Surface morphology and dynamic scaling in growth of iron nitride thin films deposited by dc magnetron sputtering (English)
- New search for: Wang, X.
- New search for: Zheng, W. T.
- New search for: Gao, L. J.
- New search for: Wei, L.
- New search for: Guo, W.
- New search for: Bai, Y. B.
- New search for: Fei, W. D.
- New search for: Meng, S. H.
- New search for: He, X. D.
- New search for: Han, J. C.
- New search for: Wang, X.
- New search for: Zheng, W. T.
- New search for: Gao, L. J.
- New search for: Wei, L.
- New search for: Guo, W.
- New search for: Bai, Y. B.
- New search for: Fei, W. D.
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In:
JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A VACUUMS SURFACES AND FILMS
;
21
;
983-987
;
2003
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ISSN:
- Article (Journal) / Print
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Title:Surface morphology and dynamic scaling in growth of iron nitride thin films deposited by dc magnetron sputtering
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Contributors:Wang, X. ( author ) / Zheng, W. T. ( author ) / Gao, L. J. ( author ) / Wei, L. ( author ) / Guo, W. ( author ) / Bai, Y. B. ( author ) / Fei, W. D. ( author ) / Meng, S. H. ( author ) / He, X. D. ( author ) / Han, J. C. ( author )
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Published in:
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Publisher:
- New search for: SLACK INCORPORATED
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Publication date:2003-01-01
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Size:5 pages
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ISSN:
-
Type of media:Article (Journal)
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Type of material:Print
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Language:English
- New search for: 621.55
- Further information on Dewey Decimal Classification
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Classification:
DDC: 621.55 -
Source:
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Table of contents – Volume 21
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 1
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Growth of highly c-axis textured AlN films on Mo electrodes for film bulk acoustic wave resonatorsLee, Si-Hyung / Lee, Jeon-Kook / Yoon, Ki Hyun et al. | 2003
- 1
-
Growth of highly c-axis textured AIN films on Mo electrodes for film bulk acoustic wave resonatorsLee, Si-Hyung et al. | 2003
- 6
-
Tribological properties of nitrogen-containing amorphous carbon film produced by dc plasma chemical vapor depositionZhang, Wei / Wazumi, Koichiro / Tanaka, Akihiro / Koga, Yoshinori et al. | 2003
- 14
-
Changes in photoluminescence of SrS:Ce induced by synchrotron radiationSato, Fumio / Nakamura, Tatsuya / Tanaka, Katsu / Aihara, Satoshi / Saito, Nobuo / Inoue, Katsuaki / Yagi, Naoto / Mizuki, Jun-ichiro et al. | 2003
- 19
-
Ionization-assisted deposition of strontium electron injection layer for organic light emitting diodeTanaka, Kuniaki / Usui, Hiroaki et al. | 2003
- 25
-
Interaction of hydrogen-terminated Si(100), (110), and (111) surfaces with hydrogen plasma investigated by in situ real-time infrared absorption spectroscopyShinohara, Masanori / Kuwano, Takayuki / Akama, Yosuke / Kimura, Yasuo / Niwano, Michio / Ishida, Hiroyasu / Hatakeyama, Rikizo et al. | 2003
- 32
-
Particle-size dependence of alloy phase formation in isolated particles in the In–Sn systemLee, J. G. / Mori, H. et al. | 2003
- 37
-
Time-resolved investigation of the surface chemical modification of poly(ethylene naphthalate) by nitrogen plasma treatmentGrace, J. M. / Zhuang, H. K. / Gerenser, L. J. / Freeman, D. R. et al. | 2003
- 47
-
Surface analysis by secondary-ion mass spectroscopy during etching with gas-cluster ion beamFenner, D. B. / Shao, Y. et al. | 2003
- 59
-
Characterization of damage in reactive ion etched ZnTeGuo, Qixin / Matsumoto, Yuichi / Tanaka, Tooru / Nishio, Mitsuhiro / Ogawa, Hiroshi et al. | 2003
- 62
-
Texture development of thin films deposited by ion beam assisted depositionWang, J. / Fromknecht, R. / Linker, G. et al. | 2003
- 66
-
Deposition, microstructure, and properties of nanocrystalline Ti(C,O,N) coatingsRuppi, S. / Larsson, A. et al. | 2003
- 76
-
Structure and properties of anatase thin films made by reactive electron beam evaporationvan de Krol, Roel / Goossens, Albert et al. | 2003
- 84
-
Effect of gas pressure on reactive pulsed laser ablation of a silicon targetInada, Mitsuru / Umezu, Ikurou / Sugimura, Akira et al. | 2003
- 87
-
Monte Carlo simulation method for etching of deep trenches in Si by a plasma mixtureMarcos, G. / Rhallabi, A. / Ranson, P. et al. | 2003
- 96
-
Fundamental beam studies of radical enhanced atomic layer deposition of TiNGreer, Frank / Fraser, D. / Coburn, J. W. / Graves, David B. et al. | 2003
- 106
-
Soft x-ray photoemission studies of Hf oxidationSuzer, S. / Sayan, S. / Banaszak Holl, M. M. / Garfunkel, E. / Hussain, Z. / Hamdan, N. M. et al. | 2003
- 110
-
Nondestructive evaluation of alternative substrate quality using glancing-incidence x-ray diffraction and Raman spectroscopyHaugan, H. J. / Cain, A. M. / Haas, T. W. / Eyink, K. G. / Eiting, C. J. / Tomich, D. H. / Grazulis, L. / Busbee, J. D. et al. | 2003
- 116
-
Effect of neutral transport on the etch product lifecycle during plasma etching of silicon in chlorine gasKiehlbauch, Mark W. / Graves, David B. et al. | 2003
- 127
-
Temperature dependence in time-of-flight ion scattering spectra of and surface charge compensation of pyroelectric changesFang, Z. L. / Lui, K. M. / Lau, W. M. / Makarenko, B. / Rabalais, J. W. et al. | 2003
- 134
-
Critical Mg doping on the blue-light emission in -type GaN thin films grown by metal–organic chemical-vapor depositionKim, Keunjoo / Harrison, Joseph G. et al. | 2003
- 140
-
Epitaxial alloys grown on MgO(001) by ultrahigh vacuum reactive magnetron sputtering: Electronic properties and long-range cation orderingTian, F. / D’Arcy-Gall, J. / Lee, T.-Y. / Sardela, M. / Gall, D. / Petrov, I. / Greene, J. E. et al. | 2003
- 147
-
Experimental and theoretical study of ion distributions near 300 mm tall steps on rf-biased wafers in high density plasmasWoodworth, J.R. et al. | 2003
- 147
-
Experimental and theoretical study of ion distributions near 300 mum tall steps on rf-biased wafers in high density plasmasWoodworth, J. R. / Miller, P. A. / Shul, R. J. / Abraham, I. C. / Aragon, B. P. / Hamilton, T. W. / Willison, C. G. / Kim, D. / Economou, D. J. et al. | 2003
- 147
-
Experimental and theoretical study of ion distributions near 300 μm tall steps on rf-biased wafers in high density plasmasWoodworth, J. R. / Miller, P. A. / Shul, R. J. / Abraham, I. C. / Aragon, B. P. / Hamilton, T. W. / Willison, C. G. / Kim, D. / Economou, D. J. et al. | 2003
- 156
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Gas-efficient deposition of device-quality hydrogenated amorphous silicon using low gas flows and power modulated radio-frequency dischargesBiebericher, A. C. W. / van der Weg, W. F. / Rath, J. K. / Akdim, M. R. / Goedheer, W. J. et al. | 2003
- 167
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Thermal desorption study of selected austenitic stainless steelsBacher, J.-P. / Benvenuti, C. / Chiggiato, P. / Reinert, M.-P. / Sgobba, S. / Brass, A.-M. et al. | 2003
- 175
-
Ion enhanced deposition by dual titanium and acetylene plasma immersion ion implantationZeng, Z. M. / Tian, X. B. / Chu, P. K. et al. | 2003
- 180
-
Observation of copper atoms behavior in a vacuum arc discharge using laser spectroscopySung, Y. M. / Hayashi, Y. / Okraku-Yirenkyi, Y. / Otsubo, M. / Honda, C. / Sakoda, T. et al. | 2003
- 186
-
Application of a sawtooth surface to accelerator beam chambers with low electron emission rateSuetsugu, Y. / Tsuchiya, M. / Nishidono, T. / Kato, N. / Satoh, N. / Endo, S. / Yokoyama, T. et al. | 2003
- 196
-
Relative sputter rate measured in Cu/Co multilayer using ion bombardment at grazing angle of incidenceBarna, A. / Menyhard, M. / Zsolt, G. / Khanh, N. Q. / Zalar, A. / Panjan, P. et al. | 2003
- 201
-
Photoinduced second-harmonic generation in the indium tin oxide crystalline filmsEbothé, J. / Kityk, I. V. / Hichou, A. El / El Idrissi, B. / Addou, M. / Krasowski, J. et al. | 2003
- 206
-
Plasma display panel vacuum in-line sealing technology by using a bubble-reduced fritKwon, Sang Jik / Yang, Hwi Chan / Whang, Ki-Woong et al. | 2003
- 212
-
Preparation of clean GaAs(100) studied by synchrotron radiation photoemissionLiu, Zhi / Sun, Yun / Machuca, Francisco / Pianetta, Piero / Spicer, William E. / Pease, R. F. W. et al. | 2003
- 219
-
Preparation of clean InP(100) surfaces studied by synchrotron radiation photoemissionSun, Yun / Liu, Zhi / Machuca, Francisco / Pianetta, Piero / Spicer, William E. et al. | 2003
- 226
-
Antimony and bismuth passivations of InP and characterizations of InP metal-insulator-semiconductor structures fabricated by plasma oxidation of Sb- and Bi-passivated InPMorikita, Shinya / Ikoma, Hideaki et al. | 2003
- 234
-
Kinetic energy influences on the growth mode of metal overlayers on dendrimer mediated substratesCurry, M. / Arrington, D. / Street, S. C. / Xu, F. T. / Barnard, J. A. et al. | 2003
- 241
-
Effect of changing the electrode gap on the spatial and electrical properties of plasmasSteffens, Kristen L. / Sobolewski, Mark A. et al. | 2003
- 251
-
Modeling gas-phase nucleation in inductively coupled silane-oxygen plasmasSuh, S.-M. / Girshick, S. L. / Kortshagen, U. R. / Zachariah, M. R. et al. | 2003
- 265
-
Plasma and process characterization of high power magnetron physical vapor deposition with integrated plasma equipment—feature profile modelZhang, Da / Stout, Phillip J. / Ventzek, Peter L. G. et al. | 2003
- 274
-
Information depth and the mean escape depth in Auger electron spectroscopy and x-ray photoelectron spectroscopyJablonski, A. / Powell, C. J. et al. | 2003
- 284
-
Effects of Ar and additives on etching in -based plasmasLi, Xi / Ling, Li / Hua, Xuefeng / Fukasawa, Masanaga / Oehrlein, Gottlieb S. / Barela, Marcos / Anderson, Harold M. et al. | 2003
- 294
-
Supersonic jet epitaxy of gallium nitride using triethylgallium and ammoniaMcGinnis, Arthur J. / Thomson, Darren / Banks, Andrew / Preble, Edward / Davis, Robert F. / Lamb, H. Henry et al. | 2003
- 302
-
Environmentally benign etching process of amorphous silicon and tungsten using species evaporated from polytetrafluoroethylene and fluorinated ethylene propyleneFujita, Kazushi / Hori, Masaru / Goto, Toshio / Ito, Masafumi et al. | 2003
- 310
-
Influence of the ratio on the preferred orientation and optical reflectance of reactively sputter deposited titanium nitride thin filmsBanerjee, R. / Singh, K. / Ayyub, P. / Totlani, M. K. / Suri, A. K. et al. | 2003
- 318
-
Is the effective accommodation coefficient of the spinning rotor gauge temperature dependent?Jousten, Karl et al. | 2003
- 325
-
Highly sensitive plasma absorption probe for measuring low-density high-pressure plasmasNakamura, K. / Ohata, M. / Sugai, H. et al. | 2003
- 332
-
Optimization of wear-resistant coating architectures using finite element analysisGorishnyy, T. Z. / Olson, L. G. / Oden, M. / Aouadi, S. M. / Rohde, S. L. et al. | 2003
- 340
-
Deposition of films by direct liquid injection-metalorganic chemical vapor depositionKang, Sang-Woo / Rhee, Shi-Woo et al. | 2003
- 344
-
CUMULATIVE AUTHOR INDEX| 2003
- 345
-
Ultrathin on Si. I. Quantifying and removing carbonaceous contaminationSeah, M. P. / Spencer, S. J. et al. | 2003
- 353
-
Microstructural and surface properties of cobalt containing amorphous carbon thin film deposited by a filtered cathodic vacuum arcChua, Daniel H. C. / Milne, W. I. / Tay, B. K. / Zhang, P. / Ding, X. Z. et al. | 2003
- 359
-
Unusual diffusion enhancement of Ti in ion prebombarded MgO(100) during postbombardment annealingLu, M. / Lupu, C. / Rabalais, J. W. et al. | 2003
- 363
-
Initial deposition of calcium phosphate ceramic on polystyrene and polytetrafluoroethylene by rf magnetron sputtering depositionFeddes, B. / Wolke, J. G. C. / Jansen, J. A. / Vredenberg, A. M. et al. | 2003
- 369
-
Comparison of NO titration and fiber optics catalytic probes for determination of neutral oxygen atom concentration in plasmas and postglowsMozetič, Miran / Ricard, Andre / Babič, Dušan / Poberaj, Igor / Levaton, Jacque / Monna, Virginie / Cvelbar, Uroš et al. | 2003
- 375
-
Current–pressure–voltage characteristics in a planar magnetron dischargeEscrivão, M. L. / Pereira, P. J. S. / Cabral, M. H. / Teixeira, M. R. / Maneira, M. J. P. et al. | 2003
- 381
-
Silicon dioxide etching yield measurements with inductively coupled fluorocarbon plasmasChae, Heeyeop / Vitale, Steven A. / Sawin, Herbert H. et al. | 2003
- 388
-
Plasma-enhanced chemical vapor deposition of low-k dielectric films using methylsilane, dimethylsilane, and trimethylsilane precursorsWu, Qingguo / Gleason, Karen K. et al. | 2003
- 394
-
Characterization of hydrogen etched 6H-SiC(0001) substrates and subsequently grown AIN filmsHartman, J.D. et al. | 2003
- 394
-
Characterization of hydrogen etched 6H–SiC(0001) substrates and subsequently grown AlN filmsHartman, J. D. / Roskowski, A. M. / Reitmeier, Z. J. / Tracy, K. M. / Davis, R. F. / Nemanich, R. J. et al. | 2003
- 401
-
Construction and performance of a low energy ion gunPopova, I. / Muha, R. / Chen, Z. / Yates, J. T. et al. | 2003
- 404
-
Characteristics of secondary etching of by ions reflected from a primary target in a plasmaLee, Gyeo-Re / Hwang, Sung-Wook / Min, Jae-Ho / Moon, Sang Heup et al. | 2003
- 411
-
Structure and mechanical properties of tungsten carbide films deposited by off-plane double bend filtered cathodic vacuum arcCheng, Y. H. / Tay, B. K. et al. | 2003
- 416
-
Structure and growth of basal and random oriented coatings deposited by magnetron sputteringZhang, Xiaoling / Lauwerens, W. / He, Jiawen / Celis, J.-P. et al. | 2003
- 422
-
Sputter deposition of a spongelike morphology in metal coatingsJankowski, A. F. / Hayes, J. P. et al. | 2003
- 426
-
Etch characteristics of thin film in plasmaKim, Dong-Pyo / Chang, Yun-Seong / Kim, Chang-Il et al. | 2003
- 431
-
Some calculations for the thickness distribution of large-area high-temperature superconducting film deposited by inverted cylindrical sputteringTao, B. W. / Liu, X. Z. / Chen, J. J. / Li, Y. R. / Fromknecht, R. / Geerk, J. et al. | 2003
- 438
-
Dependence of the seal property of ConFlat-type flanges on the fine dimensions of the knife edgeKurokouchi, Satoshi / Shinoda, Satsuo / Morita, Shinsaku et al. | 2003
- 449
-
Room temperature Cu–Cu direct bonding using surface activated bonding methodKim, T. H. / Howlader, M. M. R. / Itoh, T. / Suga, T. et al. | 2003
- 454
-
Effect of thin-film stress on the formation of Cr texture and on the coercivity of CoCrX/Cr magnetic thin filmKim, J. H. / Park, J. K. et al. | 2003
- 461
-
Silicon nitride etching in high- and low-density plasmas using mixturesReyes-Betanzo, C. / Moshkalyov, S. A. / Swart, J. W. / Ramos, A. C. S. et al. | 2003
- 470
-
Transition from E to H mode discharge in pulse-modulated inductively coupled plasmasEdamura, Manabu / Benck, Eric C. et al. | 2003
- 476
-
Theoretical and experimental determination of the energy flux during magnetron sputter deposition onto an unbiased substrateEkpe, Samuel D. / Dew, Steven K. et al. | 2003
- 484
-
Molecular dynamics simulation of ion bombardment on hydrogen terminated Si(001)2X1 surfaceSatake, Koji et al. | 2003
- 484
-
Molecular dynamics simulation of ion bombardment on hydrogen terminated surfaceSatake, Koji / Graves, David B. et al. | 2003
- 491
-
Construction and performance of an ultrahigh vacuum-compatible high temperature vapor dosing system for low vapor pressure compoundsThompson, L. / Lee, J.-G. / Maksymovych, P. / Ahner, J. / Yates, J. T. et al. | 2003
- 495
-
Atomic structure analysis of and interfaces by high-resolution transmission electron microscopyIkarashi, Nobuyuki / Watanabe, Koji / Miyamoto, Yoshiyuki et al. | 2003
- 502
-
Enhanced chemical vapor deposition of tantalum oxide thin films from in-situ reduction of electrodeLiu, Tzu-Ping / Huang, Wei-Pang / Wu, Tai-Bor et al. | 2003
- 506
-
Morphology of GaN(0001) and GaN(0001̄) surfaces: Persistence of surface clustersManske, Westley T. / Ratkovich, Anthony S. / Lemke, Chris J. / McEllistrem, Marcus T. et al. | 2003
- 515
-
Brief Reports and Comments - Diamond-like carbon films deposited on polyethylene terephthalate substrates by radio frequency plasma chemical vapor deposition methodKimura, Ayako et al. | 2003
- 515
-
Diamond-like carbon films deposited on polyethylene terephthalate substrates by radio frequency plasma chemical vapor deposition methodKimura, Ayako / Kodama, Hideyuki / Suzuki, Tetsuya et al. | 2003
- 518
-
Errata - Erratum: "Influence of deposition temperature on the structure and Internal stress of TiN films deposited by filtered cathodic vacuum arc" (J. Vac. Sci. Technol. A 20, 1270 (2002))Cheng, Y.H. et al. | 2003
- 518
-
Erratum: “Influence of deposition temperature on the structure and internal stress of TiN films deposited by filtered cathodic vacuum arc” [J. Vac. Sci. Technol. A 20, 1270 (2002)]Cheng, Y. H. / Tay, B. K. / Lau, S. P. et al. | 2003
- 521
-
Review Article - Metal-organic interface and charge injection in organic electronic devicesCampbell Scott, J. et al. | 2003
- 521
-
Metal–organic interface and charge injection in organic electronic devicesScott, J. Campbell et al. | 2003
- 532
-
Limits to the strength of super- and ultrahard nanocomposite coatingsVeprek, S. / Mukherjee, S. / Karvankova, P. / Männling, H.-D. / He, J. L. / Moto, K. / Prochazka, J. / Argon, A. S. et al. | 2003
- 545
-
High-temperature interaction of nitrogen with thin iron films: Thermal desorption kinetics studies combined with microstructure analysis of Fe–N filmsLisowski, W. / Keim, E. G. / Smithers, M. A. et al. | 2003
- 553
-
Interface broadening due to ion bombardment measured on Co/Cu multilayer at grazing angle of incidenceBarna, A. / Menyhard, M. / Zsolt, G. / Koos, A. / Zalar, A. / Panjan, P. et al. | 2003
- 558
-
Thermal stability of polycrystalline TiN/CrN superlattice coatingsYang, Q. / Zhao, L. R. et al. | 2003
- 563
-
Fast x-ray spectroscopy study of ethene on clean and precovered Pt{111}Lee, Adam F. / Wilson, Karen et al. | 2003
- 563
-
Fast x-ray spectroscopy study of ethane on clean and SO4 precovered Pt(111)Lee, Adam F. et al. | 2003
- 569
-
Beneficial influence of continuous ion bombardment during reactive sputter deposition of chromium nitride filmsJanssen, G. C. A. M. / Hoy, R. et al. | 2003
- 572
-
Effect of pressure on dc planar magnetron sputtering of platinumThomas, John H. et al. | 2003
- 577
-
Quick estimation of physical etching of among etchers with decoupled plasma sourcesDing, Guowen / Wu, Wei-Te / Mak, Steve / Yau, Wai-Fan et al. | 2003
- 582
-
Effect of thermal annealing on the electronic properties of nitrogen doped amorphous carbon/p-type crystalline silicon heterojunction diodesValentini, L. / Lozzi, L. / Salerni, V. / Armentano, I. / Kenny, J. M. / Santucci, S. et al. | 2003
- 589
-
Relation between the ion flux, gas phase composition, and wall conditions in chlorine plasma etching of siliconUllal, Saurabh J. / Kim, Tae Won / Vahedi, Vahid / Aydil, Eray S. et al. | 2003
- 596
-
Modeling high power magnetron copper seed deposition: Effect of feature geometry on coverageStout, Phillip J. / Zhang, Da / Ventzek, Peter L. G. et al. | 2003
- 607
-
Deposition of plasma polymerized perfluoromethylene-dominated films showing oil-repellencyChase, J. E. / Boerio, F. J. et al. | 2003
- 616
-
Structural and electrical characteristics of W–N thin films prepared by reactive rf sputteringJiang, Pei-Chuen / Chen, J. S. / Lin, Y. K. et al. | 2003
- 623
-
Effect of cooling conditions on plasma-carbonitrided iron surfacesGontijo, Leonardo C. / Machado, Rogério / Miola, Eduardo J. / Castelleti, Luiz C. / Nascente, Pedro A. P. et al. | 2003
- 628
-
Reaction sequence of Co/Ni/Si(001) systemGuo, S. S. / Tsai, C. J. et al. | 2003
- 634
-
Optical transmittance study of silver particles formed by thermal decompositionShima, Takayuki / Tominaga, Junji et al. | 2003
- 638
-
etching with perfluorobutadiene in a dual frequency plasma reactorFracassi, F. / d’Agostino, R. / Fornelli, E. / Illuzzi, F. / Shirafuji, T. et al. | 2003
- 643
-
Aluminum diffusion and nitrogen sputter yield for nitrogen plasma immersion ion implantation into aluminumManova, D. / Attenberger, W. / Mändl, S. / Stritzker, B. / Rauschenbach, B. et al. | 2003
- 649
-
Metal deposition with femtosecond light pulses at atmospheric pressureHaight, R. / Longo, P. / Wagner, A. et al. | 2003
- 653
-
Compositional and electrical properties of zirconium dioxide thin films chemically deposited on siliconHarasek, S. / Wanzenboeck, H. D. / Bertagnolli, E. et al. | 2003
- 660
-
Inductively coupled plasmas in oxygen: Modeling and experimentKiehlbauch, Mark W. / Graves, David B. et al. | 2003
- 671
-
Degradation of CrN films at high temperature under controlled atmosphereLu, Fu-Hsing / Chen, Hong-Ying / Hung, Chih-Hung et al. | 2003
- 676
-
Monitoring and purging dynamics of trace gaseous impurity in atmospheric pressure rapid thermal processHu, Yao Zhi / Tay, Sing Pin et al. | 2003
- 683
-
Experimental study of outgassing from textile materialsBarni, R. / Riccardi, C. / Fontanesi, M. et al. | 2003
- 690
-
Mathematical model for predicting molecular-beam epitaxy growth rates for wafer productionShi, B. Q. et al. | 2003
- 695
-
Phase transformation in chromium nitride filmsChen, Hong-Ying / Lu, Fu-Hsing et al. | 2003
- 701
-
Optical and structural studies of hydride vapor phase epitaxy grown GaNChang, Y. C. / Cai, A. L. / Muth, J. F. / Kolbas, R. M. / Park, M. / Cuomo, J. J. / Hanser, A. / Bumgarner, J. et al. | 2003
- 706
-
Compensation for transient chamber wall condition using real-time plasma density feedback control in an inductively coupled plasma etcherKlimecky, Pete I. / Grizzle, J. W. / Terry, Fred L. et al. | 2003
- 718
-
Cleaning of Si and properties of the interfaceChoi, K. / Harris, H. / Gangopadhyay, S. / Temkin, H. et al. | 2003
- 723
-
Vacuum deposition of silver island films on chemically modified surfacesMalynych, Serhiy Z. / Chumanov, George et al. | 2003
- 728
-
Physical and electrical properties of low temperature films deposited by electron cyclotron resonance plasmasRashid, R. / Flewitt, A. J. / Robertson, J. et al. | 2003
- 740
-
Hydrogen elimination reactions in the thermal decomposition of alcohols on Si(100) surfacesYoon, Won J. / Lee, Jae P. / Park, Gyoosoon / Park, Chan R. / Kwak, Hyon T. / Sung, Myung M. et al. | 2003
- 745
-
Influence of energetic bombardment on stress, resistivity, and microstructure of indium tin oxide films grown by radio frequency magnetron sputtering on flexible polyester substratesCarcia, P. F. / McLean, R. S. / Reilly, M. H. / Li, Z. G. / Pillione, L. J. / Messier, R. F. et al. | 2003
- 752
-
Low temperature crystallization of germanium on plastic by externally applied compressive stressHekmatshoar, B. / Shahrjerdi, D. / Mohajerzadeh, S. / Khakifirooz, A. / Goodarzi, A. / Robertson, M. et al. | 2003
- 756
-
High-temperature stability of nichrome in reactive environmentsZhou, J. / Ohno, T. R. / Wolden, C. A. et al. | 2003
- 762
-
Surface and bulk chemistry of calcined powdersNelson, A. J. / Meier, T. C. / Saw, C. K. / Griffith, L. V. et al. | 2003
- 766
-
Effects of ultraviolet/ozone treatment on benzocyclobutene filmsViallet, Benoı̂t / Daran, Emmanuelle / Malaquin, Laurent et al. | 2003
- 772
-
Evolution of chemical bonding configuration in ultrathin layers grown by low-temperature plasma nitridationLai, Yi-Sheng / Chen, J. S. et al. | 2003
- 779
-
Molecular desorption of a nonevaporable getter St 707 irradiated at room temperature with synchrotron radiation of 194 eV critical photon energyLe Pimpec, F. / Gröbner, O. / Laurent, J. M. et al. | 2003
- 787
-
Effects of W doping and annealing parameters on the ferroelectricity and fatigue properties of sputtered filmsLin, Wen-Tai / Chiu, Ta-Wei / Yu, Hsiao-Hsuan / Lin, Jian-Long / Lin, Meng-Shian et al. | 2003
- 792
-
Hydrogen contamination in Ge-doped thin films prepared by helicon activated reactive evaporationLi, W. T. / Bulla, D. A. P. / Love, J. / Luther-Davies, B. / Charles, C. / Boswell, R. et al. | 2003
- 797
-
X-ray photoelectron spectroscopy and static secondary ion mass spectroscopy study of activation mechanism of Zr–V low activation temperature nonevaporable getter filmsMas̆ek, Karel / S̆utara, Frantis̆ek / Skála, Tomás̆ / Drbohlav, Jir̆ı́ / Veltruská, Kater̆ina / Matolı́n, Vladimı́r et al. | 2003
- 806
-
Role of molecular diffusion in the theory of gas flow through crimped-capillary leaksBach, H. T. / Meyer, B. A. / Tuggle, D. G. et al. | 2003
- 814
-
Sensor fault detection in etch based on broadband rf signal observationPark, H.-M. / Grimard, D. S. / Grizzle, J. W. et al. | 2003
- 825
-
Brief Reports and Comments - Highly oriented SrTiO3 thin film on Si deposited by magnetron sputteringWang, Y. et al. | 2003
- 825
-
Highly oriented thin film on Si deposited by magnetron sputteringWang, Y. / Chan, H. L. W. / Cheng, Y. L. / Choy, C. L. et al. | 2003
- 827
-
Comment on “Quantitative analysis of annealing-induced structure disordering in ion-implanted amorphous silicon,” by Ju-Yin Cheng et al., J. Vacuum Science and Technology A 20, 1855 (2002)Roorda, Sjoerd et al. | 2003
- 827
-
Brief Reports and Comments - Comment on "Quantitative analysis of annealing-induced structure disordering in ion-implanted amorphous silicon," by Ju-Yin Chang et al., J. Vacuum Science and Technology A 20, 1855 (2002)Roorda, Sjoerd et al. | 2003
- 831
-
Thermal stability and hydrogen atom induced etching of nanometer-thicka-Si:H films grown by ion-beam deposition on Si(100) surfacesBiener, J. / Lutterloh, C. / Wicklein, M. / Dinger, A. / Küppers, J. et al. | 2003
- 838
-
Photoluminescence of Mg-doped GaN grown by metalorganic chemical vapor depositionQu, B. Z. / Zhu, Q. S. / Sun, X. H. / Wan, S. K. / Wang, Z. G. / Nagai, H. / Kawaguchi, Y. / Hiramatsu, K. / Sawaki, N. et al. | 2003
- 842
-
Energetic deposition of niobium thin film by ecr-plasmaWu, G. / Phillips, H. L. / Sundelin, R. M. et al. | 2003
- 846
-
Effect of sputtering pressure on residual stress in Ni films using energy-dispersive x-ray diffractionAlfonso, J. A. / Greaves, E. D. / Lavelle, B. / Sajo-Bohus, L. et al. | 2003
- 851
-
Structural and mechanical properties of diamond-like carbon films deposited by direct current magnetron sputteringBroitman, E. / Hellgren, N. / Czigány, Zs. / Twesten, R. D. / Luning, J. / Petrov, I. / Hultman, L. / Holloway, B. C. et al. | 2003
- 860
-
X-ray photoemission spectra and x-ray excited Auger spectrum investigation of the electronic structure ofGrasso, V. / Silipigni, L. et al. | 2003
- 866
-
Laser desorption time-of-flight mass spectrometry of fluorocarbon films synthesized by plasmasShibagaki, K. / Maeda, T. / Takada, N. / Sasaki, K. / Kadota, K. et al. | 2003
- 874
-
Pulsed laser ultrahigh vacuum deposited silicon in the presence of excess cesium and oxygen studied with x-ray photoelectron spectroscopy and atomic force microscopyChoo, Cheow-Keong / Tanaka, Katsumi / Suzuki, Hiroaki / Saotome, Nobuyuki / Ichida, Kouji et al. | 2003
- 881
-
Edison’s vacuum technology patentsWaits, Robert K. et al. | 2003
- 892
-
Low temperature pulsed etching of large glass substratesDubost, L. / Belinger, A. / Perrin, J. / Boswell, R. W. et al. | 2003
- 895
-
Effects of Si addition on the microstructural evolution and hardness of Ti–Al–Si–N films prepared by the hybrid system of arc ion plating and sputtering techniquesPark, In-Wook / Choi, Sung Ryong / Lee, Mi-Hye / Kim, Kwang Ho et al. | 2003
- 900
-
Plasma-enhanced chemical vapor deposition of from a precursor and mixtures as plasma gasBarranco, A. / Cotrino, J. / Yubero, F. / Girardeau, T. / Camelio, S. / Clerc, C. / Gonzalez-Elipe, A. R. et al. | 2003
- 906
-
Microstructural and optical properties of aluminum oxide thin films prepared by off-plane filtered cathodic vacuum arc systemZhao, Z. W. / Tay, B. K. / Lau, S. P. / Xiao, C. Y. et al. | 2003
- 911
-
Feature profile evolution in high-density plasma etching of silicon withJin, Weidong / Sawin, Herbert H. et al. | 2003
- 922
-
Determination of -flux and -flux of ionized physical vapor deposition of titanium from multiscale model calibration with test structuresJacobs, W. / Kersch, A. / Ruf, A. / Urbansky, N. et al. | 2003
- 937
-
Comparison of the stability of hot and cold cathode ionization gaugesLi, Detian / Jousten, Karl et al. | 2003
- 947
-
Mechanism of hardening in Cr–Al–N–O thin films prepared by pulsed laser depositionHirai, M. / Suzuki, T. / Suematsu, H. / Jiang, W. / Yatsui, K. et al. | 2003
- 955
-
Etching silicon by in a continuous and pulsed power helicon reactorHerrick, A. / Perry, A. J. / Boswell, R. W. et al. | 2003
- 967
-
X-ray diffraction study of residual stresses and microstructure in tungsten thin films sputter deposited on polyimideVillain, P. / Goudeau, P. / Ligot, J. / Benayoun, S. / Badawi, K. F. / Hantzpergue, J.-J. et al. | 2003
- 973
-
Standards for surface analysis: ASTM committee E-42 on surface analysisCzanderna, A. W. et al. | 2003
- 979
-
Raman and photoluminescence of ZnO films deposited on Si (111) using low-pressure metalorganic chemical vapor depositionYe, Jiandong / Gu, Shulin / Zhu, Shunmin / Chen, Tong / Liu, Wei / Qin, Feng / Hu, Liqun / Zhang, Rong / Shi, Yi / Zheng, Youdou et al. | 2003
- 983
-
Surface morphology and dynamic scaling in growth of iron nitride thin films deposited by dc magnetron sputteringWang, X. / Zheng, W. T. / Gao, L. J. / Wei, L. / Guo, W. / Bai, Y. B. / Fei, W. D. / Meng, S. H. / He, X. D. / Han, J. C. et al. | 2003
- 988
-
Ionic densities and ionization fractions of sputtered titanium in radio frequency magnetron sputteringOkimura, Kunio / Nakamura, Tadashi et al. | 2003
- 994
-
Thermal plasma fabricated lithium niobate-tantalate films on sapphire substrateKulinich, S. A. / Yoshida, T. / Yamamoto, H. / Terashima, K. et al. | 2003
- 1004
-
Characteristics of ultrathin films using dry rapid thermal oxidation and Pt catalyzed wet oxidationCho, M.-H. / Shin, J. S. / Roh, Y. S. / Lyo, I.-W. / Jeong, K. / Whang, C. N. / Lee, J. S. / Yoo, J. Y. / Lee, N. I. / Fujihara, K. et al. | 2003
- 1009
-
Oxygen environmental Auger electron spectroscopy: Eliminating the electron beam effects on during Auger analysisGuo, Hansheng / Maus-Friedrichs, W. / Kempter, V. / Ji, Y. et al. | 2003
- 1017
-
Investigation of SrBi2Ta2O9 thin films etching mechanisms in Cl2-Ar plasmaEfremov, A.M. et al. | 2003