Crack-free yttria stabilized zirconia thin films by aerosol assisted chemical vapor deposition: Influence of water and carrier gas (English)
- New search for: Schlupp, M. V.
- New search for: Binder, S.
- New search for: Martynczuk, J.
- New search for: Prestat, M.
- New search for: Gauckler, L. J.
- New search for: European Materials Research Society
- New search for: Schlupp, M. V.
- New search for: Binder, S.
- New search for: Martynczuk, J.
- New search for: Prestat, M.
- New search for: Gauckler, L. J.
- New search for: Wellmann, Peter
- New search for: Syvajarvi, Mikael
- New search for: Kneissel, Michael
- New search for: European Materials Research Society
-
ISSN:
- Conference paper / Print
-
Title:Crack-free yttria stabilized zirconia thin films by aerosol assisted chemical vapor deposition: Influence of water and carrier gas
-
Contributors:Schlupp, M. V. ( author ) / Binder, S. ( author ) / Martynczuk, J. ( author ) / Prestat, M. ( author ) / Gauckler, L. J. ( author ) / Wellmann, Peter / Syvajarvi, Mikael / Kneissel, Michael / European Materials Research Society
-
Conference:Symposium, Engineering of wide bandgap semiconductor material for energy saving; EMRS 2011 ; 2011 ; nice, France
-
Published in:THIN SOLID FILMS ; 522 ; 58-65
-
Publisher:
- New search for: Elsevier
-
Place of publication:[Amsterdam]
-
Publication date:2012-01-01
-
Size:8 pages
-
Remarks:Held at the Spring meeting of the European Materials Research Society. ESTAR title
-
ISSN:
-
Type of media:Conference paper
-
Type of material:Print
-
Language:English
-
Keywords:
-
Source:
© Metadata Copyright the British Library Board and other contributors. All rights reserved.