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Optical disks system and applications
NationallizenzProc. SPIE Int. Soc. Opt. Engng (U.S.A.), 1983, Vol. 421Elsevier | 1985 -
A comparison of optical and electronic residue position-coded look-up tables
A P GOUTZOULIS (Westinghouse R&D Center, Pittsburgh, PA, USA) Proc. SPIE — Int. Soc. Opt. Eng. (USA), vol. 881, pp. 204–213 (1988).Elsevier | 1989 -
Image processing using optical disk technology at the Library of Congress
NationallizenzD.F. Willis (Cataloging Distribution Service, Library of Congress, Washington, DC, U.S.A.), Proc. SPIE Int. Soc. Opt. Engng (U.S.A.), 1983, Vol 421, pp. 92–95Elsevier | 1985 -
Optoelectronic neural networks based on holographically interconnected processors
Y OWECHKO, B H SOFFER, G J DUNNING (Hughes Res. Labs., Malibu, CA, USA) Proc. SPIE — Int. Soc. Opt. Eng. (USA), vol. 882, pp. 143–153 (1988).Elsevier | 1989 -
Laser processing for interconnect technology
H S COLE, Y S LIU, R GUIDA, J ROSE (GE Res. & Dev. Center, Schenectady, NY, USA) Proc. SPIE — Int. Soc. Opt. Eng. (USA), vol. 877, pp. 92–96 (1988). (Micro-Optoelectronic Materials, Los Angeles, CA, USA, 13–14 Jan. 1988)Elsevier | 1989 -
Guided-wave optical interconnects for VLSI systems
C T SULLIVAN, A HUSAIN (Honeywell Sensors & Signal Processing Lab., Bloomington, MN, USA) Proc. SPIE — Int. Soc. Opt. Eng. (USA), vol. 881, pp. 172–176 (1988). (Optical Computing and Nonlinear Materials, Los Angeles, CA, USA, 11–13 Jan. 1988)Elsevier | 1989 -
An integrated VLSI design environment
B.W. Suter, K.D. Reilly (Dept. of Comput. & Inf. Sci., Alabama Univ., Birmingham, AL, USA) Proc. SPIE Int. Soc. Opt. Eng. (USA) vol. 635, pp. 558-63 (1986) (Applications of Artificial Intelligence III, Orlando, FL, USA, 1–3 April 1986)Elsevier | 1987 -
High-density interconnects for electronic packaging
C W EICHELBERGER, R J WOJNAROWSKI, R O CARLSON, L M LEVINSON (GE Corporate Res. & Dev., Schenectady, NY, USA) Proc. SPIE — Int. Soc. Opt. Eng. (USA), vol. 877, pp. 90–91 (1988). (Micro-Optoelectronic Materials, Los Angeles, CA, USA, 13–14 Jan. 1988)Elsevier | 1989 -
A process for monolithic fabrication of microlenses on integrated circuits
Z D POPOVIC (Xerox Res. Centre of Canada, Mississauga, Ont., Canada), R A SPRAGUE, G A N CONNELL Proc. SPIE — Int. Soc. Opt. Eng. (USA), vol. 898, pp. 23–25 (1988). (Miniature Optics and Lasers, Los Angeles, CA, USA, 11–12 Jan. 1988)Elsevier | 1989 -
Two wavelength photorefractive dynamic optical interconnect
R McRUER, J WILDE, L HESSELINK, J GOODMAN (Dept. of Electr. Eng., Stanford Univ., CA, USA) Proc. SPIE — Int. Soc. Opt. Eng. (USA), vol. 881, pp. 192–198 (1988). (Optical Computing and Nonlinear Materials, Los Angeles, CA, USA, 11–13 Jan. 1988)Elsevier | 1989 -
Physical properties of ceramic-glass-copper micro-interconnect systems for VLSI/VHSIC packaging applications
D L SHEALY, H T TOHVER, D A HILL, Z SHEHADEH, G SRINIVASAN, R G THOMPSON, J SHYU (Alabama Univ., Birmingham, AL, USA) Proc. SPIE — Int. Soc. Opt. Eng. (USA), vol. 877 pp. 97–102 (1988). (Micro-Optoelectronic Materials, Los Angeles, CA, USA, 13–14 Jan. 1988)Elsevier | 1989 -
Electron beam/optical hybrid lithography for the production of gallium arsenide monolithic microwave integrated circuits (MIMICs)
R M NAGARAJAN, S D RASK (Gallium Arsenide Components Group, Unisys Corp., Eagan, MN, USA) Proc. SPIE — Int. Soc. Opt. Eng. (USA), vol. 923, pp. 266–273 (1988). (Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VII, Santa Clara, CA, USA, 2–4 March 1988)Elsevier | 1989 -
Sub-half micrometer gate lift-off by three layer resist process via electron beam lithography for gallium arsenide monolithic microwave integrated circuits (MIMICs)
R M NAGARAJAN, S D RASK, M R KING, T K YARD (Gallium Arsenide Components Group, Unisys Corp., Eagan, MN, USA) Proc. SPIE — Int. Soc. Opt. Eng. (USA), vol. 923, pp. 194–200 (1988). (Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VII, Santa Clara, CA, USA, 2–4 March 1988)Elsevier | 1989
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