Vacuum
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Table of contents
- 318
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Contributors to this issue| 1963
- 319
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Editorial| 1963
- 320
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Classification system| 1963
- 321
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778. Isosteric heats of adsorption of isobutylene on activated alumina| 1963
- 321
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777. High temperature physical adsorption of homologous series of gases on heterogeneous surfaces| 1963
- 321
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775. Effusion of gases through conical orifices| 1963
- 321
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773. The development of modern vacuum techniques: present position and tendences| 1963
- 321
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774. Vacuum techniques| 1963
- 321
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776. Molecular flow of oil vapours in piping systems| 1963
- 321
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779. Radiation chemistry of isotactic and atactic polypropylene I. Gas evolution and gel studies| 1963
- 322
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780. The sorption of water vapor and the hydrogen-deuterium exchange, effect on poly-L-glutamic acid| 1963
- 322
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788. Vaporization of magnesium oxide and its reaction with alumina| 1963
- 322
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787. The vapour pressures and bond energies of some antimony halides| 1963
- 322
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781. Microcalorimetric studies of the distribution of surface energy in chemisorption| 1963
- 322
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786. New theory of adhesion| 1963
- 322
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789. The thermodynamic and physical properties of beryllium compounds. II Heat of formation and entropy of beryllium fluoride (g)| 1963
- 322
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784. Sources of surface contamination in vacuum evaporation systems| 1963
- 322
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783. A novel technique for characterization of adsorption rates on heterogenous surfaces| 1963
- 322
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785. Interaction of oxygen at low pressures with molybdenum| 1963
- 322
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782. Microcatalytic studies of the hydrogenation of ethylene I. The promoting effect of adsorbed hydrogen on the catalytic activity of metal surfaces| 1963
- 323
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801. The optical absorption of CuCl single crystals| 1963
- 323
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797. Photoelectric emission of the complexes between caesium and polycyclic aromatic compounds| 1963
- 323
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796. Properties of photocathodes exposed in a high vacuum| 1963
- 323
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799. The passage of light through an optically active absorbing plate| 1963
- 323
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793. Discharge without electrodes by means of concentrated bombardment with microwaves| 1963
- 323
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790. The condensation coefficient and the vaporization process| 1963
- 323
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795. Laser makes tests on nuclear fuels| 1963
- 323
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802. Luminescence kinetics of chromium luminors. V: Chromium-activated beryllium spinel| 1963
- 323
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792. Stable plasma jets for spectroscopic source| 1963
- 323
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791. Palladium-diaphragm hydrogen pump| 1963
- 323
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798. The elimination of the effect of oxide films on the results of measurements of the optical constants of aluminum| 1963
- 323
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800. A finite totally reflecting resonances filter III| 1963
- 323
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794. Continuously oxygenated tungsten as a surface ionization source| 1963
- 324
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805. Immersion spectrophotometry of interference films: refractive indices of fluoride films on uranium dioxide and anodic oxide films on uranium metal| 1963
- 324
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Thin film thickness measurement using silver-modified Newton's ring| 1963
- 324
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806. Non-isothermal superconducting bolometer: theory of operation| 1963
- 324
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Stable plasma jets for spectroscopic source| 1963
- 324
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803. On the vacuum-ultraviolet reflectance of evaporated aluminium before and during oxidation| 1963
- 324
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804. On the variation with wavelength of the opitcal constants of thin metallic films| 1963
- 324
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Comparison of two methods for measuring the thickness of thin coatings of oxides films on silicon| 1963
- 325
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811. The interpretation of gauge readings| 1963
- 325
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807. Vacuum system for the 7BeV proton synchrotron| 1963
- 325
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810. Industrial measurement and control of vacuum| 1963
- 325
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808. Contamination in ultra-high vacuum plant| 1963
- 325
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809. The origin of background current in high-frequency mass spectrometers and methods of suppression| 1963
- 326
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819. Large rotary vacuum seal| 1963
- 326
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An elastometer seal for glass-vacuum desiccators| 1963
- 326
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Packless all-metal ultra-high vacuum valve for temperatures from— 196°C to 460°C| 1963
- 326
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813. Simple ionization gauge control circuit| 1963
- 326
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Mass spectrometer investigation of gas emission from plastic| 1963
- 326
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818. Epoxy vacuum seal for introduction of leads into cryogenic equipment| 1963
- 326
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816. An improved bearing arrangement for vacuum operation of the rotary condenser of a sychrocyclotron| 1963
- 326
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Inexpensive all-metal vacuum valve| 1963
- 326
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812. Ultra-high vacuum use of Bayard-Alpert ionization gauges| 1963
- 326
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815. A simple high voltage vacuum system lead-through| 1963
- 326
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817. Ball bearings designed to meet special application requirements (cryogenic temperature and hard vacuum conditions)| 1963
- 326
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820. Vacuum seals| 1963
- 326
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Negative ions and their importance for the analysis of residual gas| 1963
- 326
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814. A rotary motion device suitable for use in high vacuum systems| 1963
- 327
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825. High voltage vacuum feed-through| 1963
- 327
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829. Problems in detecting leaks with long time constants in longlife vacuum devices with sealed glass envelopes| 1963
- 327
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823. Transparent rigid mount for vacuum stopcocks| 1963
- 327
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824. New high vacuum valves| 1963
- 327
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827. Conversion of a high-vacuum station from liquid nitrogen to zeolite trapping| 1963
- 327
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Industrial measurement of control of vacuum| 1963
- 327
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830. Residual gas concentration in evacuated chambers| 1963
- 327
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826. Electrical lead into vacuum tubes| 1963
- 327
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828. A new leak detector| 1963
- 328
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832. Preparation of evaported silicon films| 1963
- 328
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833. Properties of evaporated Cu films vary with deposition conditions| 1963
- 328
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840. Aluminized cathode ray tubes| 1963
- 328
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841. Thin film production performed continuously| 1963
- 328
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845. Thin film transistors with metal base| 1963
- 328
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837. Resonance technique for non-destructive readout of thin magnetic films| 1963
- 328
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836. Visual monitoring during vacuum evaporations| 1963
- 328
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838. High vacuum deposition of cesium| 1963
- 328
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839. Magnetic anisotropy in evaporated thin films containing aluminium| 1963
- 328
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843. Pulse measurements on thin magnetic films| 1963
- 328
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834. Method for vacuum deposition of refractory metal films| 1963
- 328
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842. Digital thin film memories| 1963
- 328
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844. Thin film cyrtron circuits| 1963
- 328
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831. Time-off-light method of determining velocities of sputtered atoms| 1963
- 328
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835. High temperature substrate holder| 1963
- 329
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Domain pattern in electrodeposited nickel-iron thin films| 1963
- 329
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850. Thin film thickness measurement using silver-modified Newton's rings| 1963
- 329
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847. Capacitance between thin film conductors deposited on substrates of high relative permittivity| 1963
- 329
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849. Comparison of two methods for measuring the thickness of thin coatings of oxide films on silicon| 1963
- 329
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848. The technique of depositing thin metallic films very close to each other in a vacuum and application of the method to the manufacture of field-effect transistors| 1963
- 329
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846. The T.F.T., a new thin film transistor| 1963
- 329
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851. Vapour sources for vacuum deposition of superconductive thin-film circuitry| 1963
- 329
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Electronic apparatus for measuring silver layer thickness on mirrors by means of eddy currents| 1963
- 330
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Discharge without electrodes by means of concentrated bombardment with microwaves| 1963
- 330
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Contamination in ultra-high vacuum plant| 1963
- 330
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852. Reverse-biased p-n junctions in vacuum tubes| 1963
- 330
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856. On the effective magnetization and uniaxial anisotropy of thin permalloy films| 1963
- 330
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860. An alumina degradation leading to the breakdown of heater- cathode insulation in electronic valves| 1963
- 330
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853. Model experiments on image formation by the electron-mirror surface microscope| 1963
- 330
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857. Tunnel cathode study| 1963
- 330
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On the effective magnetization and uniaxial anisotropy of thin permalloy films| 1963
- 330
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Thermal rearrangement of a perfectly ordered tungsten surface| 1963
- 330
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858. Measurement of laster output by light pressure| 1963
- 330
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862. Electron microscopy| 1963
- 330
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855. Index to the literature of magnetism (including thin films)| 1963
- 330
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861. Domain pattern in electrodeposited nickel-iron thin films| 1963
- 330
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Time of flight method of determining velocities of sputtered atoms| 1963
- 330
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859. Negative ions and their importance for the analysis of residual gas| 1963
- 330
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Sources of surface contamination in vacuum evaporation systems| 1963
- 330
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854. The Evotron: a new type of electron tube using electronvoltaic effects| 1963
- 331
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Pulse measurements on thin magnetic films| 1963
- 331
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865. A new temperature-altitude environmental chamber| 1963
- 331
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869. Vacuum furnace for high temperature diffusion anneals| 1963
- 331
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864. Study of instrumentation for a space simulation chamber| 1963
- 331
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868. Mass spectrometer investigation of gas emission from plastic| 1963
- 331
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863. Problems of the upper atmosphere| 1963
- 331
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Properties of photocathodes exposed in a high vacuum| 1963
- 331
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867. Celestial laboraties| 1963
- 331
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The origin of background current in high-frequency mass spectrometers and methods of suppression| 1963
- 331
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Digital thin films memories| 1963
- 331
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Continuously oxygenated Tungsten as a surface ionization gauge| 1963
- 331
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Photoelectric emission of the complexes between caesium and polycyclic aromatic compounds| 1963
- 331
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Magnetic anisotropy in evaporated thin films containing aluminium| 1963
- 331
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866. Proceeding of the NASA University Conference on the science and technology of space exploration| 1963
- 331
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Residual gas concentration in evacuated chambers| 1963
- 332
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Radiation chemistry of isotatic and atactic polypropylene. I. Gas evolution and gel studies| 1963
- 332
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How properties of evaporated Cu films vary with deposition conditions| 1963
- 332
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872. Welding and brazing of tantalum and columbium| 1963
- 332
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An alumina degradation leading to the breakdown of heater-cathode insulation in electron valves| 1963
- 332
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Methods for vacuum deposition of refractory metal films| 1963
- 332
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Thin film production performed continuously| 1963
- 332
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870. An elastometer seal for glass-vacuum desiccators| 1963
- 332
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Molecular flow of oil vapours in piping systems| 1963
- 332
-
873. Electron beam welds moly foil| 1963
- 332
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The vapour pressures and bond energies of some antimony halides| 1963
- 332
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Epoxy vacuum seal for introduction of leads into cryogenic equipment| 1963
- 332
-
High vacuum deposition of cesium| 1963
- 332
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871. Cast acrylic sheet for vacuum forming| 1963
- 332
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Comparison of two methods for measuring the thickness of thin coatings of oxide films on silicon| 1963
- 332
-
Interaction of oxygen at low pressures with molybdenum| 1963
- 333
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Thin film transistor with metal base| 1963
- 333
-
Index to the literature of magnetism (including thin films)| 1963
- 333
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875. Thermal re-arrangement of a perfectly ordered tungsten surface| 1963
- 333
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The effects of gettering (with B2O3) on the forward characteristics of silicon solar cells| 1963
- 333
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Thin film cryton circuits| 1963
- 333
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Tunnel cathode study| 1963
- 333
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Reverse-biased p-n junctions in vacuum tubes| 1963
- 333
-
877. Electronic apparatus for measuring silver layer thickness on mirrors by means of eddy currents| 1963
- 333
-
Capacitance between thin film conductors deposited on substrates of high relative permittivity| 1963
- 333
-
Resonance technique for non-destructive readout of thin magnetic films| 1963
- 333
-
Ball bearings designed to meet special application requirements (cryogenic temperature and hard vacuum conditions)| 1963
- 333
-
Digital thin film memories| 1963
- 333
-
Electron microscopy| 1963
- 333
-
Measurement of laser output by light pressure| 1963
- 333
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876. Ability to voltage-graded surface to support a high voltage in vacuum and in a pressurized gas| 1963
- 333
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High voltage vacuum feed-through| 1963
- 333
-
New theory of adhesion| 1963
- 333
-
Aluminized cathode ray tubes| 1963
- 333
-
An improved bearing arrangement of vacuum operation of the rotary condenser of synchrocyclotron| 1963
- 333
-
The technique of depositing thin metallic films very close to each other in a vacuum and application of the method to the manufacture of field-effect transistor| 1963
- 333
-
The T.F.T., a new thin film transistor| 1963
- 333
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878. Thin film thermocouples for substrate temperature measurement| 1963
- 333
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Vapour source for vacuum deposition of super conductive thin film circuitry| 1963
- 334
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Author index of abstracts| 1963
- 335
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Papers to be published in future issues| 1963
- ii
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Index to advertisers| 1963