Vacuum
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
Table of contents
- 163
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Performance of a new electrostatic getter-ion pumpDenison, D.R. / Bills, D.G. et al. | 1966
- 163
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Inert gas ion pumping using differential sputter yield cathodesTom, T. / James, B.D. et al. | 1966
- 163
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Resistance head sublimatorDenison, D.R. / Bills, D.G. et al. | 1966
- 163
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Triggering sputter ion pumps in ultra-high vacuumKomiya, Souji / Sato, Horonobu / Hayashi, Chikara et al. | 1966
- 163
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Condensation pumping of liquid helium cooled surfacesChubb, J.N. / Gowland, L. / Pollard, I.E. et al. | 1966
- 163
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A differentially pumped ultrahigh vacuum system bakeable to 900°CBlahnik, Carl E / Shoulders, Kenneth R et al. | 1966
- 163
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Removal of hydrogen impurities in closed noble gas discharge systemsBuser, R.G. / Sullivan, J.J. et al. | 1966
- 163
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Measurement of the condensation rates of pump oil vapors using a quartz vibrator microbalanceHolland, L / Laurenson, L / Baker, M.A. et al. | 1966
- 164
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The use of a hot cathode ionization gauge for the measurement of hydrogen pressureWerner, J.G. / Leck, J.H. et al. | 1966
- 164
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An improved gauge calibration techniqueLange, W.J. / Eriksen, D.P. et al. | 1966
- 164
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Transient response of a cryosorption pumped chamberHecht, R / Hoenig, M et al. | 1966
- 164
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Response of low pressure Penning discharge type gaugesLange, W.J. / Singleton, J.H. / Eriksen, D.P. et al. | 1966
- 164
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Some errors in gauge calibrationClake, Peter J et al. | 1966
- 164
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Hydrogen pressure measurement errors and impurity generation using hot cathode gaugesSingleton, J.H. et al. | 1966
- 164
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Reference transfer method of vacuum gauge calibrationMorrison, C.F. et al. | 1966
- 164
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Comparison between static and dynamic calibration methods for ionization gaugesReich, G / Meinke, Ch et al. | 1966
- 164
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Extension of the range of the Moser and Poltz McLeod gauge from 10−10 to 10−2 torrMiller, J.R. III et al. | 1966
- 164
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Pressure conversion constants for magnetron ionization gaugesPelz, David / Newton, George et al. | 1966
- 165
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A high current vacuum discharge for triode-sputtering in the 10−4 torr rangeGaydou, François et al. | 1966
- 165
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Sputtered germanium films on sapphire and germanium substratesWallis, G / Wolsky, S.P. et al. | 1966
- 165
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Vacuum deposition of films by sputtering using an ion-beam sourceChopra, K.L. / Randlett, M.R. et al. | 1966
- 165
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Increase of spectrometer resolving power by digital processingWightman, B.A. et al. | 1966
- 165
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Recrystallization and phase transformations in oxide thin filmsFrancombe, M.H. / Noreika, A.J. / Zeitman, S.A. et al. | 1966
- 165
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Self-sticking coefficients of SiO2 films deposited through rf sputteringJones, R.E. / Standley, C.L. / Maissel, L.I. et al. | 1966
- 165
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Impedance matching network for rf sputtering systemsHealey, D.J. III / Lauriente, M et al. | 1966
- 165
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The measurement of very low pressureRedhead, P.A. et al. | 1966
- 165
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The effect of residual gases on sputtering ratesStern, E et al. | 1966
- 165
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Rf sputter etching—a universal etchDavidse, P.D. et al. | 1966
- 166
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Partial pressure analyses in the presence of a cold surface at a temperature variable between 3°K and 77°KBachler, W / Hoch, H / Nöller, H.G. et al. | 1966
- 166
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Thin films of metals and inorganic compounds vacuum deposited by high energy laserSchwarz, Helmut / Tourtellotte, H.A. et al. | 1966
- 166
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The behaviour of background hydrogen below 10−10 torrHobson, J.P. / Earnshaw, J.W. et al. | 1966
- 166
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Improved quadrupole mass filterBrubaker, Wilson M et al. | 1966
- 166
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New vacuum-evaporated cermet resistor and insulator mixturesRiddle, Grant C et al. | 1966
- 166
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Film deposition by exploding wiresMattox, D.M. / Mullendore, A.W. / Rebarchik, F.N. et al. | 1966
- 166
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III–V compound semiconductors prepared by multisource thermal evaporation techniquesPotter, Roy F et al. | 1966
- 166
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Ion-beam deposition of metal filmsNamba, Susumu / Pil Hyon Kim / Kanekama, Norio et al. | 1966
- 166
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The resolving power of the monopole mass spectrometerGrossel, Stanley S et al. | 1966
- 167
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An investigation of sputtered β tantalum thin filmsCook, HC et al. | 1966
- 167
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Thermodesorption studies of carbon dioxide and oxygen from silverCzanderna, A.W. et al. | 1966
- 167
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Temperature effects on outgassingPagano, Frank et al. | 1966
- 167
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Outgassing of Al2O3 and BeO in vacuum at 540°C and 870°CMcRae, R / Lloyd, H et al. | 1966
- 167
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Resistivity and structure of CrSiO cermet filmsGlang, R / Holmwood, R.A. / Clarke, S et al. | 1966
- 167
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A study of thin film interconnects between dissimilar materialsLauriente, M / Geisler, R / Bassler, S et al. | 1966
- 167
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The causes of pressure fluctuations above oil diffusion pumpTolmie, E.D. / Crawley, D.J. et al. | 1966
- 167
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Diffusion of hydrogen and nitrogen in tungsten and molybdenumFrauenfelder, R et al. | 1966
- 167
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The thermal re-emission of inert gas ions from tungsten and goldErents, K / Lawson, R.P.W. / Carter, G et al. | 1966
- 167
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Reduction of stainless steel outgassing in ultrahigh vacuumCalder, R / Lewin, G et al. | 1966
- 168
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Gas-liquid leakage correlationMarr, J William et al. | 1966
- 168
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Internal bakeout of a large space simulation facilityKratzer, Le Roy H et al. | 1966
- 168
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A vacuum system and procedures for experimentally evaluating parameters affecting the pumping efficiency of a plane cooled with cryogenic fluidsMullen, L.O. / Hiza, M.J. et al. | 1966
- 168
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Radioactive tracer measurements on the back-diffusion of pump oils in ultrahigh vacuum systemsDobrozemsky, R / Huber, W.K. / Viehböck, F et al. | 1966
- 168
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The application of polymide for ultra-high vacuum sealsHait, Paul W et al. | 1966
- 168
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Clean diffusion pump fluids: How they stay that wayHuntress, Arnold R / Schmock, Walter R et al. | 1966
- 168
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Physico-chemical aspects of elastomer technology for UHV applicationsde Csernatony, L et al. | 1966
- 168
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Pressure measurement in cryogenically pumped vacuum systemsTorney, F.L. Jr. et al. | 1966
- 168
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Outgassing of epoxy resins in vacuumBrown, R.D. et al. | 1966
- 168
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Design concepts for a combined space environmental test facilityBoebel, C.P. / Babjak, S.J. et al. | 1966
- 169
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Adsorption on single crystal and polycrystalline nickelLichtman, David / McQuistan, R.B. / Kirst, T.R. et al. | 1966
- 169
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The adsorption of oxygen on discontinuous zirconium filmsFehler, Francis P et al. | 1966
- 169
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Fractionation of antimony triselenideEfstathiou, A / Hoffman, D.M. / Levin, E.R. et al. | 1966
- 169
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Electrical, optical and infrared properties vacuum deposited barium titanate (BaTiO3) thin filmsBrown, Verne R et al. | 1966
- 169
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The evaluation of thin film insulatorsPliskin, W.A. et al. | 1966
- 169
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Gas content of sputtered Ni films using laser induced flash evaporation and mass spectrometryWinters, Harold F / Kay, Eric et al. | 1966
- 169
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Some aspects of electronic processes in the upper atmosphereMcElroy, M.B. et al. | 1966
- 169
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Electron spectrometry of solid surfacesPropst, Franklin M / Piper, Thomas C et al. | 1966
- 169
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Hall effect studies in tantalum-nitrogen thin filmsSosniak, J et al. | 1966
- 169
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The atmospheres of the planetsRasool, SI et al. | 1966
- 169
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Properties of thin piezoelectric filmsde Klerk, J et al. | 1966
- 170
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Effects of size and nucleation on the melting point of small islandsBehrndt, Klaus H et al. | 1966
- 170
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Effect of applied dc fields on the orientation of evaporated NaCl filmsSinclair, W Robert / Stillinger, D.W. et al. | 1966
- 170
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Adsorption of simple gases on evaporated boron filmsMcElligott, P.E. / Roberts, R.W. et al. | 1966
- 170
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A high sensitivity molecular flow detector for direct measurements of capture coefficientsHeald, J.H. Jr et al. | 1966
- 170
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Thin-film epitaxial relationships between phases of the system AuAlNoreika, A.J. / Francombe, M.H. et al. | 1966
- 170
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Deposition of cesium on a rhenium substrateWebster, Harold F et al. | 1966
- 170
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A correlation of experimental and theoretical isotherms for helium on aluminumBryant, P.J. / Gosselin, C.M. / Taylor, L.H. et al. | 1966
- 170
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Structure determined electrical transport properties of bismuth thin filmsNeuman, Michael R / Ko, Wen H et al. | 1966
- 171
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Epitaxial gallium arsenide thin filmsSteinberg, R.F. et al. | 1966
- 171
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Formation of single crystal oxide films by reactive and direct depositionKrikorian, E et al. | 1966
- 171
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Friction and wear behaviour of molybdenum disulfide in air, ultrahigh vacuum and dry nitrogenWolkowitz, William et al. | 1966
- 171
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An apparatus for the measurement of friction and wear as a function of speed and load in ultrahigh vacuum and controlled atmospheresHaltner, Arthur J et al. | 1966
- 171
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Flow and fracture of metals under space vacuaFeuerstein, Seymour et al. | 1966
- 171
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Dependence of adhesion of metals on gaseous environmentGilbreath, William P / Williams, Dell P et al. | 1966
- 171
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GaAs thin-film evaporation and crystal growthZyetz, MC / Despres, AM et al. | 1966
- 171
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Sixteen tests on two bearing materials in an ultrahigh vacuumKrysiak, J.E. / Venneman, W.F. et al. | 1966
- 171
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Epitaxy of thin films of cobalt and titaniumGrünbaum, E / Kremer, G / Schwarz, R et al. | 1966
- 172
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Friction of solid film lubricants under conditions of slow sliding velocity in ultrahigh vacuumWilkinson, C.S. / Skyrus, J.P. et al. | 1966
- 172
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The influence of adsorbed gases on surface analysis by low-energy ion scatteringSmith, David P et al. | 1966
- 172
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Nimbus solar array drive bearings lubricant investigation for operation in orbital vacuum-thermal environmentLondon, Alexander / Neville, Thomas R Jr et al. | 1966
- 172
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A device for studying interaction of low density gases with liquid metal clean surfacesFazekas, EI et al. | 1966
- 179
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A new type of ion pump| 1966
- 180
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Eurofair USA| 1966
- 180
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Blairs supply ejectors for vacuum steelmaking plant| 1966
- 180
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New UK representative| 1966
- 180
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Venco Literature| 1966
- 180
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Progress at Leybolds| 1966
- 180
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Bir-Vac news| 1966
- 180
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Silastomer silicone rubbers meet new specifications| 1966
- 181
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Veeco moves premises| 1966
- 181
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New directors appointed at Edwards Hugh Vacuum Limited| 1966
- 181
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Mr D Riley| 1966
- 181
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R W Lambert, AMBIM| 1966
- 182
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Vecco appointment| 1966
- 182
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Appointment to vaccum editorial board| 1966
- 182
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Hilger and Watts Ltd| 1966
- 185
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15. Fluid dynamics| 1966
- 185
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14. Kinetic theory of gases| 1966
- 185
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10. Vacuum science and technology| 1966
- 185
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11. Production of low pressures| 1966
- 186
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16. Gases and Solids| 1966
- 187
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18. Gaseous electronics| 1966
- 188
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20. Pumping systems| 1966
- 189
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21. Pumps and pump fluids| 1966
- 191
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22. Gauges| 1966
- 192
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23. Plumbing| 1966
- 192
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26. Automatic protective and control equipment| 1966
- 192
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24. Valves| 1966
- 192
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25. Baffles, traps and refrigeration equipment| 1966
- 193
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30. Evaporation and sputtering| 1966
- 193
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28. Heating equipment and thermometers| 1966
- 195
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31. Evacuation and sealing| 1966
- 196
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33. General physics and electronics| 1966
- 196
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32. Nucleonics| 1966
- 197
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36. Drying, degassing and concentration| 1966
- 198
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37. Metallurgy, inorganic chemistry, analytical chemistry| 1966
- 200
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39. Miscellaneous applications| 1966
- 200
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41. Metals and alloys| 1966
- 200
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43. Plastics and elastomers| 1966
- 200
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44. Waxes, lubricants, cements, lacquers, paints, oils| 1966
- 201
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47. Outgassing data, vapour pressure data, gettering data, residual gases in vacuum systems, residual gas analysis| 1966
- 201
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56. Electrical engineering, electronics circuit, electrical devices| 1966
- 201
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48. Heating, refrigeration, ultrasonics, centrifuging| 1966
- 201
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45. Soldering, welding, brazing, solders| 1966
- 202
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Author index of abstracts| 1966
- ii
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Index to advertisers| 1966