- Neue Suche nach: Guo, Niankun
- Neue Suche nach: Xue, Hui
- Neue Suche nach: Bao, Amurisana
- Neue Suche nach: Wang, Zihong
- Neue Suche nach: Sun, Jing
- Neue Suche nach: Song, Tianshan
- Neue Suche nach: Ge, Xin
- Neue Suche nach: Zhang, Wei
- Neue Suche nach: Huang, Keke
- Neue Suche nach: He, Feng
- Neue Suche nach: Wang, Qin
In:
Angewandte Chemie International Edition
;
59
, 33
;
13778-13784
;
2020
- Aufsatz (Zeitschrift) / Elektronische Ressource
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Titel:Achieving Superior Electrocatalytic Performance by Surface Copper Vacancy Defects during Electrochemical Etching Process
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Beteiligte:Guo, Niankun ( Autor:in ) / Xue, Hui ( Autor:in ) / Bao, Amurisana ( Autor:in ) / Wang, Zihong ( Autor:in ) / Sun, Jing ( Autor:in ) / Song, Tianshan ( Autor:in ) / Ge, Xin ( Autor:in ) / Zhang, Wei ( Autor:in ) / Huang, Keke ( Autor:in ) / He, Feng ( Autor:in )
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Erschienen in:Angewandte Chemie International Edition ; 59, 33 ; 13778-13784
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Verlag:
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Erscheinungsdatum:10.08.2020
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Format / Umfang:7 pages
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ISSN:
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DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Elektronische Ressource
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Sprache:Englisch
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Schlagwörter:
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Datenquelle:
Inhaltsverzeichnis – Band 59, Ausgabe 33
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Frontispiece: Achieving Superior Electrocatalytic Performance by Surface Copper Vacancy Defects during Electrochemical Etching ProcessGuo, Niankun / Xue, Hui / Bao, Amurisana / Wang, Zihong / Sun, Jing / Song, Tianshan / Ge, Xin / Zhang, Wei / Huang, Keke / He, Feng et al. | 2020