Effect of N2/Ar flow ratio on the structural and electrical properties of SrHfON thin films prepared by magnetron sputtering (Englisch)
- Neue Suche nach: Tian, Hao
- Neue Suche nach: Feng, Li-ping
- Neue Suche nach: Liu, Zheng-tang
- Neue Suche nach: Tian, Hao
- Neue Suche nach: Feng, Li-ping
- Neue Suche nach: Liu, Zheng-tang
In:
Vacuum
;
109
;
139-143
;
2014
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ISSN:
- Aufsatz (Zeitschrift) / Elektronische Ressource
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Titel:Effect of N2/Ar flow ratio on the structural and electrical properties of SrHfON thin films prepared by magnetron sputtering
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Beteiligte:
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Erschienen in:Vacuum ; 109 ; 139-143
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Verlag:
- Neue Suche nach: Elsevier Ltd
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Erscheinungsdatum:04.07.2014
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Format / Umfang:5 pages
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ISSN:
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DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Elektronische Ressource
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Sprache:Englisch
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Schlagwörter:
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Datenquelle:
Inhaltsverzeichnis – Band 109
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Editorial Board & Publication Information| 2014