Zirconium-Aluminum-Oxide Dielectric Layer with High Dielectric and Relatively Low Leakage Prepared by Spin-Coating and the Application in Thin-Film Transistor (Unknown)
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In:
Coatings, Vol 10, Iss 3, p 282 (2020)
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2020
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ISSN:
- Article (Journal) / Electronic Resource
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Title:Zirconium-Aluminum-Oxide Dielectric Layer with High Dielectric and Relatively Low Leakage Prepared by Spin-Coating and the Application in Thin-Film Transistor
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Contributors:Zhihao Liang ( author ) / Shangxiong Zhou ( author ) / Wei Cai ( author ) / Xiao Fu ( author ) / Honglong Ning ( author ) / Junlong Chen ( author ) / Weijian Yuan ( author ) / Zhennan Zhu ( author ) / Rihui Yao ( author ) / Junbiao Peng ( author )
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Published in:
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Publisher:
- New search for: MDPI AG
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Publication date:2020
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ISSN:
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DOI:
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Type of media:Article (Journal)
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Type of material:Electronic Resource
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Language:Unknown
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Keywords:
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Source:
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