Plasma-enhanced chemical vapour deposition of thin insulator films and reactor cleaning (English)
- New search for: Vogt, M.
- New search for: Kaendler, E.
- New search for: Martin, S.
- New search for: Drescher, K.
- New search for: Vogt, M.
- New search for: Kaendler, E.
- New search for: Martin, S.
- New search for: Drescher, K.
- New search for: Oechsner, H.
- New search for: Rie, K. T.
In:
Plasma surface engineering
1/3
;
306-309
;
1993
-
ISSN:
- Conference paper / Print
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Title:Plasma-enhanced chemical vapour deposition of thin insulator films and reactor cleaning
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Contributors:Vogt, M. ( author ) / Kaendler, E. ( author ) / Martin, S. ( author ) / Drescher, K. ( author ) / Oechsner, H. / Rie, K. T.
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Conference:3rd International conference, Plasma surface engineering ; 1992 ; Garmisch-Partenkirchen; Germany
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Published in:Plasma surface engineering , 1/3 ; 306-309SURFACE AND COATINGS TECHNOLOGY ; 59, 1/3 ; 306-309
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Publisher:
- New search for: Elsevier Sequioa
-
Publication date:1993-01-01
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Size:4 pages
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Remarks:Pt 1 of 2 pts only recd. Also known as PSE '92
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ISSN:
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Type of media:Conference paper
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Type of material:Print
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Language:English
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Keywords:
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Source:
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