Erscheinungsjahr
Medientyp
Format
Lizenz
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Relationship between stochasticity and wavelength of exposure source in lithography
British Library Online Contents | 2014| -
Effect of photodecomposable quencher on latent image quality in extreme ultraviolet lithography
British Library Online Contents | 2014| -
Theoretical Study on Acid Diffusion Length in Chemically Amplified Resists Used for Extreme Ultraviolet Lithography (5 pages)
British Library Online Contents | 2013| -
Effect of Initial Dispersion of Protected Units on Line Edge Roughness of Chemically Amplified Extreme Ultraviolet Resists
British Library Online Contents | 2013| -
Theoretical Relationship between Quencher Diffusion Constant and Image Quality in Chemically Amplified Resists Used for Extreme Ultraviolet Lithography (5 pages)
British Library Online Contents | 2013| -
Effect of Molecular Weight and Protection Ratio on Latent Image Fluctuation of Chemically Amplified Extreme Ultraviolet Resists (4 pages)
British Library Online Contents | 2012| -
Stochastic Effect of Acid Catalytic Chain Reaction in Chemically Amplified Extreme Ultraviolet Resists (5 pages)
British Library Online Contents | 2012| -
Relationship between Absorption Coefficient and Line Edge Roughness of Chemically Amplified Resists Used for Extreme Ultraviolet Lithography
British Library Online Contents | 2012| -
Lower Limit of Line Edge Roughness in High-Dose Exposure of Chemically Amplified Extreme Ultraviolet Resists (5 pages)
British Library Online Contents | 2012| -
Lower Limit of Line Edge Roughness in High-Dose Exposure of Chemically Amplified Extreme Ultraviolet Resists (5 pages)
British Library Conference Proceedings | 2012| -
Bayesian optimization-based estimation of effective reaction radius of chemically amplified resist in acid catalyzed deprotection reaction
British Library Conference Proceedings | 2022| -
Review Accelerated Synthesis of Ceramics Powders by Solid-State Reaction in Water Vapor
British Library Online Contents | 2015| -
Facile preparation of core@shell and concentration-gradient spinel particles for Li-ion battery cathode materials
British Library Online Contents | 2015| -
Acid diffusion length in contact hole imaging of chemically amplified extreme ultraviolet resists
British Library Online Contents | 2014| -
Two-Dimensional Assembly Based on Flow Supramolecular Chemistry: Kinetic Control of Molecular Interactions Under Solvent Diffusion
British Library Online Contents | 2014| -
Stochastic Effect on Contact Hole Imaging of Chemically Amplified Extreme Ultraviolet Resists (5 pages)
British Library Online Contents | 2013| -
Chemical Gradient of Contact Hole Latent Image Created in Chemically Amplified Extreme Ultraviolet Resists (5 pages)
British Library Online Contents | 2013|
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