Si(001) Surface Layer-by-Layer Oxidation Studied by Real-Time Photoelectron Spectroscopy using Synchrotron Radiation [published May 17, 2007] (English)
- New search for: Ogawa, S.
- New search for: Yoshigoe, A.
- New search for: Ishidzuka, S.
- New search for: Teraoka, Y.
- New search for: Takakuwa, Y.
- New search for: Ogawa, S.
- New search for: Yoshigoe, A.
- New search for: Ishidzuka, S.
- New search for: Teraoka, Y.
- New search for: Takakuwa, Y.
In:
Dielectric thin films for future ULSI devices: [IWDTF-6]
5b
;
3244-3254
;
2007
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ISSN:
- Conference paper / Print
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Title:Si(001) Surface Layer-by-Layer Oxidation Studied by Real-Time Photoelectron Spectroscopy using Synchrotron Radiation [published May 17, 2007]
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Contributors:Ogawa, S. ( author ) / Yoshigoe, A. ( author ) / Ishidzuka, S. ( author ) / Teraoka, Y. ( author ) / Takakuwa, Y. ( author )
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Conference:International workshop, Dielectric thin films for future ULSI devices: [IWDTF-6] ; 2006 ; Kanagawa, Japan
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Published in:Dielectric thin films for future ULSI devices: [IWDTF-6] , 5b ; 3244-3254
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Publisher:
- New search for: Japan Society of Applied Physics
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Publication date:2007-01-01
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Size:11 pages
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ISSN:
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Type of media:Conference paper
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Type of material:Print
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Language:English
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Keywords:
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Source:
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