Vacuum
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Table of contents
- 345
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Determination of absolute orientation-dependent TiN(001) and TiN(111) step energiesKodambaka, S. / Khare, S.V. / Petrova, V. et al. | 2004
- 353
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Simplified model for the DC planar magnetron dischargeBuyle, G. / Depla, D. / Eufinger, K. et al. | 2004
- 359
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Numerical study of the characteristics of erosion in magnetron sputteringKusumoto, Y. / Iwata, K. et al. | 2004
- 367
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Light emission during negative heavy ion implantation into lithium niobate and sapphirePlaksin, O.A. / Takeda, Y. / Amekura, H. et al. | 2004
- 373
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Investigation of the electron energy distributions in Ar/N2 ECR plasmas with magnetic mirrorMuta, Hiroshi / Thang, Doan Ha / Kawai, Yoshinobu et al. | 2004
- 379
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Monte Carlo simulation of gas transport in a TiN reactive sputtering apparatus for large area depositionKobayashi, T. et al. | 2004
- 387
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Computed tomography imaging of optical emission from copper-sputter deposition plasma: evaluation of the atomic density using the self-absorption effectNakano, Takeo / Tanaka, Kouji / Baba, Shigeru et al. | 2004
- 391
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Ti ion density in inductively coupled plasma enhanced dc magnetron sputteringNakamura, Tadashi / Okimura, Kunio et al. | 2004
- 397
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Influence of oxygen flow ratio on the oxidation of Ti target and the formation process of TiO2 films by reactive sputteringTakamura, K. / Abe, Y. / Sasaki, K. et al. | 2004
- 403
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Dual cathode DC–RF and MF–RF coupled S-Guns for reactive sputteringFelmetsger, V. / Laptev, P. et al. | 2004
- 409
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High-rate, low-temperature radical-assisted sputtering coater and its applications for depositing high-performance optical filtersSong, Yizhou / Sakurai, Takeshi et al. | 2004
- 417
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Preparation of self-supporting boron films by sputtering with electron-beam-excited plasmaOzawa, S. / Hamagaki, M. et al. | 2004
- 423
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Effects of neutralizers on the crystal orientation of YSZ films grown by using ion beam sputteringSuh, Ju Hyung / Oh, Sang Ho / Kim, Hyung Seok et al. | 2004
- 431
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Film structure and optical constants of magnetron-sputtered fluoride films for deep ultraviolet lithographyTaki, Yusuke et al. | 2004
- 437
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Reactive sputtering process for depositing Er3+/Yb3+co-doped lead fluoride filmsOkita, Hiroyuki / Kawashima, Toshitaka et al. | 2004
- 443
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InN films deposited by rf reactive sputtering in pure nitrogen gasInoue, S / Namazu, T / Suda, T et al. | 2004
- 449
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Metal deposition and oxygen-ion implantation for optical thin filmsChiba, S. / Motoki, A. / Fujikura, K. et al. | 2004
- 455
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Tribological properties in a high vacuum of carbon films containing titanium prepared by magnetron sputteringSasaki, M. / Kozukue, Y. / Hashimoto, K. et al. | 2004
- 461
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Deposition of metal oxide thin films (HfO2 and RuO2) by oxygen radical-assisted MOCVDKumagai, A. / Zhang, H. / Ishibashi, K. et al. | 2004
- 467
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Enhancement of reactive species density in nitrogen plasma by mixture of helium and nitridation experiment for siliconHino, T. / Yamauchi, Y. / Ono, J. et al. | 2004
- 473
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A new, room-temperature, high-rate plasma-based copper etch processKuo, Yue / Lee, Sangheon et al. | 2004
- 479
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Surface smoothness of polycrystalline copper after ion irradiationYamauchi, Y. / Taguchi, T. / Hirohata, Y. et al. | 2004
- 485
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Etching mechanism of (Pb,Sr)TiO3 thin films for DRAM application using Cl2/Ar inductively coupled plasmaKim, Gwan-Ha / Kim, Kyoung-Tae / Kim, Dong-Pyo et al. | 2004
- 491
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Measurement of ion temperature in N2/Ar and O2/Ar ECR plasmaKoga, M. / Iwata, S. / Muta, H. et al. | 2004
- 497
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Hybrid PIG–ECR discharge as low-pressure sputtering systemAbolmasov, S.N. / Muta, H. / Kawai, Y. et al. | 2004
- 503
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Characteristics of the electron temperature in VHF-excited SiH4/H2 plasma produced using a ladder-shaped electrodeMashima, H. / Takeuchi, Y. / Murata, M. et al. | 2004
- 509
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Compact holey-plate plasma sourceYoshida, Y. / Ogura, H. et al. | 2004
- 515
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The velocity distribution of droplets ejected from Fe and Si targets by pulsed laser ablation in a vacuum and their elimination using a vane-type velocity filterYoshitake, T. / Nagayama, K. et al. | 2004
- 521
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Study on facing-target sputtering assisted by microwave plasma for enhanced ionization of sputtered atomsYonesu, Akira / Watashi, Suguru / Kagawa, Kiyotaka et al. | 2004
- 525
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Highly moisture-resistive silicon nitride films prepared by catalytic chemical vapor deposition and application to gallium arsenide field-effect transistorsMasuda, Atsushi / Totsuka, Masahiro / Oku, Tomoki et al. | 2004
- 531
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Deposition of nitrogen-containing diamond-like carbon films on acrylic substrates by an ion beam processJan, Der-Jun / Ai, Chi-Fong / Lee, Cheng-Chung et al. | 2004
- 539
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Effects of the TaNx interface layer on doped tantalum oxide high-k filmsLu, J. / Kuo, Yue. / Tewg, J.-Y. et al. | 2004
- 549
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Near-surface sensitive infrared reflection spectroscopy on SiO2 implanted with high-flux negative ionsAmekura, H. / Umeda, N. / Kishimoto, N. et al. | 2004
- 555
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Optical properties of Ag/dielectric-material multilayersTachibana, Yuko / Kusunoki, Kouji / Ohsaki, Hisashi et al. | 2004
- 561
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Dependence on gas pressure of mc-Si:H prepared by RF magnetron sputteringFukaya, K. / Tabata, A. / Mizutani, T. et al. | 2004
- 561
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Dependence on gas pressure of μc-Si:H prepared by RF magnetron sputteringFukaya, K. / Tabata, A. / Mizutani, T. et al. | 2004
- 567
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Current–voltage characteristics of high-resistive ZnO thin films deposited by RF magnetron sputteringKawamura, H. / Yamada, H. / Takeuchi, M. et al. | 2004
- 571
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Evaluation of internal stresses in TiN thin films by synchrotron radiationHanabusa, T. / Kusaka, K. / Matsue, T. et al. | 2004
- 577
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Influence of deposition parameters in the fabrication of a large-area narrow band-pass filter of bandwidth on subnanometer scaleLee, Cheng-Chung / Chen, Sheng-Hui et al. | 2004
- 585
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Epitaxial growth of (Cu,C)Ba2Can−1CunOx (n=1) film deposited on SrTiO3 substrate by r.f. sputteringKikuchi, N. / Sundaresan, A. / Terada, N. et al. | 2004
- 591
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Structural analysis of Cu–In alloy films with XPS depth profiling by ion etchingNakano, Takeo / Sato, Shogo / Baba, Shigeru et al. | 2004
- 595
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Measurement of surface roughness and ion-induced secondary electron emission coefficient of MgO films prepared by high-pressure sputter depositionNakano, Takeo / Fujimoto, Takashi / Baba, Shigeru et al. | 2004
- 601
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Effect of ZnO buffer layer prepared by rf sputtering on heteroepitaxial growth of high-quality ZnO filmsSato, D. / Kashiwaba, Y. / Haga, K. et al. | 2004
- 607
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ZnO–SnO2 transparent conductive films deposited by opposed target sputtering system of ZnO and SnO2 targetsHayashi, Y. / Kondo, K. / Murai, K. et al. | 2004
- 613
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Measurement of crystal orientation and residual stress in GaN film deposited by RF sputtering with powder targetKusaka, K. / Hanabusa, T. / Tominaga, K. et al. | 2004
- 619
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Orientational ordering of iron silicide films on sputter etched Si substrateIgarashi, Shinichi / Katsumata, Toshinobu / Haraguchi, Masaharu et al. | 2004
- 625
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Interfacial structure dependence of layered TiO2/WO3 thin films on the photoinduced hydrophilic propertyIrie, Hiroshi / Mori, Hisashi / Hashimoto, Kazuhito et al. | 2004
- 631
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Morphology and characteristics of ultrathin Au films with ultraviolet transparency and conductivity deposited by dual ion beam sputteringIwatsubo, S. et al. | 2004
- 637
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In situ optical spectroscopy of PLD of nano-structured TiO2Kitazawa, Sin-iti / Choi, Yeongsoo / Yamamoto, Shunya et al. | 2004
- 643
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Plasma surface treatment effect of TiO2 thin filmChiba, Yoshiaki / Kashiwagi, Kunihiro / Kokai, Hideki et al. | 2004
- 647
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Dependence to processing conditions of structure in TiN films deposited by arc ion platingMatsue, Tatsuya / Hanabusa, Takao / Ikeuchi, Yasukazu et al. | 2004
- 653
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Fabrication of ferromagnetic Fe3Si thin films by pulsed laser deposition using an Fe3Si targetNakagauchi, D. / Yoshitake, T. / Nagayama, K. et al. | 2004
- 659
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Surface modification of TiN films by nitrogen ion beam irradiation in ethylene gas atmosphereNakamura, Isao / Matsui, Daisuke / Sasaki, Michiko et al. | 2004
- 665
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Low temperature synthesis and ferroelectric properties of (117)-oriented Bi3.25La0.75Ti3O12 thin films on LaNiO3 electrodesKim, Kyoung-Tae / Kim, Chang-Il et al. | 2004
- 671
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Characteristics of La0.5Sr0.5CoO3 thin films fabricated by a simple metal-organic decomposition techniqueKim, Kyoung-Tae / Kim, Chang-Il / Kim, Tae-Hyung et al. | 2004
- 677
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Changes in electron spin resonance spectra of carbon nanotubes by thermal annealingYokomichi, Haruo et al. | 2004
- 683
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Al-impurity-doped transparent conductive oxide films of In2O3−ZnO systemTominaga, K. / Fukumoto, H. / Kondou, K. et al. | 2004
- 689
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Improvement of crystallinity of ZnO thin film and electrical characteristics of film bulk acoustic wave resonator by using Pt buffer layerYamada, H. / Ushimi, Y. / Takeuchi, M. et al. | 2004
- 693
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3D surface modification of micro trenched structureTonosaki, M. / Kato, E. / Yajima, M. et al. | 2004
- 699
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Influence of metal electrodes on crystal orientation of aluminum nitride thin filmsAkiyama, Morito / Nagao, Keigo / Ueno, Naohiro et al. | 2004
- 705
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Magnetic tunnel junctions—principles and applicationsSamant, Mahesh G. / Parkin, Stuart S.P. et al. | 2004
- 711
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Preparation of ultra-thin carbon overcoat for magnetic recording medium by filtered cathodic vacuum arc technologyFujimaki, S. / Yatsue, T. / Kokaku, Y. et al. | 2004
- 717
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Optical properties of metal nanoparticles synthesized in insulators by negative ion implantationTakeda, Yoshihiko / Lu, Jing / Okubo, Nariaki et al. | 2004
- 723
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Photocatalytic efficiency of TiO2/SnO2 thin film stacks prepared by DC magnetron sputteringKanai, N. / Nuida, T. / Ueta, K. et al. | 2004
- 729
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Enhancement of photocatalytic activity using UV light trapping effectNuida, T. / Kanai, N. / Hashimoto, K. et al. | 2004
- 735
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Characterization of thermally stable Ir–Ta alloy thin films deposited by sputteringWatanabe, E. / Abe, Y. / Sasaki, K. et al. | 2004
- 741
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Novel application of sputtered-sliced concentric multilayers to various optical elements for synchrotron radiation high-brilliance X-ray beamlines at SPring-8Tamura, S. / Yasumoto, M. / Kamijo, N. et al. | 2004
- 747
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Thermal stability of electrical resistance of (ZnO:Ga,Y)/(ZnO:Ga)/(ZnO:Ga,Y) multilayers for electrically heated windowsMitsui, A. / Sato, K. et al. | 2004
- CO2
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Editorial Board ; Publication Information| 2004
- III
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Volume contents and Author Index| 2004