Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
Table of contents
- 2611
-
Growth of low-defect density on GaAs by molecular beam epitaxyPickrell, G. W. / Chang, K. L. / Epple, J. H. et al. | 2000
- 2615
-
Investigation of mesa-sidewall effects on direct current and radio frequency characteristics of pseudomorphic high electron mobility transistorsYen, Chih-Hung / Lin, Kuan-Po / Yu, Kuo-Hui et al. | 2000
- 2620
-
Diode structures based on for optoelectronic applications in the near-ultraviolet range of the spectrumStarikov, D. / Berishev, I. / Um, J.-W. et al. | 2000
- 2624
-
Study of current leakage in InAs photodetectorsLin, Ray-Ming / Tang, Shiang-Feng / Kuan, C. H. et al. | 2000
- 2627
-
Low temperature deposition for high performance photodetectorHe, Lili et al. | 2000
- 2631
-
Effect of growth interruption and the introduction of on the growth of InGaN/GaN multiple quantum wellsMoon, Yong-Tae / Kim, Dong-Joon / Song, Keun-Man et al. | 2000
- 2635
-
Site control of InAs quantum dots on GaAs surfaces patterned by in situ electron-beam lithographyIshikawa, T. / Kohmoto, S. / Nishikawa, S. et al. | 2000
- 2640
-
Fabrication technology of a Si nanowire memory transistor using an inorganic electron beam resist processTsutsumi, Toshiyuki / Ishii, Kenichi / Hiroshima, Hiroshi et al. | 2000
- 2646
-
Deposition of Fe clusters on Si surfacesUpward, M. D. / Cotier, B. N. / Moriarty, P. et al. | 2000
- 2650
-
Initial growth analysis of Si overlayers on cerium oxide layersKim, Chong Geol et al. | 2000
- 2653
-
Electrical properties of self-organized nanostructures of alkanethiol-encapsulated gold particlesHuang, Shujuan / Tsutsui, Gen / Sakaue, Hiroyuki et al. | 2000
- 2658
-
Atomic force microscopy of reaction of ammonia gas with crystalline substituted benzoic acidZeng, Qingdao / Wang, Chen / Bai, Chunli et al. | 2000
- 2664
-
Effect of photoenhanced minority carriers in metal-oxide-semiconductor capacitor studied by scanning capacitance microscopyShin, S. / Kye, J.-I. / Pi, U. H. et al. | 2000
- 2669
-
Integrated atomic force microscopy array probe with metal–oxide–semiconductor field effect transistor stress sensor, thermal bimorph actuator, and on-chip complementary metal–oxide–semiconductor electronicsAkiyama, T. / Staufer, U. / de Rooij, N. F. et al. | 2000
- 2676
-
X-ray source combined ultrahigh-vacuum scanning tunneling microscopy for elemental analysisHasegawa, Y. / Tsuji, K. / Nakayama, K. et al. | 2000
- 2681
-
New method for imaging atomsDou, Juying / Chen, Ergang / Zhu, Changchun et al. | 2000
- 2684
-
Dual tunneling-unit scanning tunneling microscope for practical length measurement based on reference scalesZhang, Haijun / Wu, Lan / Huang, Feng et al. | 2000
- 2688
-
Effect of metal–insulator–semiconductor structure derived space charge field on the tip vibration signal in electrostatic force microscopyHong, Seungbum / Woo, Jungwon / Shin, Hyunjung et al. | 2000
- 2692
-
Wide dynamic range silicon diaphragm vacuum sensor by electrostatic servo systemMiyashita, Haruzo / Esashi, Masayoshi et al. | 2000
- 2698
-
Field emission properties of nanocomposite carbon nitride filmsAlexandrou, I. / Baxendale, M. / Rupesinghe, N. L. et al. | 2000
- 2704
-
Study of the emission performance of carbon nanotubesWei, Lei / Baoping, Wang / Linsu, Tong et al. | 2000
- 2710
-
Influence of diamond film thickness on field emission characteristicsJi, H. / Jin, Z. S. / Gu, C. Z. et al. | 2000
- 2714
-
Characterization of the surface morphology and electronic properties of microwave enhanced chemical vapor deposited diamond filmsFitzgerald, A. G. / Fan, Y. / John, P. et al. | 2000
- 2722
-
Enhancement in field emission of silicon microtips by bias-assisted carburizationKichambare, P. D. / Tarntair, F. G. / Chen, L. C. et al. | 2000
- 2730
-
Polysubstituted derivatives of triphenylene as high resolution electron beam resists for nanolithographyRobinson, A. P. G. / Palmer, R. E. / Tada, T. et al. | 2000
- 2737
-
Comparative study of sputtered and spin-coatable aluminum oxide electron beam resistsSaifullah, M. S. M. / Kurihara, K. / Humphreys, C. J. et al. | 2000
- 2745
-
How to make polyvinylphenol inhibitable by diazonaphthoquinone sulfonatesYan, Zhenglin / Yeh, Tung-Feng / He, Xiaohua et al. | 2000
- 2750
-
High performance micropane electron beam windowDougal, Roger A. / Liu, Shengyi et al. | 2000
- 2757
-
Design and development of plasma enhanced chemical vapor deposition universal antireflective layer films for deep subquarter micron deep ultraviolet applicationsWang, Ying / MacWilliams, Ken / Karim, Zia et al. | 2000
- 2763
-
Effects of fluorocarbon polymer deposition on the selective etching of in high density plasmaChu, Changwoong / Ahn, Taehyuk / Kim, Jisoo et al. | 2000
- 2769
-
Direct pattern etching for micromachining applications without the use of a resist maskCho, Byeong-Ok / Ryu, Jung-Hyun / Hwang, Sung-Wook et al. | 2000
- 2774
-
Electron population above 13.5 eV in ultrahigh frequency and inductively coupled plasmas through and gas mixturesNakano, Toshiki / Samukawa, Seiji et al. | 2000
- 2780
-
Study of grass formation in GaAs backside via etching using inductively coupled plasma systemNam, P. S. / Ferreira, L. M. / Lee, T. Y. et al. | 2000
- 2785
-
Two-channel spectroscopic reflectometry for in situ monitoring of blanket and patterned structures during reactive ion etchingStutzman, Brooke S. / Huang, Hsu-Ting / Terry, Fred L. et al. | 2000
- 2794
-
Development and qualification of a vacuum pumping system for metalorganic vapor phase epitaxy copper precursorsDavis, R. P. / Abreu, R. A. et al. | 2000
- 2799
-
Oxygen plasma induced degradation in InGaAs/InP heterostructuresDriad, R. / McKinnon, W. R. / McAlister, S. P. et al. | 2000
- 2803
-
reactive ion etching induced damage of InPNeitzert, H. C. / Fang, R. / Kunst, M. et al. | 2000
- 2808
-
Characterization of showerhead performance at low pressureHash, D. B. / Mihopoulos, T. / Govindan, T. R. et al. | 2000
- 2814
-
Thermal stability and adhesion improvement of Ag deposited on by oxygen plasma treatmentGadre, Kaustubh S. / Alford, T. L. et al. | 2000
- 2820
-
Thermal modeling of a polysilicon-metal test structure used for thermally induced voltage alteration characterizationTangyunyong, Paiboon / Benson, David / Cole, Edward I. et al. | 2000
- 2826
-
Influence of underlying interlevel dielectric films on extrusion formation in aluminum interconnectsChen, Fen / Li, Baozhen / Sullivan, Timothy D. et al. | 2000
- 2835
-
Characterization of additive systems for damascene Cu electroplating by the superfilling profile monitorChiu, Shao-Yu / Shieh, Jia-Min / Chang, Shih-Chieh et al. | 2000
- 2842
-
Effect of various sputtering parameters on Ta phase formation using an I-Optimal experimental designWhitman, Charles S. et al. | 2000
- 2848
-
Electrical characteristics of metal–ferroelectric –insulator structure for nonvolatile memory applicationsSze, Chi-yuan / Lee, Joseph Ya-min et al. | 2000
- 2851
-
Electronic structure and mechanical properties of hard coatings from the chromium–tungsten nitride systemHones, P. / Diserens, M. / Sanjinés, R. et al. | 2000
- 2857
-
Electron-beam direct writing using RD2000N for fabrication of nanodevicesDutta, A. / Lee, S. P. / Hayafune, Y. et al. | 2000
- 2862
-
Thin layers on Si(111) with ultralow atomic step densityOliver, Antonio C. / Blakely, Jack M. et al. | 2000
- 2877
-
Implementing advanced lithography technology: A 100 MHz, 1 V digital signal processor fabricated with phase shifted gatesWatson, G. P. / Kizilyalli, I. C. / Nalamasu, O. et al. | 2000
- 2881
-
Lithographic patterning and confocal imaging with zone platesGil, Darı́o / Menon, Rajesh / Carter, D. J. D. et al. | 2000
- 2886
-
Sub-100 nm silicon on insulator complimentary metal–oxide semiconductor transistors by deep ultraviolet optical lithographyFritze, M. / Burns, J. / Wyatt, P. W. et al. | 2000
- 2891
-
Defect formation and structural alternation in modified glasses by irradiation with laser or ArF excimer laserIkuta, Yoshiaki / Kikugawa, Shinya / Hirano, Masahiro et al. | 2000
- 2896
-
Shape engineering: A novel optical proximity correction technique for attenuated phase-shift maskPau, S. / Bolan, K. / Blakey, M. et al. | 2000
- 2900
-
Analytic study of gratings patterned by evanescent near field optical lithographyMcNab, S. J. / Blaikie, R. J. / Alkaisi, M. M. et al. | 2000
- 2905
-
Development of the large field extreme ultraviolet lithography cameraWatanabe, T. / Kinoshita, H. / Nii, H. et al. | 2000
- 2911
-
Extreme ultraviolet alignment and testing of a four-mirror ring field extreme ultraviolet optical systemGoldberg, Kenneth A. / Naulleau, Patrick / Batson, Phillip et al. | 2000
- 2916
-
At-wavelength extreme ultraviolet lithography mask inspection using a Mirau interferometric microscopeHaga, Tsuneyuki / Takenaka, Hisataka / Fukuda, Makoto et al. | 2000
- 2921
-
Reticle’s contribution to critical dimension control and overlay in extreme-ultraviolet lithographyMeiling, H. / Benschop, J. P. H. / Loopstra, E. et al. | 2000
- 2926
-
Extreme ultraviolet mask defect simulation: Low-profile defectsPistor, Tom / Deng, Yunfei / Neureuther, Andrew et al. | 2000
- 2930
-
Characterization of extreme ultraviolet lithography mask defects from extreme ultraviolet far-field scattering patternsYi, Moonsuk / Jeong, Seongtae / Rekawa, Seno et al. | 2000
- 2935
-
Extreme ultraviolet holographic microscopy and its application to extreme ultraviolet mask-blank defect characterizationLee, Sang Hun / Bokor, Jeffrey / Naulleau, Patrick et al. | 2000
- 2939
-
Extreme ultraviolet carrier-frequency shearing interferometry of a lithographic four-mirror optical systemNaulleau, Patrick P. / Goldberg, Kenneth A. / Bokor, Jeffrey et al. | 2000
- 2944
-
Effects of smoothing on defect printability at extreme ultraviolet wavelengthsCardinale, G. F. / Ray-Chaudhuri, A. K. / Fisher, A. et al. | 2000
- 2950
-
Proposal for a 50 nm proximity x-ray lithography system and extension to 35 nm by resist material selectionKitayama, Toyoki / Itoga, Kenji / Watanabe, Yutaka et al. | 2000
- 2955
-
Technology and performance of the Canon XRA-1000 production x-ray stepperMizusawa, Nobutoshi / Uda, Kouji / Tanaka, Yutaka et al. | 2000
- 2961
-
Overlay evaluation of proximity x-ray lithography in 100 nm device fabricationAoyama, H. / Taguchi, T. / Matsui, Y. et al. | 2000
- 2966
-
Membrane-mask distortion correction: Analytical and experimental resultsMurooka, Ken-ichi / Lim, Michael H. / Smith, Henry I. et al. | 2000
- 2970
-
Nanofabrication and diffractive optics for high-resolution x-ray applicationsAnderson, Erik H. / Olynick, Deirdre L. / Harteneck, Bruce et al. | 2000
- 2976
-
Generation of arbitrary three dimensional surfaces by x-ray lithographyFeldman, M. / Lee, G. S. / Noel, D. et al. | 2000
- 2981
-
Zone-plate-array lithography using synchrotron radiationPépin, A. / Decanini, D. / Chen, Y. et al. | 2000
- 2986
-
Performance of a compact beamline with high brightness for x-ray lithographyHirose, Sayumi / Miyatake, Tsutomu / Li, Xuan et al. | 2000
- 2990
-
Highly accurate x-ray masks with 100-nm-class high-density device patternsUchiyama, Shingo / Shimada, Masaru / Tsuchizawa, Tai et al. | 2000
- 2995
-
Overlay compatibility between two synchroton radiation steppersFukuda, Makoto / Suzuki, Masanori / Haga, Tsuneyuki et al. | 2000
- 2999
-
Scaled measurements of global space-charge induced image blur in electron beam projection systemHan, Liqun / Pease, R. Fabian / Meisburger, W. Dan et al. | 2000
- 3004
-
Structure of stochastic Coulomb interactions in electron beam columnsWu, Bo / Neureuther, Andrew R. et al. | 2000
- 3010
-
Multisource optimization of a column for electron lithographyMankos, M. / Coyle, S. / Fernandez, A. et al. | 2000
- 3017
-
Electron optical image correction subsystem in electron beam projection lithographyKojima, S. / Stickel, W. / Rockrohr, J. D. et al. | 2000
- 3023
-
Analytic evaluation of the intensity point spread functionGallatin, Gregg M. et al. | 2000
- 3029
-
Application of the generalized curvilinear variable axis lens to electron projectionStickel, W. / Langner, G. O. et al. | 2000
- 3034
-
Computer aided design and analysis of imaging energy filters with inhomogeneous bending magnetsMunro, Eric / Rouse, John et al. | 2000
- 3042
-
Prospect for high brightness III–nitride electron emitterMachuca, Francisco / Sun, Y. / Liu, Z. et al. | 2000
- 3047
-
Depth of field at high magnifications of scanning electron microscopesSato, Mitsugu / Mizuno, Fumio et al. | 2000
- 3052
-
Demonstration of multiblanker electron-beam technologyWinograd, G. / Krishnamurthi, V. / Garcia, R. et al. | 2000
- 3057
-
Optimization of microcolumn electron optics for high-current applicationsMankos, M. / Lee, K. Y. / Muray, L. et al. | 2000
- 3061
-
New concept for high-throughput multielectron beam direct write systemMuraki, Masato / Gotoh, Susumu et al. | 2000
- 3067
-
Correction of the field curvature in SCALPEL projection systemsXiu, K. / Gibson, J. M. et al. | 2000
- 3072
-
PREVAIL Alpha system: Status and design considerationsGolladay, S. D. / Pfeiffer, H. C. / Rockrohr, J. D. et al. | 2000
- 3079
-
PREVAIL: Dynamic correction of aberrationsGordon, M. S. / Enichen, W. A. / Golladay, S. D. et al. | 2000
- 3084
-
Patterning performance of EB-X3 x-ray mask writerOhki, Shigehisa / Watanabe, Toshifumi / Takeda, Yuji et al. | 2000
- 3089
-
Evaluation of a 100 kV thermal field emission electron-beam nanolithography systemTennant, D. M. / Fullowan, R. / Takemura, H. et al. | 2000
- 3095
-
Calculation of surface potential and beam deflection due to charging effects in electron beam lithographyLee, Yongjae / Lee, Woojin / Chun, Kukjin et al. | 2000
- 3099
-
Advances in arrayed microcolumn lithographyMuray, L. P. / Spallas, J. P. / Stebler, C. et al. | 2000
- 3105
-
Quantitative factor analysis of resolution limit in electron beam lithography using the edge roughness evaluation methodYoshizawa, Masaki / Moriya, Shigeru et al. | 2000
- 3111
-
Grid lens approach for high effective emittance in SCALPEL®Moonen, D. / van Kranen, S. / Kruit, P. et al. | 2000
- 3115
-
Analytical-based solutions for SCALPEL wafer heatingFares, N. / Stanton, S. / Liddle, J. et al. | 2000
- 3122
-
Charge induced pattern distortion in low energy electron beam lithographySatyalakshmi, K. M. / Olkhovets, A. / Metzler, M. G. et al. | 2000
- 3126
-
Electron optical column for a multicolumn, multibeam direct-write electron beam lithography systemYin, E. / Brodie, A. D. / Tsai, F. C. et al. | 2000
- 3132
-
Demagnifying immersion magnetic lenses used for projection electron beam lithography without crossoversCheng, Min / Tang, Tiantong et al. | 2000
- 3138
-
Implementation of real-time proximity effect correction in a raster shaped beam toolBoegli, V. / Johnson, L. / Kao, H. et al. | 2000
- 3143
-
Sub-0.1 μ electron-beam lithography for nanostructure developmentPeckerar, Martin / Bass, Robert / Rhee, Kee Woo et al. | 2000
- 3150
-
Proximity effect correction using pattern shape modification and area density mapTakahashi, Kimitoshi / Osawa, Morimi / Sato, Masami et al. | 2000
- 3158
-
Carrier distribution profiles in Si-doped layers in GaAs formed by focused ion beam implantation and successive overlayer growthHada, Takuo / Goto, Takayuki / Yanagisawa, Junichi et al. | 2000
- 3162
-
Focused ion beam patterning of III–V crystals at low temperature: A method for improving the ion-induced defect localizationSchneider, M. / Gierak, J. / Marzin, J. Y. et al. | 2000
- 3168
-
Focused electron beam induced deposition of goldUtke, I. / Hoffmann, P. / Dwir, B. et al. | 2000
- 3172
-
Pattern generators and microcolumns for ion beam lithographyScott, K. L. / King, T.-J. / Lieberman, M. A. et al. | 2000
- 3177
-
Determination of resist exposure parameters in helium ion beam lithography: Absorbed energy gradient, contrast, and critical doseRuchhoeft, P. / Wolfe, J. C. et al. | 2000
- 3181
-
Three-dimensional nanostructure fabrication by focused-ion-beam chemical vapor depositionMatsui, Shinji / Kaito, Takashi / Fujita, Jun-ichi et al. | 2000
- 3185
-
Optimal strategy for controlling linewidth on spherical focal surface arraysRuchhoeft, P. / Wolfe, J. C. et al. | 2000
- 3190
-
Modeling of focused ion beam induced surface chemistryEdinger, Klaus / Kraus, Thomas et al. | 2000
- 3194
-
Performance of multicusp plasma ion source for focused ion beam applicationsScipioni, L. / Stewart, D. / Ferranti, D. et al. | 2000
- 3198
-
Maskless deposition of gold patterns on siliconErickson, Lynden E. / Schmuki, Patrik / Champion, Garth et al. | 2000
- 3202
-
Fabrication of open stencil masks with asymmetric void ratio for the ion projection lithography space charge experimentVolland, B. / Shi, F. / Heerlein, H. et al. | 2000
- 3207
-
Experimental evaluation of an optimized radiation cooling geometry for ion projection lithography masksTorres, J. L. / Nounu, H. N. / Wasson, J. R. et al. | 2000
- 3210
-
Fabrication of masks for electron-beam projection lithographyLercel, Michael / Magg, Chris / Barrett, Monica et al. | 2000
- 3216
-
Progress in extreme ultraviolet mask repair using a focused ion beamLiang, Ted / Stivers, Alan / Livengood, Richard et al. | 2000
- 3221
-
Mechanical analysis of the PLASMAX particle removal process for optical and next-generation lithography masksSemke, W. H. / Weisbrod, E. J. / Engelstad, R. L. et al. | 2000
- 3227
-
Characterization of phase defects in phase shift masksAdam, Konstantinos / Hotta, Shoji / Neureuther, Andrew R. et al. | 2000
- 3232
-
TaSiN thin-film pattern transfer optimization for 200 mm SCALPEL and extreme ultraviolet lithography masksDauksher, W. J. / Resnick, D. J. / Clemens, S. B. et al. | 2000
- 3237
-
High-performance membrane mask for electron projection lithographyYamashita, Hiroshi / Amemiya, Isao / Nomura, Eiichi et al. | 2000
- 3242
-
Inter- and intramembrane resist critical dimension uniformity across a SCALPEL maskNordquist, K. / Ainley, E. / Resnick, D. J. et al. | 2000
- 3248
-
Simulating the mechanical response of electron-beam projection lithography masksJachim, A. F. / Chen, C.-F. / Engelstad, R. L. et al. | 2000
- 3254
-
Stencil reticle repair for electron beam projection lithographyOkada, Masashi / Shimizu, Sumito / Kawata, Shintaro et al. | 2000
- 3259
-
Thickness analysis of silicon membranes for stencil masksSossna, E. / Kassing, R. / Rangelow, I. W. et al. | 2000
- 3264
-
Scanning probe metrology in the presence of surface chargeGriffith, J. E. / Kneedler, E. M. / Ningen, S. et al. | 2000
- 3268
-
Two-dimensional spatial-phase-locked electron-beam lithography via sparse samplingHastings, J. T. / Zhang, Feng / Finlayson, M. A. et al. | 2000
- 3272
-
Microcomb design and fabrication for high accuracy optical assemblyChen, Carl G. / Heilmann, Ralf K. / Konkola, Paul T. et al. | 2000
- 3277
-
Relativistic corrections in displacement measuring interferometryHeilmann, Ralf K. / Konkola, Paul T. / Chen, Carl G. et al. | 2000
- 3282
-
Beam steering system and spatial filtering applied to interference lithographyKonkola, Paul T. / Chen, Carl G. / Heilmann, Ralf K. et al. | 2000
- 3287
-
Characterization of field stitching in electron-beam lithography using moiré metrologyMurphy, T. E. / Mondol, Mark K. / Smith, Henry I. et al. | 2000
- 3292
-
Surface and line-edge roughness in solution and plasma developed negative tone resists: Experiment and simulationPatsis, G. P. / Tserepi, A. / Raptis, I. et al. | 2000
- 3297
-
Energy transfer between electrons and photoresist: Its relation to resolutionHan, Geng / Cerrina, Franco et al. | 2000
- 3303
-
Comparison of resist collapse properties for deep ultraviolet and 193 nm resist platformsCao, Heidi B. / Nealey, Paul F. / Domke, Wolf-Dieter et al. | 2000
- 3308
-
Supercritical drying for water-rinsed resist systemsNamatsu, Hideo et al. | 2000
- 3313
-
Aqueous-based photoresist drying using supercritical carbon dioxide to prevent pattern collapseGoldfarb, Darı́o L. / de Pablo, Juan J. / Nealey, Paul F. et al. | 2000
- 3318
-
Enhancement of resist resolution and sensitivity via applied electric fieldCheng, Mosong / Croffie, Ebo / Yuan, Lei et al. | 2000
- 3323
-
Optimized bilayer hexamethyldisiloxane film as bottom antireflective coating for both KrF and ArF lithographiesLin, C. H. / Wang, L. A. / Chen, H. L. et al. | 2000
- 3328
-
Vacuum ultraviolet spectra of fluorocompounds for 157 nm lithographyToriumi, Minoru / Satou, Isao / Itani, Toshiro et al. | 2000
- 3332
-
Polymer photochemistry at advanced optical wavelengthsFedynyshyn, Theodore H. / Kunz, Roderick R. / Sinta, Roger F. et al. | 2000
- 3340
-
Modeling influence of structural changes in photoacid generators on 193 nm single layer resist imagingCroffie, Ebo / Yuan, Lei / Cheng, Mosong et al. | 2000
- 3345
-
Lithographic performance of thin dendritic polymer resistsWilliamson, Mike / Neureuther, Andy et al. | 2000
- 3349
-
Resist profile characteristics caused by photoelectron and Auger electron blur at the resist–tungsten substrate interface in 100 nm proximity x-ray lithographySeo, Younghun / Lee, Changhwan / Seo, Yongduk et al. | 2000
- 3354
-
Evaluation of alternative development process for high-aspect-ratio poly(methylmethacrylate) microstructures in deep x-ray lithographyMalek, Chantal Khan / Yajamanyam, Sasi et al. | 2000
- 3360
-
Lithography using ultrathin resist filmsPike, Christopher / Bell, Scott / Lyons, Chris et al. | 2000
- 3364
-
Outgassing of photoresist materials at extreme ultraviolet wavelengthsDentinger, Paul M. et al. | 2000
- 3371
-
Correlation between the chemical compositions and optical properties of embedded layer for attenuated phase-shifting mask in 193 nm and the modification of the method for measuring n and kLin, Cheng-ming / Loong, Wen-an et al. | 2000
- 3376
-
Scaling of and reaction rate with film thickness in photoresist: A thermal probe studyFryer, David S. / Nealey, Paul F. / de Pablo, Juan J. et al. | 2000
- 3381
-
Thin film instabilities and implications for ultrathin resist processesOkoroanyanwu, Uzodinma et al. | 2000
- 3388
-
Resolution limit of negative tone chemically amplified resist used for hybrid lithography: Influence of the molecular weightPain, L. / Higgins, C. / Scarfoglière, B. et al. | 2000
- 3396
-
157 nm resist materials: Progress reportBrodsky, Colin / Byers, Jeff / Conley, Will et al. | 2000
- 3402
-
Outgassing of photoresists in extreme ultraviolet lithographyChauhan, Maharshi M. / Nealey, Paul F. et al. | 2000
- 3408
-
1 kV resist technology for microcolumn-based electron-beam lithographyLee, K. Y. / Hsu, Y. / Le, P. et al. | 2000
- 3414
-
Nanoscale patterning of self-assembled monolayers with electronsGölzhäuser, A. / Geyer, W. / Stadler, V. et al. | 2000
- 3419
-
Hydrogen silsesquioxane/novolak bilayer resist for high aspect ratio nanoscale electron-beam lithographyvan Delft, Falco C. M. J. M. / Weterings, Jos P. / van Langen-Suurling, Anja K. et al. | 2000
- 3424
-
High-purity, ultrahigh-resolution calixarene electron-beam negative resistManako, Shoko / Ochiai, Yukinori / Yamamoto, Hiromasa et al. | 2000
- 3428
-
Calixarene G-line double resist process with 15 nm resolution and large area exposure capabilityKedzierski, Jakub / Anderson, Erik / Bokor, Jeffrey et al. | 2000
- 3431
-
Aqueous base development and acid diffusion length optimization in negative epoxy resist for electron beam lithographyGlezos, N. / Argitis, P. / Velessiotis, D. et al. | 2000
- 3435
-
Roughness study of a positive tone high performance SCALPEL resistOcola, L. E. / Orphanos, P. A. / Li, W.-Y. et al. | 2000
- 3441
-
Influence of developer and development conditions on the behavior of high molecular weight electron beam resistsHasko, D. G. / Yasin, Shazia / Mumtaz, A. et al. | 2000
- 3445
-
Evolutionary optimization of the electron-beam lithography process for gate fabrication of high electron mobility transistorsRobin, Franck / Orzati, Andrea / Homan, Otte J. et al. | 2000
- 3450
-
Mechanical properties and pattern collapse of chemically amplified photoresistsQue, Long / Gianchandani, Yogesh B. et al. | 2000
- 3453
-
Kinetics and crystal orientation dependence in high aspect ratio silicon dry etchingBlauw, M. A. / Zijlstra, T. / Bakker, R. A. et al. | 2000
- 3462
-
High speed anisotropic dry etching of CoNbZr for next generation magnetic recordingAndriesse, M. S. P. / Zijlstra, T. / van der Drift, E. et al. | 2000
- 3467
-
Effects of reactive ion etching on the electrical characteristics of GaNRong, B. / Cheung, R. / Gao, W. et al. | 2000
- 3471
-
High resolution inductively coupled plasma etching of 30 nm lines and spaces in tungsten and siliconGoodyear, Andrew L. / Mackenzie, Sinclair / Olynick, Deirdre L. et al. | 2000
- 3476
-
Micromask-induced surface defects inside Si trench isolationRho, Kyeonglan et al. | 2000
- 3481
-
Quantum interference in a vacuum nanotriodeDriskill-Smith, A. A. G. / Hasko, D. G. / Ahmed, H. et al. | 2000
- 3488
-
Comparative study of self-aligned and nonself-aligned SiGe modulation-doped field effect transistors with nanometer gate lengthsLu, Wu / Koester, Steven J. / Wang, Xie-Wen et al. | 2000
- 3493
-
Fabrication technique for nanometer-scale InAs quantum devices: Observation of quantum interference in Aharonov–Bohm rings and Coulomb blockade in quantum dotsChang, T. H. / Chen, K. A. / Yang, C. H. et al. | 2000
- 3497
-
Nanofabrication using structure controlled hydrogenated Si clusters deposited on Si surfacesKanayama, Toshihiko / Watanabe, Miyoko O. / Bolotov, Leonid et al. | 2000
- 3501
-
Nanofabrication techniques for lasers with two-dimensional photonic crystal mirrorsMoosburger, J. / Happ, Th. / Kamp, M. et al. | 2000
- 3505
-
Fabrication of three-dimensional photonic structures with submicrometer resolution by x-ray lithographyCuisin, C. / Chelnokov, A. / Lourtioz, J.-M. et al. | 2000
- 3510
-
Drilled alternating-layer structure for three-dimensional photonic crystals with a full band gapKuramochi, Eiichi / Notomi, Masaya / Tamamura, Toshiaki et al. | 2000
- 3514
-
Nanoheteroepitaxy: Nanofabrication route to improved epitaxial growthZubia, D. / Zaidi, S. H. / Hersee, S. D. et al. | 2000
- 3521
-
Fabrication of 30 nm T gates using as a supporting and definition layerChen, Y. / Edgar, D. / Li, X. et al. | 2000
- 3525
-
Progress on nanostructuring with NanojetVoigt, J. / Shi, F. / Hudek, P. et al. | 2000
- 3530
-
Combining advanced lithographic techniques and self-assembly of thin films of diblock copolymers to produce templates for nanofabricationPeters, Richard D. / Yang, Xiao M. / Wang, Qiang et al. | 2000
- 3535
-
Oxide nanodots and ultrathin layers fabricated on silicon using nonfocused multicharged ion beamsBorsoni, G. / Gros-Jean, M. / Korwin-Pawlowski, M. L. et al. | 2000
- 3539
-
Optimization of a lithographic and ion beam etching process for nanostructuring magnetoresistive thin film stacksWalsh, Michael E. / Hao, Yaowu / Ross, C. A. et al. | 2000
- 3544
-
Field emission cathode array with self-aligned gate electrode fabricated by silicon micromachiningBarth, W. / Debski, T. / Shi, F. et al. | 2000
- 3549
-
Actuation and internal friction of torsional nanomechanical silicon resonatorsOlkhovets, A. / Evoy, S. / Carr, D. W. et al. | 2000
- 3552
-
Novel alignment system for imprint lithographyWhite, D. L. / Wood, O. R. et al. | 2000
- 3557
-
Nanoimprint lithography at the 6 in. wafer scaleHeidari, Babak / Maximov, Ivan / Montelius, Lars et al. | 2000
- 3561
-
Fabrication of quantum point contacts by imprint lithography and transport studiesMartini, Ingo / Kuhn, Silke / Kamp, Martin et al. | 2000
- 3564
-
Quantitative analysis of the molding of nanostructuresSchift, H. / David, C. / Gobrecht, J. et al. | 2000
- 3569
-
Electron-beam fabrication of nonplanar templates for contact printingRhee, K. W. / Shirey, L. M. / Isaacson, P. I. et al. | 2000
- 3572
-
Step and flash imprint lithography: Template surface treatment and defect analysisBailey, T. / Choi, B. J. / Colburn, M. et al. | 2000
- 3578
-
Comparison of infrared frequency selective surfaces fabricated by direct-write electron-beam and bilayer nanoimprint lithographiesPuscasu, Irina / Boreman, G. / Tiberio, R. C. et al. | 2000
- 3582
-
Master replication into thermosetting polymers for nanoimprintingSchulz, H. / Lyebyedyev, D. / Scheer, H.-C. et al. | 2000
- 3586
-
Directed assembly of carbon nanotube electronic circuits by selective area chemical vapor deposition on prepatterned catalyst electrode structuresWei, Y. Y. / Fan, X. / Eres, Gyula et al. | 2000
- 3590
-
Real time pattern changing in atomic beam holography using phase shift by Stark effectFujita, J. / Mitake, S. / Shimizu, F. et al. | 2000
- 3594
-
Lithographically defined nano and micro sensors using “float coating” of resist and electron beam lithographyZhou, H. / Chong, B. K. / Stopford, P. et al. | 2000
- 3600
-
Microcalorimetry applications of a surface micromachined bolometer-type thermal probeLi, Mo-Huang / Gianchandani, Yogesh B. et al. | 2000
- 3604
-
Novel multibridge-structured piezoelectric microdevice for scanning force microscopyChu, J. / Wang, Z. / Maeda, R. et al. | 2000
- 3608
-
Fabrication of diffractive optical elements for an integrated compact optical microelectromechanical system laser scannerWendt, J. R. / Krygowski, T. W. / Vawter, G. A. et al. | 2000