Growth of thin Ni films on the W(110) surface (Englisch)
- Neue Suche nach: Mingde, Xu
- Neue Suche nach: Smith, R. J.
- Neue Suche nach: Mingde, Xu
- Neue Suche nach: Smith, R. J.
In:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
;
9
, 3
;
1828-1832
;
1991
- Aufsatz (Zeitschrift) / Elektronische Ressource
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Titel:Growth of thin Ni films on the W(110) surface
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Weitere Titelangaben:Growth of thin Ni films on the W(110) surface
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Beteiligte:Mingde, Xu ( Autor:in ) / Smith, R. J. ( Autor:in )
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Erschienen in:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films ; 9, 3 ; 1828-1832
-
Verlag:
- Neue Suche nach: American Vacuum Society
-
Erscheinungsdatum:01.05.1991
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Format / Umfang:5 pages
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ISSN:
-
DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Elektronische Ressource
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Sprache:Englisch
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Schlagwörter:
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Datenquelle:
Inhaltsverzeichnis – Band 9, Ausgabe 3
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- 1123
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Characterization of ion beam‐induced surface modification of diamond films by real time spectroscopic ellipsometryCong, Yue / Collins, R. W. / Messier, R. / Vedam, K. / Epps, Glenn F. / Windischmann, H. et al. | 1991
- 1026
-
Clean and oxygen covered InP(110) surfaces differential reflectivityCricenti, A. / Selci, S. / Felici, A. C. / Ferrari, L. / Gavrilovich, A. / Goletti, C. / Chiarotti, G. et al. | 1991
- 1029
-
The thermal oxidation of AlGaAsShin, J. / Geib, K. M. / Wilmsen, C. W. / Chu, P. / Wieder, H. H. et al. | 1991
- 1035
-
Ion beam oxidation of GaAs: The role of ion energyVancauwenberghe, O. / Herbots, N. / Manoharan, H. / Ahrens, M. et al. | 1991
- 1040
-
GaAs surface oxidation and deoxidation using electron cyclotron resonance oxygen and hydrogen plasmasLu, Z. / Schmidt, M. T. / Osgood, R. M. / Holber, W. M. / Podlesnik, D. V. et al. | 1991
- 1045
-
Surface mechanisms in aluminum chemical vapor depositionMantell, David A. et al. | 1991
- 1051
-
Thin‐film deposition in the afterglows of N2 and H2 microwave plasmasMeikle, Scott / Nakanishi, Yoichiro / Hatanaka, Yoshinori et al. | 1991
- 1055
-
Plasma jet dry etching using different electrode configurationsBarklund, A. M. / Blom, H.‐O. / Berg, S. et al. | 1991
- 1058
-
Surface etching and roughening in integrated processing of thermal oxidesOffenberg, M. / Liehr, M. / Rubloff, G. W. et al. | 1991
- 1066
-
Process compatibility in integrated processing of semiconductor devices in multichamber systemsLucovsky, G. / Kim, S. S. / Fitch, J. T. / Wang, Cheng / Rudder, R. A. / Fountain, G. G. / Hattangady, S. V. / Markunas, R. J. et al. | 1991
- 1073
-
In situ native oxide clean followed by chemical vapor deposition of tungsten silicide on polysilicon in a cluster toolNowicki, Ronald S. / Geraghty, Patrice / Harris, David / Lux, Gayle / Johnson, David J. et al. | 1991
- 1083
-
Monte Carlo low pressure deposition profile simulationsRey, Juan C. / Cheng, Lie‐Yea / McVittie, James P. / Saraswat, Krishna C. et al. | 1991
- 1088
-
Helium plasma enhanced chemical vapor deposited oxides and nitrides: Process mechanisms and applications in advanced device structuresBright, A. A. et al. | 1991
- 1094
-
Low-temperature (300 degrees C) stacked oxide-nitride-oxide gate dielectrics with remote plasma-enhanced chemical vapor depositionHattangady, S.V. / Fountain, G.G. / Alley, R.G. / Rudder, R.A. / Markunas, R.J. et al. | 1991
- 1094
-
Low‐temperature (300 °C) stacked oxide–nitride–oxide gate dielectrics with remote plasma‐enhanced chemical vapor depositionHattangady, S. V. / Fountain, G. G. / Alley, R. G. / Rudder, R. A. / Markunas, R. J. et al. | 1991
- 1099
-
Hot filament activated chemical vapor deposition of boron nitrideRye, Robert R. et al. | 1991
- 1104
-
Stresses in multilayer combinations of sputter deposited coatings of Ni, Ti, TiC+Ni, and TiB2+Ni on carbon steel substratesChambers, D. L. / Taylor, K. A. / Wan, C. T. / Susi, G. T. et al. | 1991
- 1109
-
Process optimization and scale‐up of a rapid thermal processing system using design of experimentsRastogi, Rajiv et al. | 1991
- 1113
-
Sputter deposition of precision Si/Si3N4 Bragg reflectors using multitasking interactive processing controlBabic, D. I. / Dudley, J. J. / Shirazi, M. / Hu, E. L. / Bowers, J. E. et al. | 1991
- 1118
-
Large‐area sputtering of in situ superconducting YBa2Cu3O7 filmsBallentine, P. H. / Allen, J. P. / Kadin, A. M. / Mallory, D. S. et al. | 1991
- 1129
-
The effect of radio frequency substrate biasing in the deposition of diamond‐like carbon films in an electron cyclotron resonance dischargePastel, P. W. / Varhue, W. J. et al. | 1991
- 1134
-
Effect of oxygen on filament activity in diamond chemical vapor depositionSommer, M. / Smith, F. W. et al. | 1991
- 1140
-
X‐ray absorption study of diamond films grown by chemical vapor depositionYang, X.‐Q. / Ruckman, M. W. / Skotheim, T. A. / den Boer, M. / Zheng, Yu / Badzian, A. R. / Badzian, T. / Messier, R. / Srivatsa, A. R. et al. | 1991
- 1145
-
Current research problems and opportunities in the vapor phase synthesis of diamond and cubic boron nitrideYarbrough, W. A. et al. | 1991
- 1153
-
K-edge absorption analysis of hydrogenated diamond-like carbon filmsYaxin Wang / Hsiung Chen / Hoffman, R.W. et al. | 1991
- 1153
-
K‐edge absorption analysis of hyrogenated diamond‐like carbon filmsWang, Yaxin / Chen, Hsiung / Hoffman, R. W. et al. | 1991
- 1157
-
The effect of ion energy flux on the properties of hydrogenated amorphous carbon filmsVandentop, G. J. / Kawasaki, M. / Kobayashi, K. / Somorjai, G. A. et al. | 1991
- 1162
-
Effect of microstructure and hydrogen content on the characteristics of amorphous hydrogenated carbon protective coatingsKokaku, Y. / Kohno, M. / Fujimaki, S. / Kitoh, M. et al. | 1991
- 1166
-
Magnetic field and substrate position effects on the ion/deposition flux ratio in magnetron sputteringClarke, G. A. / Osborne, N. R. / Parsons, R. R. et al. | 1991
- 1171
-
Unbalanced magnetrons and new sputtering systems with enhanced plasma ionizationMusil, J. / Kadlec, S. / Münz, W.‐D. et al. | 1991
- 1178
-
Correlations of plasma properties and magnetic field characteristics to TiN film properties formed using a dual unbalanced magnetron systemRohde, S. L. / Sproul, W. D. / Rohde, J. R. et al. | 1991
- 1184
-
Reactive sputtering of molybdenum‐oxide gradient‐index filtersJankowski, A. F. / Schrawyer, L. R. / Perry, P. L. et al. | 1991
- 1188
-
Experimental studies of inhomogeneous coatings for optical applicationsOuellette, M. F. / Lang, R. V. / Yan, K. L. / Bertram, R. W. / Owles, R. S. / Vincent, D. et al. | 1991
- 1193
-
Indium–tin oxide films radio frequency sputtered from specially formulated high density indium–tin oxide targetsKulkarni, Sudhakar / Bayard, Michel et al. | 1991
- 1197
-
Modification of optical and mechanical properties of BaF2 bombarded by either Xe or Ar ionScaglione, S. / Flori, D. / Caneve, L. / Emiliani, G. et al. | 1991
- 1227
-
Quantitative surface analysis: Agreeing initial data processingSeah, M. P. et al. | 1991
- 1234
-
Quantitative surface analysis with elemental standards: Surface roughness limitationsDawson, P.T. / Petrone, S.A. et al. | 1991
- 1237
-
Quantitative microanalysis of oxygen in zirconium by Auger electron spectroscopyBetteridge, J. S. / Hocking, W. H. / Hayward, P. J. et al. | 1991
- 1244
-
Microscopic x‐ray photoelectron spectroscopy using a focused soft x‐ray beamNinomiya, Ken / Hirai, Yasuharu / Momose, Atsushi / Aoki, Sadao / Suzuki, Keizo et al. | 1991
- 1248
-
High-solution X-ray microscopy using an undulator source, photoelectron with MAXIMUMCapasso, C. / Ray-Chaudhuri, A.K. / Ng, W. / Liang, S. / Cole, R.K. / Wallace, J. / Cerrina, F. / Margaritondo, G. / Underwood, J.H. / Kortright, J.B. et al. | 1991
- 1248
-
High‐resolution x‐ray microscopy using an undulator source, photoelectron studies with MAXIMUMCapasso, C. / Ray‐Chaudhuri, A. K. / Ng, W. / Liang, S. / Cole, R. K. / Wallace, J. / Cerrina, F. / Margaritondo, G. / Underwood, J. H. / Kortright, J. B. et al. | 1991
- 1254
-
Direct imaging of monolayer and surface atomic structure by angular distribution Auger microscopyFrank, Douglas G. / Golden, Teresa / Chyan, Oliver M. R. / Hubbard, Arthur T. et al. | 1991
- 1261
-
The effects of low‐energy ion impacts on graphite observed by scanning tunneling microscopyShedd, G. M. / Russell, P. E. et al. | 1991
- 1265
-
Variable angle spectroscopic ellipsometry studies of oriented phthalocyanine filmsDebe, M. K. / Field, D. R. et al. | 1991
- 1272
-
Interaction of evaporated copper with vapor‐deposited thin polyimide filmsStrunskus, T. / Hahn, C. / Frankel, D. / Grunze, M. et al. | 1991
- 1278
-
Absorption and interaction of methylene chloride with metallized polyimide filmsMatienzo, L. J. / Emmi, F. / VanHart, D. C. / Lo, J. C. et al. | 1991
- 1283
-
The use of secondary ion mass spectrometry to investigate copolymer enhanced adhesion between immiscible polymersDeline, V. R. / Brown, H. R. / Char, K. et al. | 1991
- 1287
-
Enhanced chemical bonding between lubricants and magnetic coatings by high energy irradiation and its application to tape durabilityLee, Ting‐Ho Dan et al. | 1991
- 1293
-
Time‐of‐flight scattering and recoiling spectrometryRabalais, J. Wayne et al. | 1991
- 1300
-
Plasma desorption mass spectrometry with coincidence counting for the analysis of polymer surfacesPark, M. A. / Cox, B. D. / Schweikert, E. A. et al. | 1991
- 1307
-
Time‐of‐flight static secondary ion mass spectrometry of additives on polymer surfacesMawn, M. P. / Linton, R. W. / Bryan, S. R. / Hagenhoff, B. / Jürgens, U. / Benninghoven, A. et al. | 1991
- 1312
-
Comparison of sputter‐initiated resonance ionization spectroscopy and laser atomization resonance ionization spectroscopy to localize tin‐labeled deoxyribose nucleic acidArlinghaus, H. F. / Thonnard, N. / Spaar, M. T. / Sachleben, R. A. / Brown, G. M. / Foote, R. S. / Sloop, F. V. / Peterson, J. R. / Jacobson, K. B. et al. | 1991
- 1320
-
Photoelectron microscopy in the life sciences: Imaging neuron networksMercanti, Delio / De Stasio, Gelsomina / Ciotti, M. Teresa / Capasso, C. / Ng, W. / Ray‐Chaudhuri, A. K. / Liang, S. H. / Cole, R. K. / Guo, Z. Y. / Wallace, J. et al. | 1991
- 1323
-
Auger and X-ray photoelectron study of surface heterogeneity in ASTM F-75 alloy for biomedical implantationMoore, R.L. / Grobe, G.L. III / Gardella, J.A. et al. | 1991
- 1323
-
Auger and x‐ray photoelectron study of surface heterogeneity in ASTM F‐75 alloy prepared for biomedical implantationMoore, R. L. / Grobe, G. L. / Gardella, J. A. et al. | 1991
- 1329
-
X-ray photoelectron spectroscopic comparison of sputtered Ti/el, Ti6Al4V, and passivated bulk metals for use in cell culture techniquesSodhi, R.N.S. / Weninger, A. / Davies, J.E. / Sreenivas, K. et al. | 1991
- 1329
-
X‐ray photoelectron spectroscopic comparison of sputtered Ti, Ti6Al4V, and passivated bulk metals for use in cell culture techniquesSodhi, R. N. S. / Weninger, A. / Davies, J. E. / Sreenivas, K. et al. | 1991
- 1334
-
The influence of surface oxygen on uptake and release of deuterium by tantalumWampler, W. R. et al. | 1991
- 1340
-
Surface and electron microscopic analysis of Ni–Cr alloy films deposited from a single sourceSethuraman, A. R. / Reucroft, P. J. / Okazaki, K. / De Angelis, R. J. et al. | 1991
- 1344
-
Nondestructive depth profile study of oxygen‐exposed large‐grain silver using angle‐resolved Auger electron spectroscopy and ion scattering spectroscopyDavidson, Mark R. / Hoflund, Gar B. / Outlaw, R. A. et al. | 1991
- 1351
-
The air‐exposed surface of sputter deposited silicon carbide studied by x‐ray photoelectron spectroscopyLee, Ray C. / Aita, Carolyn Rubin / Tran, Ngoc C. et al. | 1991
- 1355
-
Uses of ultraviolet/ozone for hydrocarbon removal: Applications to surfaces of complex composition or geometryMcIntyre, N. S. / Davidson, R. D. / Walzak, T. L. / Williston, R. / Westcott, M. / Pekarsky, A. et al. | 1991
- 1360
-
The corrosion resistance of Al–Ni ion plated thin filmsBushnell, Steven E. / Nowak, Welville B. et al. | 1991
- 1365
-
Imaging atom‐probe analysis of an aqueous interfaceStintz, Andreas / Panitz, J. A. et al. | 1991
- 1368
-
Effects of sulfur on vapor and liquid H2O adsorption on stainless steelBaer, D. R. / Lannutti, S. M. et al. | 1991
- 1368
-
Effects of sulfur on vapor and liquid H2O absorption on stainless steelBaer, D.R. / Lannutti, S.M. et al. | 1991
- 1374
-
Contrasts in the reactions of sulfur from different sources with GaAs surfacesMokler, S. M. / Watson, P. R. et al. | 1991
- 1379
-
Relative sensitivity factors and useful yields for a microfocused gallium ion beam and time‐of‐flight secondary ion mass spectrometerBennett, J. / Simons, D. et al. | 1991
- 1385
-
Secondary ion mass spectrometry analysis of aluminium films: relative sensitivity factors and analytical considerationsStevie, F.A. / Kahora, P.M. / Cochran, G.W. et al. | 1991
- 1385
-
Secondary ion mass spectrometry analysis of aluminum films: Relative sensitivity factors and analytical considerationsStevie, F. A. / Kahora, P. M. / Cochran, G. W. et al. | 1991
- 1390
-
Quantitative secondary ion mass spectrometry dopant profiling in silicided metal–oxide semiconductor field effect transistorsSmith, Howard E. / Beagle, John L. et al. | 1991
- 1395
-
Ion‐induced topography, depth resolution, and ion yield during secondary ion mass spectrometry depth profiling of a GaAs/AlGaAs superlattice: Effects of sample rotationCirlin, Eun‐Hee / Vajo, John J. / Doty, Robert E. / Hasenberg, T. C. et al. | 1991
- 1402
-
Migration of hydrogen through thin films of ZrO2 on Zr–Nb alloyMcIntyre, N. S. / Davidson, R. D. / Weisener, C. G. / Good, G. M. / Mount, G. R. / Warr, B. D. / Elmoselhi, M. et al. | 1991
- 1406
-
Enhancement of electron spectroscopy for chemical analysis of surface silanol in silicon nitride through chemical derivatizationDang, Tuan A. / Gnanasekaran, Ramaswamy et al. | 1991
- 1410
-
An x‐ray photoelectron spectroscopy study of AuxIny alloysJayne, Douglas T. / Fatemi, Navid S. / Weizer, Victor G. et al. | 1991
- 1416
-
X‐ray induced reduction effects at CeO2 surfaces: An x‐ray photoelectron spectroscopy studyPaparazzo, E. / Ingo, G. M. / Zacchetti, N. et al. | 1991
- 1421
-
Development of an offline x‐ray photoelectron spectroscopic personal computer‐based data analysis systemMcCaslin, Paul C. et al. | 1991
- 1426
-
Low‐voltage scanning electron microscopy: A surface sensitive techniqueKatnani, A. D. / Hurban, S. / Rands, B. et al. | 1991
- 1434
-
Methodology, performance, and application of an imaging x‐ray photoelectron spectrometerDrummond, I. W. / Ogden, L. P. / Street, F. J. / Surman, D. J. et al. | 1991
- 1441
-
Surface characterization of polymers: Complementary information from x‐ray photoelectron spectroscopy and static secondary ion mass spectrometryStickle, W. F. / Moulder, J. F. et al. | 1991
- 1447
-
Photo‐oxidation of σ‐conjugated Si–Si network polymersKunz, R. R. / Horn, M. W. / Bianconi, P. A. / Smith, D. A. / Freed, C. A. et al. | 1991
- 1447
-
Photo-oxidation of sigma -conjugated Si-Si network polymersKunz, R.R. / Horn, M.W. et al. | 1991
- 1452
-
Scanning tunneling microscopy studies of substituted polyaniline thin filmsPorter, T. L. / Lee, C. Y. / Wheeler, B. L. / Caple, G. et al. | 1991
- 1457
-
Scanning tunneling microscopy studies of Pd–Sn catalyzed electroless Cu deposited on pyrolytic graphiteSiperko, L. M. et al. | 1991
- 1461
-
An x‐ray photoelectron spectroscopy study of aluminum surfaces treated with fluorocarbon plasmasMiller, A. C. / McCluskey, F. P. / Taylor, J. Ashley et al. | 1991
- 1466
-
High resolution compositional depth profilingHofmann, S. et al. | 1991
- 1477
-
The effects of elevated temperature on sputter depth profiles of silver/nickel bilayersSimko, Steven J. / Cheng, Yang‐Tse / Militello, Maria C. et al. | 1991
- 1482
-
On the effect of an oxygen beam in sputter depth profilingMeuris, M. / Vandervorst, W. / Jackman, J. et al. | 1991
- 1489
-
A comparison of one‐dimensional and two‐dimensional smoothing algorithms for Auger depth profilingGaarenstroom, Stephen W. et al. | 1991
- 1493
-
Oxidation and corrosion studies by valence band photoemissionSherwood, P. M. A. et al. | 1991
- 1498
-
Core level and valence band x‐ray photoelectron spectroscopy of gold oxideAita, Carolyn Rubin / Tran, Ngoc C. et al. | 1991
- 1501
-
Formation of Cu3Si and its catalytic effect on silicon oxidation at room temperatureStolt, L. / Charai, A. / D’Heurle, F. M. / Fryer, P. M. / Harper, J. M. E. et al. | 1991
- 1506
-
Structural transformations in adsorbed oxygen layers on Al surfaces observed using optical second‐harmonic generationJanz, S. / Pedersen, K. / van Driel, H. M. / Timsit, R. S. et al. | 1991
- 1511
-
Interfaces in composites: Relations between structure and propertiesMayer, J. / Rühle, M. et al. | 1991
- 1518
-
Metal/metal‐oxide interfaces: A surface science approach to the study of adhesionPeden, C. H. F. / Kidd, K. B. / Shinn, N. D. et al. | 1991
- 1525
-
High temperature interfacial reactions of SiC with metalsChou, T. C. / Joshi, A. et al. | 1991
- 1535
-
Microstructural evaluations of a Si–Hf–Cr fused slurry coating on graphite for oxidation protectionHu, H. S. / Joshi, A. / Lee, J. S. et al. | 1991
- 1539
-
Defect and impurity effects on the initial growth of Ag on Si(111)Zuo, J.‐K. / Wendelken, J. F. et al. | 1991
- 1545
-
Effect of step edge transition rates and anisotropy in simulations of epitaxial growthChason, E. / Dodson, B. W. et al. | 1991
- 1551
-
Rate equation models of epitaxial growth on stepped surfacesResh, J. / Strozier, J. / Bensaoula, A. / Ignatiev, A. et al. | 1991
- 1558
-
Strain‐induced surface reactivity: Low temperature Cr/W(110) nitridationShinn, N. D. / Tsang, K.‐L. et al. | 1991
- 1563
-
Photon‐ versus electron‐induced decomposition of Fe(CO)5 adsorbed on Ag(111): Iron film depositionHenderson, M. A. / Ramsier, R. D. / Yates, J. T. et al. | 1991
- 1569
-
From chemisorption to mechanism on surfaces: An exploration of the pyrolysis of triisobutylaluminum in the chemical vapor deposition of aluminum thin filmsChan, A. W. Edith / Hoffmann, Roald et al. | 1991
- 1581
-
Molecular beam studies of adsorption dynamicsArumainayagam, Christopher R. / McMaster, Mark C. / Madix, Robert J. et al. | 1991
- 1589
-
The MgO (001) surface studied by time‐resolved He atom scatteringJung, David R. / Cui, Jinhe / Frankl, Daniel R. et al. | 1991
- 1589
-
The MgO(001) surfaces studied by time-resolved He atom scatteringJung, D.R. / Jinhe Cui / Frankl, D.R. et al. | 1991
- 1595
-
The effect of microstructure on the magnetic behavior of epitaxial cobalt layersMankey, G. J. / Kief, M. T. / Willis, R. F. et al. | 1991
- 1599
-
The adsorption and reactions of aniline on Rh(111)Xu, Xueping / Friend, C. M. et al. | 1991
- 1604
-
Ion scattering study of the reconstruction of Mo(100)Hildner, M. L. / Daley, R. S. / Felter, T. E. / Estrup, P. J. et al. | 1991
- 1610
-
Surface reactivity of titanium–aluminum alloys: Ti3Al, TiAl, and TiAl3Mencer, D. E. / Hess, T. R. / Mebrahtu, T. / Cocke, D. L. / Naugle, D. G. et al. | 1991
- 1616
-
Localized corrosion of aluminum–1.5% copper thin films exposed to photoresist developing solutionsRogers, B. R. / Wilson, S. R. / Cale, T. S. et al. | 1991
- 1622
-
High dynamic range quantitative image depth profiling of boron in patterned silicon dioxide on siliconHunter, J. L. / Linton, R. W. / Griffis, D. P. et al. | 1991
- 1630
-
Determination of the surface area of variously polished gold electrodes by scanning tunneling microscopyPoirier, G. E. / Hance, B. K. / White, J. M. / Fox, M. A. / Creager, S. E. et al. | 1991
- 1634
-
Photoelectron microscopy and spectroscopy using synchrotron radiationWaddill, G. D. / Komeda, T. / Benning, P. J. / Weaver, J. H. / Knapp, G. S. et al. | 1991
- 1640
-
The early stages in the oxidation of NaShek, M. L. / Hrbek, J. / Sham, T. K. / Xu, G.‐Q. et al. | 1991
- 1645
-
Near‐edge and photoemission studies of the interaction of cesium with ammonia at 80 KQiu, S. L. / Ruckman, M. W. / Strongin, Myron et al. | 1991
- 1650
-
Reflection of hydrogen atoms from alkali and alkaline earth oxide surfacesMelnychuk, S. T. / Seidl, M. et al. | 1991
- 1657
-
Surface and bulk phonon‐assisted resonances with surface bound states in the inelastic scattering of He atoms on NaCl (001)Safron, S. A. / Brug, W. P. / Bishop, G. G. / Chern, G. / Derrick, M. E. / Duan, J. / Deweese, M. E. / Skofronick, J. G. et al. | 1991
- 1663
-
Boron K‐shell spectroscopy of boron‐doped siliconEsposto, F. J. / Aebi, P. / Tyliszczak, T. / Hitchcock, A. P. / Kasrai, M. / Bozek, J. D. / Jackman, T. E. / Rolfe, S. R. et al. | 1991
- 1670
-
Surface and interface phonons of CaF2 epitaxial layers on Si(111) measured by high resolution electron energy loss spectroscopyLongueville, J. L. / Thiry, P. A. / Caudano, R. et al. | 1991
- 1676
-
Two‐dimensional phase transition of adsorbed xenon on NiAl(110) and Al(110)Castro, G. R. / Isern, H. / Schneider, U. / Stöcker, M. / Wandelt, K. et al. | 1991
- 1680
-
Coadsorption of barium and oxygen on nickel—effect on oxide nucleation: Photoelectron spectroscopic studiesAyyoob, M. / Hegde, M. S. et al. | 1991
- 1684
-
Evidence for the potassium‐promoted activation of methane on a K‐doped NiO/Ni(100) surfaceChen, J. G. / Weisel, M. D. / Hardenbergh, J. H. / Hoffmann, F. M. / Mims, C. A. / Hall, R. B. et al. | 1991
- 1688
-
A molecular beam investigation on activated dissociative adsorption of CH4 and N2 on Ni surfaceXi, Guangkang / Wang, Jinhe / Li, Shenglin / Shao, Shumin et al. | 1991
- 1693
-
Energy requirements for the dissociative adsorption of hydrogen on Cu(110)Campbell, Joseph M. / Domagala, Melanie E. / Campbell, Charles T. et al. | 1991
- 1698
-
Electronic interactions in bimetallic systems: Core‐level binding energy shiftsRodriguez, José A. / Campbell, Robert A. / Goodman, D. Wayne et al. | 1991
- 1703
-
Bismuth induced structures on copper (100)Blum, B. / Plummer, E. W. / Davis, H. L. / Zehner, D. M. et al. | 1991
- 1707
-
Growth and structural characterization of a lead overlayer on Cu(100)Li, Wei / Lin, J.‐S. / Karimi, M. / Vidali, G. et al. | 1991
- 1712
-
Laser spectroscopy of hydrogen desorption from Pd(100)Schröter, L. / David, R. / Zacharias, H. et al. | 1991
- 1719
-
Two‐dimensional imaging of photofragments and species desorbed from surfaces: Energy and angle resolved studiesChuang, T. J. / Schwarzwald, R. / Mödl, A. et al. | 1991
- 1726
-
Photodesorption of CO, NO, and O2 from modified Ni(111) surfacesYoshinobu, Jun / Guo, Xingcai / Yates, John T. et al. | 1991
- 1732
-
Evidence for precursor‐mediated Cl2 etching of GaAs{110}: Effect of surface temperature and incident translational energy on the reaction probabilityDeLouise, L. A. et al. | 1991
- 1737
-
Ru3(CO)12 and Mo (CO)6 overlayers adsorbed on Ru(001) and Au/Ru and their interaction with electrons and photons: An infrared reflection–absorption studyMalik, Igor J. / Hrbek, Jan et al. | 1991
- 1742
-
Interaction of CO with Cu/Rh(100), Cu overlayer structures and CO surface diffusionHe, J.‐W. / Kuhn, W. K. / Leung, L.‐W. H. / Goodman, D. W. et al. | 1991