Semiconductor substrate developing apparatus and semiconductor substrate developing method (English)
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- New search for: TAO XUECHENG
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- New search for: TAO XUECHENG
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2016
- Patent / Electronic Resource
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Title:Semiconductor substrate developing apparatus and semiconductor substrate developing method
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Patent number:CN105319871
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- New search for: Europäisches Patentamt
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Publication date:2016-02-10
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Type of media:Patent
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Type of material:Electronic Resource
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Language:English
- New search for: G03F
- Further information on International Patent Classification
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Classification:
IPC: G03F Fotomechanische Herstellung strukturierter oder gemusterter Oberflächen, z.B. zum Drucken, zum Herstellen von Halbleiterbauelementen, PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES -
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