Methods, apparatuses, and systems related to forming a capacitor column using a sacrificial material (Chinese)
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- New search for: SHREERAM DEVESH DADHICH
- New search for: TRAN DIEM THY N
- New search for: SAPRA SANJEEV
- New search for: SHREERAM DEVESH DADHICH
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- New search for: SAPRA SANJEEV
2020
- Patent / Electronic Resource
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Title:Methods, apparatuses, and systems related to forming a capacitor column using a sacrificial material
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Additional title:涉及使用牺牲材料形成电容器柱的方法、设备及系统
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Patent number:CN111490158
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Patent applicant:
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Patent family:
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Contributors:
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Publisher:
- New search for: Europäisches Patentamt
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Publication date:2020-08-04
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Type of media:Patent
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Type of material:Electronic Resource
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Language:Chinese
- New search for: H01L
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Classification:
IPC: H01L Halbleiterbauelemente, SEMICONDUCTOR DEVICES -
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