Electron-beam, x-ray, & ion-beam techniques for submicrometer lithographies V : 11 - 12 March 1986, Santa Clara, California (English)
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1986
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ISBN:
- Conference Proceedings / Print
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Title:Electron-beam, x-ray, & ion-beam techniques for submicrometer lithographies V : 11 - 12 March 1986, Santa Clara, California
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Contributors:
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Conference:Electron-beam, X-ray, & Ion-beam Techniques for Submicrometer Lithographies ; 5 ; 1986 ; Santa Clara, Calif.
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Published in:
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Publisher:
- New search for: SPIE
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Place of publication:Bellingham, Wash.
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Publication date:1986
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Size:VI, 272 S
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Remarks:Ill., graph. Darst
Literaturangaben -
ISBN:
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Type of media:Conference Proceedings
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Type of material:Print
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Language:English
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Source:
Table of contents conference proceedings
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 2
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Practical Proximity CorrectionCarlson, Bob / Burbank, Dan et al. | 1986
- 5
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Aeble 150 Performance In A Mix And Match EnvironmentFreyer, Jorge L. / Sills, Robert M. et al. | 1986
- 17
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Aeble-150 E-Beam/Optical Hybrid LithographyBarnett, Kenneth A. / Metzger, Robert A. / Otto, Oberdan W. et al. | 1986
- 23
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Registration Mark Studying For High-Overlay-Accuracy Hybrid LithographyNozue, H. / Yamanaka, H. / Hasegawa, S. / Iida, Y. et al. | 1986
- 32
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Diffraction Grid Fabricated By Advanced Microelectronics Techniques For Hipparcos Astrometry MissionRoulet, M. E. / Oppliger, Y. / Stauffer, L. / Luginbahl, H. / Fontijn, L. / van der Kraan, M. et al. | 1986
- 40
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Submicron Proximity Correction By The Fourier Precompensation MethodHaslam, Michael E. / McDonald, John F. et al. | 1986
- 52
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Maskless Etching Of Inp And Gaas By Means Of Ion Beam Assisted EtchingGamo, Kenj i / Ochiai, Yukinori / Shioyama, Kazuhiko / Namba, Susumu et al. | 1986
- 60
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Fib Mask Repair With MicrotrimKaufmann, Henry C. / Thompson, William B. / Dunn, Gregory J. et al. | 1986
- 67
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Influence Of Sputter Effects On The Resolution In X-Ray Mask RepairBetz, H. / Heuberger, A. / Economou, N. P. / Shaver, D . C. et al. | 1986
- 76
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The Nanofab-150-A Versatile New Focused-Ion-Beam SystemParker, N.William / Robinson, William P. / Snyder, Joseph M. et al. | 1986
- 85
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FIB Microfabrication Software Design ConsiderationsThompson, W. / Bowe, T. / Morlock, S / Moskowitz, A. / Plourde, G . / Spaulding, G / Scialdone, C. / Tsiang, E. et al. | 1986
- 93
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Micron Features In III-V Materials By Photoelectrochemical Etching Of Focused Ion Beam Induced Damage PatternsCummings, K. D. / Harriott, L. R. / Chi, G. c. / Ostermayer, F. W. et al. | 1986
- 97
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Submicron Mask Repair Using Focused Ion Beam TechnologyYamamoto, Masahiro / Sato, Mitsuyoshi / Kyogoku, Hideaki / Aita, Kazuo / Nakagawa, Yoshitomo / Yasaka, Anto / Takasawa, Ryohji / Hattori, Osamu et al. | 1986
- 106
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Mask Technology For X-Ray Step-And-Repeat SystemShimkunas, A. R. / LaBrie, J. J. / Mauger, P. E. / Yen, J. J. et al. | 1986
- 118
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X-Ray Mask Distortion: Process And Pattern DependenceYanof, Arnold W. / Resnick, Douglas J. / Jankoski, Constance A. / Johnson, William A. et al. | 1986
- 133
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Characteristics Of A Gas-Puff Z-Pinch Plasma X-Ray SourceYoshihara, Hideo / Okada, Ikuo / Saitoh, Yasunao / Itabashi, Seiichi et al. | 1986
- 139
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Half Micron Cmos Device Fabrication Using Hybrid Lithography With X-Ray And Optical SteppersSuzuki, K. / Matsui, J. / Okada, K. / Endo, N. / Iida, Y. et al. | 1986
- 146
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Advanced X-Ray Alignment SystemFay, B. S. / Novak, W. T. et al. | 1986
- 156
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X-Ray Step-And-Repeat Lithography System For Submicron VLSIMcIntosh, R . B. / Hughes, G P. / Kreuter, J L. / Conti, G R. et al. | 1986
- 166
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Toward Submicron A New Phase Of Optical StepperSuzuki, Akiyoshi / Hirose, Ryusho / Hirabayashi, Youichi et al. | 1986
- 173
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Recent Progress On Submicron Electron Beam LithographyTakigawa, Tadahiro / Shimazaki, Kuniya / Kusui, Naoki et al. | 1986
- 182
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Sub-100nm pattern fabrication in e-beam lithographyTodokoro, Yoshihiro / Yamashita, Hiroshi / Yaegashi, Yuki et al. | 1986
- 189
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Novel Submicron Isolation Technique Of Gaas Active Layer Using Fibi-MbeBamba, Yasuo / Miyauchi, Eizo / Arimoto, Hiroshi / Morita, Tetsuo / Takamori, Akira / Hashimoto, Hisao et al. | 1986
- 196
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Focused Ion Beam System For Submicron LithographyAihara, R. / Sawaragi, H. / Morimoto, H. / Kato, T. et al. | 1986
- 203
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Sub-Micron Pattern Inspection System Using Electron BeamKato, T. / Saitoh, K. / Takeuchi, S. / Moriizumi, K. / Shibayama, K. et al. | 1986
- 212
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E-Beam Calibration Of The Hipparcos Grid PatternFontijn, L. A. / van Agthoven, H. J. / van der Kraan, M. R. et al. | 1986
- 222
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Scanning Electron Microscope (Sem) Dimensional Measurement ToolPaul, David P. et al. | 1986
- 232
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Quantitative Voltage Measurement By A Software Closed Loop Technique In Electron Beam TestingFurukawa, Yasuo / Goto, Yoshiro / Ishizuka, Toshihiro / Ookubo, Kazuo / Inagaki, Takefumi et al. | 1986
- 237
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An Expansible EB System For Submicron LithographyNakamura, Kazumitsu / Yanagisawa, Akira / Sakitani, Yoshio / Komoda, Tsutomu et al. | 1986
- 244
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Application Of Ghost Proximity Effect Correction Method To Conventional And Nonswelling Negative E-Beam ResistsLiu, Huayu / Liu, E. D. et al. | 1986
- 250
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Metal Deposition By Electron Beam Exposure Of An Organometallic FilmSchiavone, L. M. / Craighhead, H. G. et al. | 1986
- 256
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A Simple, Compact, High Brightness Source For X-Ray Lithography And X-Ray RadiographyHawryluk, Andrew M. et al. | 1986
- 264
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Fresnel Phase Effects For X-Ray MicrolithographyRedaelli, Renato / Tatchyn, Roman / Pianetta, Piero et al. | 1986