ULVAC research and development of Cat-CVD applications (English)
- New search for: Asari, S.
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In:
THIN SOLID FILMS
;
516
, 5
;
541-544
;
2008
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ISSN:
- Article (Journal) / Print
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Title:ULVAC research and development of Cat-CVD applications
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Contributors:Asari, S. ( author ) / Fujinaga, T. ( author ) / Takagi, M. ( author ) / Hashimoto, M. ( author ) / Saito, K. ( author ) / Harada, M. ( author ) / Ishikawa, M. ( author )
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Published in:THIN SOLID FILMS ; 516, 5 ; 541-544
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Publisher:
- New search for: Elsevier Science B.V., Amsterdam.
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Publication date:2008-01-01
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Size:4 pages
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ISSN:
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Type of media:Article (Journal)
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Type of material:Print
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Language:English
- New search for: 530.4275
- Further information on Dewey Decimal Classification
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Classification:
DDC: 530.4275 -
Source:
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Table of contents – Volume 516, Issue 5
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 487
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Fourth international conference on hot-wire CVD (Cat-CVD) processBourée, Jean-Eric / Mahan, A. Harv et al. | 2007
- 490
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Deposition of new microcrystalline materials, μc-SiC, μc-GeC by HWCVD and solar cell applicationsKonagai, Makoto et al. | 2007
- 496
-
Hot Wire CVD for thin film triple junction cells and for ultrafast deposition of the SiN passivation layer on polycrystalline Si solar cellsSchropp, R.E.I. / Franken, R.H. / Goldbach, H.D. / Houweling, Z.S. / Li, H. / Rath, J.K. / Schüttauf, J.W.A. / Stolk, R.L. / Verlaan, V. / van der Werf, C.H.M. et al. | 2007
- 500
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Future prospect of remote Cat-CVD on the basis of the production, transportation and detection of H atomsUmemoto, Hironobu / Matsumura, Hideki et al. | 2007
- 503
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Evaluation of hydrogen atom density generated on a tungsten mesh surfaceMiura, Hitoshi / Kuroki, Yuichiro / Yasui, Kanji / Takata, Masasuke / Akahane, Tadashi et al. | 2007
- 506
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Mass spectrometric study of gas-phase chemistry in the hot-wire CVD processes of SiH4/NH3 mixturesShi, Y.J. / Eustergerling, B.D. / Li, X.M. et al. | 2007
- 511
-
Hot-wire deposition of a-Si:H thin films on wafer substrates studied by real-time spectroscopic ellipsometry and infrared spectroscopyvan den Oever, P.J. / Gielis, J.J.H. / van de Sanden, M.C.M. / Kessels, W.M.M. et al. | 2007
- 517
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UV–visible absorption spectra of silicon CVD intermediatesNakamura, Seigo / Matsugi, Akira / Susa, Akio / Koshi, Mistuo et al. | 2007
- 521
-
Filament seasoning and its effect on the chemistry prevailing in hot filament activated gas mixtures used in diamond chemical vapour depositionComerford, Dane W. / D'Haenens-Johansson, Ulrika F.S. / Smith, James A. / Ashfold, Michael N.R. / Mankelevich, Yuri A. et al. | 2007
- 526
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Film stoichiometry and gas dissociation kinetics in hot-wire chemical vapor deposition of a-SiGe:HDoyle, James R. / Xu, Yueqin / Reedy, Robert / Branz, Howard M. / Harv Mahan, A. et al. | 2007
- 529
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A comparison of grain nucleation and grain growth during crystallization of HWCVD and PECVD a-Si:H filmsMahan, A.H. / Ahrenkiel, S.P. / Schropp, R.E.I. / Li, H. / Ginley, D.S. et al. | 2007
- 533
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Deposition of device quality silicon nitride with ultra high deposition rate (>7 nm/s) using hot-wire CVDVerlaan, V. / Houweling, Z.S. / van der Werf, C.H.M. / Romijn, I.G. / Weeber, A.W. / Goldbach, H.D. / Schropp, R.E.I. et al. | 2007
- 533
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Deposition of device quality silicon nitride with ultra high deposition rate (greater-than 7 nm/s) using hot-wire CVDVerlaan, V. / Houweling, Z.S. / Werf, C.H.M. van der / Romijn, I.G. / Weeber, A.W. / Goldbach, H.D. / Schropp, R.E.I. et al. | 2008
- 537
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Recent situation of industrial implementation of Cat-CVD technology in JapanMatsumura, Hideki / Ohdaira, Keisuke et al. | 2007
- 541
-
ULVAC research and development of Cat-CVD applicationsAsari, Shin / Fujinaga, Tetsushi / Takagi, Makiko / Hashimoto, Masanori / Saito, Kazuya / Harada, Masamichi / Ishikawa, Michio et al. | 2007
- 545
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AlGaN/GaN HEMTs passivated by Cat-CVD SiN FilmOku, Tomoki / Kamo, Yoshitaka / Totsuka, Masahiro et al. | 2007
- 548
-
GaN-based FETs using Cat-CVD SiN passivation for millimeter-wave applicationsHigashiwaki, Masataka / Mimura, Takashi / Matsui, Toshiaki et al. | 2007
- 553
-
Cat-CVD SiN passivation films for OLEDs and packagingHeya, Akira / Minamikawa, Toshiharu / Niki, Toshikazu / Minami, Shigehira / Masuda, Atsushi / Umemoto, Hironobu / Matsuo, Naoto / Matsumura, Hideki et al. | 2007
- 558
-
An organic catalytic CVD: Principle, apparatus and applicationsHata, Tsuyoshi / Nakayama, Hiroshi et al. | 2007
- 564
-
Comparison of growth mechanisms of silicon thin films prepared by HWCVD with PECVDZhou, Yuqin / Zhou, Bingqing / Gu, Jinhua / Zhu, Meifang / Liu, Fengzhen et al. | 2007
- 568
-
Improved transport properties of microcrystalline silicon films grown by HWCVD with a variable hydrogen dilution processNiikura, Chisato / Brenot, Romain / Guillet, Joelle / Bourée, Jean-Eric et al. | 2007
- 572
-
Photo-carrier transport in microcrystalline silicon films prepared by hot-wire CVDMurata, Kenji / Shimakawa, Koichi / Takai, Yuta / Itoh, Takashi et al. | 2007
- 576
-
Phosphorous and boron doping of nc-Si:H thin films deposited on plastic substrates at 150 °C by Hot-Wire Chemical Vapor DepositionFilonovich, S.A. / Ribeiro, M. / Rolo, A.G. / Alpuim, P. et al. | 2007
- 576
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Phosphorous and boron doping of nc-Si:H thin films deposited on plastic substrates at 150 deg C by hot-wire chemical vapor depositionFilonovich, S.A. / Ribeiro, M. / Rolo, A.G. / Rolo, P.A. et al. | 2008
- 580
-
Electrical properties/Doping efficiency of doped microcrystalline silicon layers prepared by hot-wire chemical vapor depositionKumar, P. / Schroeder, B. et al. | 2007
- 584
-
Nanocrystalline silicon thin films on PEN substratesVillar, F. / Escarré, J. / Antony, A. / Stella, M. / Rojas, F. / Asensi, J.M. / Bertomeu, J. / Andreu, J. et al. | 2007
- 588
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Localized oxidation influence from conductive atomic force microscope measurement on nano-scale I-V characterization of silicon thin film solar cellsShen, Zhenhua / Eguchi, Mototaka / Gotoh, Tamihiro / Yoshida, Norimitsu / Itoh, Takashi / Nonomura, Shuichi et al. | 2007
- 593
-
Wide optical bandgap p-type μc-Si:Ox:H prepared by Cat-CVD and comparisons to p-type μc-Si:HMatsumoto, Yasuhiro / Sánchez R., Victor / Avila G., Alejandro et al. | 2007
- 593
-
Wide optical bandgap p-type mu c-Si:Ox:H prepared by Cat-CVD and comparisons to p-type micro-c-Si/ -c-SiMatsumoto, Y. / Sanchez R., V. / Avila G., A. et al. | 2008
- 597
-
Electronic properties of low temperature epitaxial silicon thin film photovoltaic devices grown by HWCVDRichardson, Christine E. / Langeland, Krista / Atwater, Harry A. et al. | 2007
- 600
-
Poly-Si films with long carrier lifetime prepared by rapid thermal annealing of Cat-CVD amorphous silicon thin filmsOhdaira, Keisuke / Abe, Yuki / Fukuda, Makoto / Nishizaki, Shogo / Usami, Noritaka / Nakajima, Kazuo / Karasawa, Takeshi / Torikai, Tetsuya / Matsumura, Hideki et al. | 2007
- 604
-
Formation of gas barrier films by Cat-CVD method using organic silicon compoundsOyaidu, Takuya / Ogawa, Yohei / Tsurumaki, Kazuhiko / Ohdaira, Keisuke / Matsumura, Hideki et al. | 2007
- 607
-
Estimation of moisture barrier ability of thin SiNx single layer on polymer substrates prepared by Cat-CVD methodSaitoh, K. / Kumar, R.S. / Chua, S. / Masuda, A. / Matsumura, H. et al. | 2007
- 611
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Protection of organic light-emitting diodes over 50000 hours by Cat-CVD SiNx/SiOxNy stacked thin filmsOgawa, Yohei / Ohdaira, Keisuke / Oyaidu, Takuya / Matsumura, Hideki et al. | 2007
- 615
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Effect of hydrogen on SiNx films deposited by Cat-CVD methodFujinaga, Tetsushi / Takagi, Makiko / Hashimoto, Masanori / Asari, Shin / Saito, Kazuya et al. | 2007
- 618
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Microstructure of highly crystalline silicon carbide thin films grown by HWCVD techniqueDasgupta, A. / Klein, S. / Houben, L. / Carius, R. / Finger, F. / Luysberg, M. et al. | 2007
- 622
-
Effect of filament and substrate temperatures on the structural and electrical properties of SiC thin films grown by the HWCVD techniqueDasgupta, A. / Huang, Y. / Houben, L. / Klein, S. / Finger, F. / Carius, R. / Luysberg, M. et al. | 2007
- 626
-
Structural changes of hot-wire CVD silicon carbide thin films induced by gas flow ratesTabata, Akimori / Mori, Masahiko et al. | 2007
- 630
-
Electronic properties of low temperature microcrystalline silicon carbide prepared by Hot Wire CVDKlein, Stefan / Dasgupta, Arup / Finger, Friedhelm / Carius, Reinhard / Bronger, Torsten et al. | 2007
- 633
-
Influence of gas pressure on low-temperature preparation and film properties of nanocrystalline 3C-SiC thin films by HW-CVD using SiH4/CH4/H2 systemKomura, Yusuke / Tabata, Akimori / Narita, Tomoki / Kondo, Akihiro et al. | 2007
- 637
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Characterization of polycrystalline SiC films grown by HW-CVD using silicon tetrafluorideAbe, Katsuya / Nagasaka, Yohei / Kida, Takahiro / Yamakami, Tomohiko / Hayashibe, Rinpei / Kamimura, Kiichi et al. | 2007
- 641
-
Properties of hetero-structured SiCX films deposited by hot-wire CVD using SiH3CH3 as carbon sourceItoh, Takashi / Kawasaki, Takahiro / Takai, Yuta / Yoshida, Norimitsu / Nonomura, Shuichi et al. | 2007
- 644
-
SiCOI structure fabricated by catalytic chemical vapor depositionYasui, Kanji / Miura, Hitoshi / Takata, Masasuke / Akahane, Tadashi et al. | 2007
- 648
-
XPS study of carbon nitride films deposited by hot filament chemical vapor deposition using carbon filamentAono, Masami / Aizawa, Shinichiro / Kitazawa, Nobuaki / Watanabe, Yoshihisa et al. | 2007
- 652
-
Effect of thermal annealing on the properties of a-SiCN:H films by hot wire chemical vapor deposition using hexamethyldisilazaneLimmanee, Amornrat / Otsubo, Michio / Sugiura, Tsutomu / Sato, Takehiko / Miyajima, Shinsuke / Yamada, Akira / Konagai, Makoto et al. | 2007
- 656
-
Evaluation of corrosion resistance of SiCN films deposited by HWCVD using organic liquid materialsNakayamada, T. / Matsuo, K. / Hayashi, Y. / Izumi, A. / Kadotani, Y. et al. | 2007
- 659
-
Growth of GaN on SiC/Si substrates using AlN buffer layer by hot-mesh CVDTamura, Kazuyuki / Kuroki, Yuichiro / Yasui, Kanji / Suemitsu, Maki / Ito, Takashi / Endou, Tetsuro / Nakazawa, Hideki / Narita, Yuzuru / Takata, Masasuke / Akahane, Tadashi et al. | 2007
- 663
-
Defect analysis of thin film Si-based alloys deposited by hot-wire CVD using junction capacitance methodsCohen, J. David / Datta, Shouvik / Palinginis, Kimon / Mahan, A.H. / Iwaniczko, Eugene / Xu, Yueqin / Branz, Howard M. et al. | 2007
- 670
-
Properties of nanocrystalline SiC:Ge:H alloy deposited by hot-wire chemical vapor deposition using Organosilane and OrganogermaneMiyajima, Shinsuke / Yashiki, Yasutoshi / Yamada, Akira / Konagai, Makoto et al. | 2007
- 674
-
Applying HWCVD to particle coatings and modeling the deposition mechanismLau, Kenneth K.S. / Gleason, Karen K. et al. | 2007
- 678
-
Initiated chemical vapor deposition (iCVD) of copolymer thin filmsLau, Kenneth K.S. / Gleason, Karen K. et al. | 2007
- 681
-
Combinatorial initiated chemical vapor deposition (iCVD) for polymer thin film discoveryMartin, Tyler P. / Chan, Kelvin / Gleason, Karen K. et al. | 2007
- 684
-
Initiated chemical vapor deposition of biopassivation coatingsO'Shaughnessy, W.S. / Edell, David J. / Gleason, Karen K. et al. | 2007
- 687
-
Fabrication of PTFE thin films by dual catalytic chemical vapor deposition methodYasuoka, Hiroaki / Yoshida, Masahiro / Sugita, Ken / Ohdaira, Keisuke / Murata, Hideyuki / Matsumura, Hideki et al. | 2007
- 691
-
HF CVD diamond nucleation and growth on polycrystalline copper: A kinetic studyConstant, L. / Le Normand, F. et al. | 2007
- 696
-
Wide area polycrystalline diamond coating and stress control by sp3 hot filament CVD reactorZimmer, Jerry W. / Chandler, Gerry / Sharda, Tarun et al. | 2007
- 700
-
Hot-filament CVD synthesis and application of carbon nanostructuresLee, Soonil / Choi, Seungho / Park, Kyung Ho / Chae, Kyo Won / Cho, Jung Bin / Ahn, Yeonghwan / Park, Ji-Yong / Koh, Ken Ha et al. | 2007
- 706
-
Growth of vertically aligned arrays of carbon nanotubes for high field emissionKim, D. / Lim, S.H. / Guilley, A.J. / Cojocaru, C.S. / Bourée, J.E. / Vila, L. / Ryu, J.H. / Park, K.C. / Jang, J. et al. | 2007
- 710
-
Effect of hydrogen dilution in preparation of carbon nanowall by hot-wire CVDShimabukuro, Seiji / Hatakeyama, Yuichi / Takeuchi, Masanori / Itoh, Takashi / Nonomura, Shuichi et al. | 2007
- 714
-
Preparation of carbon microcoils by catalytic methane hot-wire CVD processChen, Xiuqin / Hasegawa, M. / Yang, Shaoming / Nitta, Y. / Katsuno, T. / Motojima, S. et al. | 2007
- 718
-
Preparation of single-helix carbon microcoils by catalytic CVD processYang, Shaoming / Ozeki, I. / Chen, Xiuqin / Katsuno, T. / Motojima, S. et al. | 2007
- 722
-
Recent contributions of the Kaiserslautern research group to thin silicon solar cell R&D applying the HW(Cat)CVDSchroeder, Bernd / Kupich, Markus / Kumar, Prabhat / Grunsky, Dmitry et al. | 2007
- 728
-
High efficiency microcrystalline silicon solar cells with Hot-Wire CVD buffer layerFinger, F. / Mai, Y. / Klein, S. / Carius, R. et al. | 2007
- 733
-
Stability of microcrystalline silicon solar cells with HWCVD buffer layerWang, Y. / Geng, X. / Stiebig, H. / Finger, F. et al. | 2007
- 736
-
Improvement of the efficiency of triple junction n–i–p solar cells with hot-wire CVD proto- and microcrystalline silicon absorber layersStolk, R.L. / Li, H. / Franken, R.H. / Schüttauf, J.W.A. / van der Werf, C.H.M. / Rath, J.K. / Schropp, R.E.I. et al. | 2007
- 740
-
Applications of microcrystalline hydrogenated cubic silicon carbide for amorphous silicon thin film solar cellsOgawa, Shunsuke / Okabe, Masaaki / Ikeda, Yuusuke / Itoh, Takashi / Yoshida, Norimitsu / Nonomura, Shuichi et al. | 2007
- 743
-
Recent advances in hot-wire CVD R&D at NREL: From 18% silicon heterojunction cells to silicon epitaxy at glass-compatible temperaturesBranz, Howard M. / Teplin, Charles W. / Young, David L. / Page, Matthew R. / Iwaniczko, Eugene / Roybal, Lorenzo / Bauer, Russell / Mahan, A. Harv / Xu, Yueqin / Stradins, Pauls et al. | 2007
- 747
-
Fabrication and characteristics of n-Si/c-Si/p-Si heterojunction solar cells using hot-wire CVDLien, Shui-Yang / Wu, Bing-Rui / Liu, Jun-Chin / Wuu, Dong-Sing et al. | 2007
- 751
-
Low temperature (less-than 100 deg C) fabrication of thin film silicon solar cells by HWCVDRath, J.K. / Jong, M. de / Schropp, R.E.I. et al. | 2008
- 751
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Low temperature (<100 °C) fabrication of thin film silicon solar cells by HWCVDRath, J.K. / de Jong, M. / Schropp, R.E.I. et al. | 2007
- 755
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Improvement of μc-Si:H n–i–p cell efficiency with an i-layer made by hot-wire CVD by reverse H2-profilingLi, H. / Franken, R.H. / Stolk, R.L. / van der Werf, C.H.M. / Rath, J.K. / Schropp, R.E.I. et al. | 2007
- 755
-
Improvement of micrometer c-Si:H n-i-p cell efficiency with an i-layer made by hot-wire CVD by reverse H2-profilingLi, H. / Franken, R.H. / Stolk, R.L. / Werf, C.H.M. van der / Rath, J.K. / Schropp, R.E.I. et al. | 2008
- 758
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Amorphous Si1−xCx:H films prepared by hot-wire CVD using SiH3CH3 and SiH4 mixture gas and its application to window layer for silicon thin film solar cellsOgawa, Shunsuke / Okabe, Masaaki / Itoh, Takashi / Yoshida, Norimitsu / Nonomura, Shuichi et al. | 2007
- 761
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Progress in a-Si:H/c-Si heterojunction emitters obtained by Hot-Wire CVD at 200 °CMuñoz, D. / Voz, C. / Martin, I. / Orpella, A. / Puigdollers, J. / Alcubilla, R. / Villar, F. / Bertomeu, J. / Andreu, J. / Damon-Lacoste, J. et al. | 2007
- 761
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Progress in a-Si:H/c-Si heterojunction emitters obtained by hot-wire CVD at 200 deg CMunoz, D. / Voz, C. / Martin, I. / Orpella, A. / Puigdollers, J. / Alcubilla, R. / Villar, F. / Bertomeu, J. / Andreu, J. / Damon-Lacoste, J. et al. | 2008
- 765
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Hot-wire CVD deposited n-type μc-Si films for μc-Si/c-Si heterojunction solar cell applicationsLien, Shui-Yang / Wuu, Dong-Sing / Wu, Bing-Rui / Horng, Ray-Hua / Tseng, Ming-Chun / Yu, Hsin-Her et al. | 2007
- 770
-
Organic FETs with HWCVD silicon nitride as a passivation layer and gate dielectricTiwari, S.P. / Srinivas, P. / Shriram, S. / Kale, Nitin S. / Mhaisalkar, S.G. / Ramgopal Rao, V. et al. | 2007
- 773
-
Application of Cat-CVD for ULSI technologyAkasaka, Yoichi et al. | 2007
- 779
-
Hot wire chemical vapor processing (HWCVP) — A prospective tool for VLSIDusane, Rajiv O. et al. | 2007
- 785
-
Maintaining Cu metal integrity on low-k IMDs with a nanometer thick a-SiC:H film obtained by HWCVDSingh, S.K. / Kumbhar, A.A. / Dusane, R.O. et al. | 2007
- 789
-
Developments in hot-filament metal oxide deposition (HFMOD)Durrant, Steven F. / Trasferetti, Benedito C. / Scarmínio, Jair / Davanzo, Celso U. / Rouxinol, Francisco P.M. / Gelamo, Rogério V. / Bica de Moraes, Mario A. et al. | 2007
- 794
-
Metal oxide nano-particles for improved electrochromic and lithium-ion battery technologiesDillon, A.C. / Mahan, A.H. / Deshpande, R. / Parilla, P.A. / Jones, K.M. / Lee, S-H. et al. | 2007
- 798
-
Synthesis of nanometal oxides and nanometals using hot-wire and thermal CVDMitra, S. / Sridharan, K. / Unnam, J. / Ghosh, K. et al. | 2007
- 803
-
Characterization of Si:O:C:H films fabricated using electron emission enhanced chemical vapour depositionDurrant, Steven F. / Rouxinol, Francisco P.M. / Gelamo, Rogério V. / Trasferetti, B. Cláudio / Davanzo, C.U. / Bica de Moraes, Mario A. et al. | 2007
- 807
-
TiO2 thin films using organic liquid materials prepared by Hot-Wire CVD methodIida, Tamio / Takamido, Yasuhiko / Kunii, Takao / Ogawa, Shunsuke / Mizuno, Kouichi / Narita, Tomoki / Yoshida, Norimitsu / Itoh, Takashi / Nonomura, Shuichi et al. | 2007
- 810
-
Ion beam modification of TiO2 films prepared by Cat-CVD for solar cellNarita, Tomoki / Iida, Tamio / Ogawa, Shunsuke / Mizuno, Kouichi / So, Jisung / Kondo, Akihiro / Yoshida, Norimitsu / Itoh, Takashi / Nonomura, Shuichi / Tanaka, Yasuhito et al. | 2007
- 814
-
Hot Ta filament resistance in-situ monitoring under silane containing atmosphereHrunski, D. / Schroeder, B. et al. | 2007
- 818
-
Investigation of silicon contamination of Ta filaments used for thin film silicon depositionHrunski, D. / Schroeder, B. / Scheib, M. / Merz, R.M. / Bock, W. / Wagner, C. et al. | 2007
- 822
-
Extension of the lifetime of tantalum filaments in the hot-wire (Cat) Chemical Vapor Deposition processKnoesen, Dirk / Arendse, Chris / Halindintwali, Sylvain / Muller, Theo et al. | 2007
- 826
-
A novel method for suppressing silicidation of tungsten catalyzer during silane decomposition in Cat-CVDHonda, Kazuhiro / Ohdaira, Keisuke / Matsumura, Hideki et al. | 2007
- 829
-
Catalytic CVD processes of oxidizing species and the prevention of oxidization of heated tungsten filaments by H2Umemoto, Hironobu / Ansari, S.G. / Morimoto, Takashi / Setoguchi, Shota / Uemura, Hitoshi / Matsumura, Hideki et al. | 2007
- 832
-
Composition of alumina films grown on Si at low temperature with catalytic CVDOgita, Yoh-Ichiro / Kudoh, Tugutomo / Sakamoto, Fumitaka et al. | 2007
- 836
-
Electrical properties of alumina films grown on Si at low temperature using catalytic CVDOgita, Yoh-Ichiro / Ohsone, Satoshi / Kudoh, Tsugutomo / Sakamoto, Fumitaka et al. | 2007
- 839
-
Cleaning technology for EUV multilayer mirror using atomic hydrogen generated with hot wireMotai, Kumi / Oizumi, Hiroaki / Miyagaki, Shinji / Nishiyama, Iwao / Izumi, Akira / Ueno, Tomoya / Namiki, Akira et al. | 2007
- 844
-
Hot-wire synthesis of Si nanoparticlesScriba, M.R. / Arendse, C. / Härting, M. / Britton, D.T. et al. | 2007
- 847
-
Photoresist removal process by hydrogen radicals generated by W catalystTakata, M. / Ogushi, K. / Yuba, Y. / Akasaka, Y. / Tomioka, K. / Soda, E. / Kobayashi, N. et al. | 2007
- 850
-
Aluminum-induced in situ crystallization of HWCVD a-Si:H filmsGupta, Sneha / Chelawat, Hitesh / Kumbhar, Alka A. / Adhikari, Subhra / Dusane, Rajiv O. et al. | 2007
- 853
-
Reduction of oxide layer on various metal surfaces by atomic hydrogen treatmentIzumi, Akira / Ueno, Tomoya / Miyazaki, Yasuo / Oizumi, Hiroaki / Nishiyama, Iwao et al. | 2007
- 856
-
Desorption process of copper chlorides from copper surfaceHibi, Atsushi / Susa, Akio / Koshi, Mitsuo et al. | 2007
- 859
-
Selective-catalyst formation for carbon nanotube growth by local indentation pressureYasui, T. / Nakai, Y. / Onozuka, Y. et al. | 2007
- 863
-
Author Index of Volume 516 Issue 5| 2007
- 865
-
Subject Index of Volume 516 Issue 5| 2007