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Plasma Vacuum Ultraviolet Emission in a High Density Etcher
British Library Conference Proceedings | 1999| -
Plasma-Induced Charging Damage in Ultrathin (3 nm) Nitrided Oxides
British Library Conference Proceedings | 1999| -
Plasma Damage Characterization of the Lam TCP 9600PTX High-Density, Inductively Coupled Metal Etcher and Microwave Asher
British Library Conference Proceedings | 1999| -
Evaluation and Reduction of Charging Damage During Metal Etching
British Library Conference Proceedings | 1999| -
The Prevention of Charge Damage on Thin Gate Oxide from High Density Plasma Deposition
British Library Conference Proceedings | 1999| -
Plasma Damage During Dielectric Etch in High Density Plasma Etcher
British Library Conference Proceedings | 1999| -
Evaluation and Reduction of Electron Shading Damage in High Temperature Etching
British Library Conference Proceedings | 1999| -
Evaluation of Charging Damage Caused by the Pattern Structures During A1 Etching
British Library Conference Proceedings | 1999| -
Impact of Reactor- and Transistor-type on Electron Shading
British Library Conference Proceedings | 1999| -
Evaluation of Charging Damage in a Plasma Doping System
British Library Conference Proceedings | 1999| -
Reduction and Nonuniformity of High Density Plasma Process-Induced Electrical Degradation in MOS Devices
British Library Conference Proceedings | 1999| -
A Study of Plasma-Induced Damage on Hot-Carrier Lifetime Using Pre-Stressed Data
British Library Conference Proceedings | 1999| -
Plasma Induced Damage from HDP Process on the Ultra-Thin Gate Oxide
British Library Conference Proceedings | 1999| -
Suppression of Topography Dependent Charging Using a Phase-Controlled Inductively Coupled Plasma
British Library Conference Proceedings | 1999| -
Ultra-Thin Oxynitride Gate Dielectrics for 0.18 m CMOS and Beyond (invited)
British Library Conference Proceedings | 1999| -
Charge-Up Damage of Dual Gate Transistor During RF Pre-Cleaning of Metal Contact Before Barrier Metal Deposition
British Library Conference Proceedings | 1999| -
Compounding Effects of UV Exposure, Ion Bombardment, Electron Shading, and Plasma Charging in a High Density Plasma Poly Etcher
British Library Conference Proceedings | 1999|
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