^1^5N hydrogen depth profiling measurements of candidate superconducting supercollider beam pipe materials (Unknown)
- New search for: Ruckman, M. W.
- New search for: Strongin, M.
- New search for: Lanford, W. A.
- New search for: Turner, W. C.
- New search for: Ruckman, M. W.
- New search for: Strongin, M.
- New search for: Lanford, W. A.
- New search for: Turner, W. C.
In:
JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A VACUUMS SURFACES AND FILMS
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13
, 4
;
1994
;
1995
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ISSN:
- Article (Journal) / Print
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Title:^1^5N hydrogen depth profiling measurements of candidate superconducting supercollider beam pipe materials
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Contributors:Ruckman, M. W. ( author ) / Strongin, M. ( author ) / Lanford, W. A. ( author ) / Turner, W. C. ( author )
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Published in:
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Publisher:
- New search for: SLACK INCORPORATED
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Publication date:1995-01-01
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Size:1994 pages
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ISSN:
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Type of media:Article (Journal)
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Type of material:Print
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Language:Unknown
- New search for: 621.55
- Further information on Dewey Decimal Classification
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Classification:
DDC: 621.55 -
Source:
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Table of contents – Volume 13, Issue 4
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 1819
-
Adsorption and decomposition of diethylsilane and diethylgermane on Si(100): Surface reactions for an atomic layer epitaxial approach to column IV epitaxyKellerman, B. K. / Mahajan, A. / Russell, N. M. / Ekerdt, J. G. / Banerjee, S. K. / Tasch, A. F. / Campion, A. / White, J. M. / Bonser, D. J. et al. | 1995
- 1826
-
Matrix effect of bombardment‐induced Gibbsian segregation on Cu depletion at a CuXNi100−X subsurfaceZheng, Li‐Ping / Li, Ri‐Sheng / Xia, Xi‐Qing / Li, Min‐Qian / Li, Ming‐Yao et al. | 1995
- 1831
-
GaN patterned film synthesis: Carbon depletion by hydrogen atoms produced from NH3 activated by electron impactHübner, A. / Lucas, S. R. / Partlow, W. D. / Choyke, W. J. / Schaefer, J. A. / Yates, J. T. et al. | 1995
- 1837
-
Sulfur layer formation on GaAs(100) by thermal and photochemical H2S dissociationNooney, Matthew G. / Liberman, Vladimir / Martin, Richard M. et al. | 1995
- 1847
-
Importance of the surface oxide layer in the reduction of outgassing from stainless steelsIshikawa, Yuichi / Yoshimura, Toshihiko et al. | 1995
- 1853
-
H2O adsorption kinetics on Si(111)7 x 7 and Si(111)7 x 7 modified by laser annealingWise, M.L. et al. | 1995
- 1853
-
H2O adsorption kinetics on Si(111)7×7 and Si(111)7×7 modified by laser annealingWise, M. L. / Okada, L. A. / Sneh, O. / George, S. M. et al. | 1995
- 1861
-
Molecular dynamics simulations of fluorine molecules interacting with a Si(100)(2 x 1) surface at 1000 KSchoolcraft, T.A. et al. | 1995
- 1861
-
Molecular dynamics simulations of fluorine molecules interacting with a Si{100}(2×1) surface at 1000 KSchoolcraft, T. A. / Diehl, A. M. / Steel, A. B. / Garrison, B. J. et al. | 1995
- 1867
-
Thermal‐ and electron‐stimulated chemistry of a cyclotriphosphazene lubricant on a magnetic disk with a hard carbon overcoatLin, Jong‐Liang / Yates, John T. et al. | 1995
- 1872
-
Modeling of water outgassing from metal surfaces (III)Li, Minxu / Dylla, H. F. et al. | 1995
- 1879
-
Synchrotron radiation induced reactions of a condensed layer of silicon alkoxide on SiKinashi, Koji / Niwano, Michio / Sawahata, Jun‐ichi / Shimoshikiryo, Fumikazu / Miyamoto, Nobuo et al. | 1995
- 1885
-
Photodecomposition of poly(methylmethacrylate) thin films by monochromatic soft x‐ray radiationTinone, Marcia C. K. / Tanaka, Kenichiro / Ueno, Nobuo et al. | 1995
- 1893
-
X-ray photoelectron spectroscopy and transmission electron microscopy studies of the NIAI/Al~2O~3 interfacial chemical compatibilitySilvain, J. F. / Bihr, J. C. / Alnot, M. / Lambert, J. et al. | 1995
- 1893
-
X‐ray photoelectron spectroscopy and transmission electron microscopy studies of the NiAl/Al2O3 interfacial chemical compatibilitySilvain, J. F. / Bihr, J. C. / Alnot, M. / Lambert, J. / Ehrhardt, J. J. et al. | 1995
- 1901
-
Optical emission study of reaction mechanisms in the deposition of nitrogen‐containing amorphous hydrogenated carbon filmsDurrant, Steven F. / Rangel, Elidiane C. / Bica de Moraes, Mário A. et al. | 1995
- 1907
-
A study of the interaction between thermally deposited aluminum films and fluoropolymer substratesDu, Yuezhong / Gardella, Joseph A. et al. | 1995
- 1913
-
Surface dielectric function of CdTe(110) obtained by polarized surface differential reflectivity dataCricenti, A. / Felici, A. C. et al. | 1995
- 1917
-
Characterization of substrate temperature and damage in diamond growth plasmas by multichannel spectroellipsometryWakagi, M. / Hong, Byungyou / Nguyen, Hien V. / Collins, R. W. / Drawl, W. / Messier, R. et al. | 1995
- 1924
-
Formation of secondary phases in evaporated CuInS2 thin films: A surface analytical studyScheer, R. / Lewerenz, H.‐J. et al. | 1995
- 1930
-
In situ diagnostic for etch uniformityBuie, M. J. / Pender, J. T. / Soniker, J. / Brake, M. L. / Elta, M. et al. | 1995
- 1935
-
Mass spectrometric studies of remote helium plasma dissociation of silaneJasinski, Joseph M. et al. | 1995
- 1941
-
In situ production of very low density microporous polymeric foamsFalconer, J. W. / Nazarov, W. / Horsfield, C. J. et al. | 1995
- 1945
-
Excimer laser ablation mass spectrometry of inorganic solids: Chemical, matrix, and sampling effects on polyatomic ion yieldsGibson, John K. et al. | 1995
- 1959
-
Quantitative analysis of borophosphosilicate glass films on silicon using infrared external reflection–absorption spectroscopyFranke, James E. / Zhang, Lizhong / Niemczyk, Thomas M. / Haaland, David M. / Radigan, Kenneth J. et al. | 1995
- 1967
-
Photoemission studies of K‐promoted nitridation and oxidation of the InP(100) surface using synchrotron radiationZhao, T. X. / Ji, H. / Liang, Q. / Wang, X. P. / Xu, P. S. / Lu, E. D. / Wu, J. X. / Hsu, C. C. et al. | 1995
- 1970
-
Competitive halogenation of silicon surfaces in HBr/Cl2 plasmas studied with x‐ray photoelectron spectroscopy and in situ, real‐time, pulsed laser‐induced thermal desorptionCheng, C. C. / Guinn, K. V. / Herman, I. P. / Donnelly, V. M. et al. | 1995
- 1977
-
A morphology study of the thermal oxidation of rough silicon surfacesLiu, Q. / Spanos, L. / Zhao, C. / Irene, E. A. et al. | 1995
- 1984
-
Measurements of reflected electron energy loss spectrometry and x‐ray photoelectron spectroscopy spectra for derivations of the energy loss function and source function for Au 4f photoelectronsYoshikawa, Hideki / Irokawa, Yoshihiro / Shimizu, Ryuichi et al. | 1995
- 1990
-
Surface type conversion of CuInSe2 with H2S plasma exposure: A photoemission investigationNelson, Art J. / Frigo, Sean P. / Rosenberg, Richard et al. | 1995
- 1994
-
15N hydrogen depth profiling measurements of candidate superconducting supercollider beam pipe materialsRuckman, M. W. / Strongin, Myron / Lanford, W. A. / Turner, W. C. et al. | 1995
- 1999
-
Study of ion mixing during Auger depth profiling of Ge–Si multilayer system. II. Low ion energy (0.2–2 keV) rangeMenyhard, M. / Barna, A. / Biersack, J. P. / Järrendahl, K. / Sundgren, J.‐E. et al. | 1995
- 2005
-
Methods to enhance absorption signals in infrared reflectance spectroscopy: A comparison using optical simulationsKatiyar, M. / Abelson, J. R. et al. | 1995
- 2013
-
Local density of states analysis by Auger electron spectroscopyZhou, Huijian / Wang, Yuqi / Ho, Wei et al. | 1995
- 2018
-
Boron nitride thin film deposition from solid borane ammonia using an electron cyclotron resonance microwave plasma sourceEddy, C. R. / Sartwell, B. D. et al. | 1995
- 2023
-
Remote plasma and ultraviolet–ozone modification of polystyreneCallen, B. W. / Ridge, M. L. / Lahooti, S. / Neumann, A. W. / Sodhi, R. N. S. et al. | 1995
- 2030
-
Compositionally gradient (Ti1−xAlx)N coatings made by plasma enhanced chemical vapor depositionLee, Sang‐Hyeob / Lee, Jung‐Joong et al. | 1995
- 2035
-
Electron cyclotron resonance plasma reactor for SiO2 etching: Process diagnostics, end‐point detection, and surface characterizationWan, Zhimin / Liu, Jian / Lamb, H. Henry et al. | 1995
- 2044
-
Generation and behavior of particulates in a radio frequency excited CH4 plasmaYeon, Chung‐Kyu / Whang, Ki‐Woong et al. | 1995
- 2051
-
Negative ions in a CCl2F2 radio frequency dischargeStoffels, E. / Stoffels, W. W. / Vender, D. / Kroesen, G. M. W. / de Hoog, F. J. et al. | 1995
- 2058
-
The chemistry of a CCl2F2 radio frequency dischargeStoffels, W. W. / Stoffels, E. / Haverlag, M. / Kroesen, G. M. W. / de Hoog, F. J. et al. | 1995
- 2067
-
Effect of wall charging on an oxygen plasma created in a helicon diffusion reactor used for silica depositionCharles, C. / Boswell, R. W. et al. | 1995
- 2074
-
Characterization of a slot antenna microwave plasma source for hydrogen plasma cleaningKorzec, D. / Werner, F. / Brockhaus, A. / Engemann, J. / Schneider, T. P. / Nemanich, R. J. et al. | 1995
- 2086
-
Magnetically confined inductively coupled plasma etching reactorLai, C. / Brunmeier, B. / Woods, R. Claude et al. | 1995
- 2093
-
On‐line studies of plasma surface interactions between a radio frequency plasma jet and 3 w/o boron doped graphite samplesAvni, R. / Erin, J. / Morvan, D. / Mabille‐Rouger, I. / Amouroux, J. / Winter, J. / Nickel, H. et al. | 1995
- 2099
-
Control of radio‐frequency‐plasma process to improve the reproducibility of silicon oxynitride thin film preparationDiatezua, D. M. / Thiry, P. A. / Caudano, R. et al. | 1995
- 2105
-
Electron cyclotron resonance plasma generation using a planar ring‐cusp magnetic field and a reentrant coaxial cavityYasui, Toshiaki / Tahara, Hirokazu / Yoshikawa, Takao et al. | 1995
- 2110
-
Formation of C–N thin films by ion beam depositionBoyd, K. J. / Marton, D. / Todorov, S. S. / Al‐Bayati, A. H. / Kulik, J. / Zuhr, R. A. / Rabalais, J. W. et al. | 1995
- 2123
-
Effect of residual gas on Cu film deposition by partially ionized beamKoh, Seok‐Keun / Jin, Zhegao / Lee, Jiyun / Jung, Hyung‐Jin / Kim, Ki‐hwan / Choi, Doo‐jin et al. | 1995
- 2128
-
Cluster beam deposition: Optimization of the cluster beam sourceGatz, P. / Hagena, O. F. et al. | 1995
- 2133
-
Structuring of various materials using cluster ionsHenkes, P. R. W. / Krevet, B. et al. | 1995
- 2138
-
Simple method for Fe+ ion production in a microwave ion sourceMatsuo, Takahide / Miyake, Kiyoshi et al. | 1995
- 2142
-
Effect of Ni on graphite thin‐film formation from organic materials by chemical vapor depositionYudasaka, Masako / Kikuchi, Rie / Matsui, Takeo / Tasaka, Kouji / Ohki, Yoshimasa / Yoshimura, Susumu / Ota, Etsuro et al. | 1995
- 2146
-
Etching of InP surface oxide with atomic hydrogen produced by electron cyclotron resonanceHofstra, P. G. / Robinson, B. J. / Thompson, D. A. / McMaster, S. A. et al. | 1995
- 2151
-
Magnetic field in two‐dimensional magnetronsMurphy, M. J. / Cameron, D. C. / Hashmi, M. S. J. et al. | 1995
- 2157
-
Ferromagnetic resonance in Ni films biased dc sputter deposited on MgO(001)Maruyama, Hiroko / Qiu, Hong / Nakai, Hisashi / Hashimoto, Mituru et al. | 1995
- 2161
-
Monte Carlo calculations of gas rarefaction in a magnetron sputtering dischargeTurner, G. M. et al. | 1995
- 2161
-
Monte Carlo calculations of gas rerefaction in a magnetron sputtering dischargeTurner, G. M. et al. | 1995
- 2170
-
Preparation of Al–Ni alloy films by alternate sputter depositionHo, J.‐K. / Lin, K.‐L. et al. | 1995
- 2177
-
Characterization and analysis of ZnO:Al deposited by reactive magnetron sputteringZafar, S. / Ferekides, C. S. / Morel, D. L. et al. | 1995
- 2183
-
Flux distributions and deposition profiles from hexagonal collimators during sputter depositionLin, Zhou / Cale, Timothy S. et al. | 1995
- 2189
-
Microstructural and morphological effects on the tribological properties of electron enhanced magnetron sputtered hard coatingsSchneider, J. M. / Voevodin, A. A. / Rebholz, C. / Matthews, A. et al. | 1995
- 2194
-
Magnetic properties of ion‐beam sputter deposited NiFe ultrathin filmsUeno, Masaki / Tanoue, Shuji et al. | 1995
- 2199
-
Role of oxygen partial pressure on the properties of doped silicon oxycarbide microcrystalline layers produced by spatial separation techniquesMartins, R. / Vieira, M. / Ferreira, I. / Fortunato, E. et al. | 1995
- 2210
-
Structures of Fe/TiC multilayers prepared by ion beam sputtering at room temperatureLiu, C. H. / Li, Wen‐Zhi / Li, Heng‐De / Li, Y. H. et al. | 1995
- 2214
-
Crystallization of Pb(Zr,Ti)O3 films prepared by radio frequency magnetron sputtering with a stoichiometric oxide targetBasit, Nasir Abdul / Kim, Hong Koo et al. | 1995
- 2221
-
Influence of angular distribution on the deposition rate of species sputtered from a multicomponent target in different configurations: Applications to mixed valence copper oxidesLecoeur, Philippe / Mercey, Bernard / Murray, Hugues et al. | 1995
- 2228
-
Creation of extreme high vacuum with a turbomolecular pumping system: A baking approachCho, Boklae / Lee, Sangtae / Chung, Sukmin et al. | 1995
- 2233
-
Unstable arc operation and cathode spot motion in a magnetically filtered vacuum‐arc deposition systemZhitomirsky, V. N. / Boxman, R. L. / Goldsmith, S. et al. | 1995
- 2241
-
Model of an 80 K liner vacuum system for the 4.2 K cold bore of the Superconducting Super Collider 20 TeV proton colliderTurner, W. C. et al. | 1995
- 2255
-
Spherical aberration correction of electrostatic lenses using spherical meshesKato, M. / Sekine, T. et al. | 1995
- 2261
-
Spectroscopic studies of a solenoid filtered vacuum arcWang, Z. H. / McKenzie, D. R. / Martin, P. J. / Netterfield, R. P. et al. | 1995
- 2266
-
Instability of the spatial electron current distribution in hot cathode ionization gauges as a source of sensitivity changesJousten, K. / Röhl, P. et al. | 1995
- 2271
-
The dependence of the characteristics of a rotating disk vacuum gauge on disk sizes and rotor speedChew, A. D. / Chambers, A. / Pert, G. J. / Troup, A. P. et al. | 1995
- 2275
-
Hydrogen in thin films of CuInS2 solar cell materialDzionk, C. / Hessler, S. / Lewerenz, H. J. / Mahnke, H.‐E. / Metzner, H. / Steiger, J. et al. | 1995
- 2278
-
Photoelectron spectroscopy of shallow core levels using He II(40.8 eV) excitationComedi, D. / Zanatta, A. R. / Alvarez, F. / Chambouleyron, I. et al. | 1995
- 2281
-
Removing sulfur from gold using ultraviole-ozone cleaningWorley, Christopher G. et al. | 1995
- 2281
-
Removing sulfur from gold using ultraviolet/ozone cleaningWorley, Christopher G. / Linton, Richard W. et al. | 1995
- 2285
-
Quantitative spectral measurement of air leaks into plasma reactorsBarna, Gabriel G. et al. | 1995
- 2288
-
CUMULATIVE AUTHOR INDEX| 1995