Self-aligned growth of organometallic layers for nonvolatile memories: Comparison of liquid-phase and vapor-phase deposition (English)
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- New search for: Erlbacher, T.
- New search for: Jank, M.P.M.
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- New search for: Frey, L.
- New search for: Engl, R.
- New search for: Walter, A.
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- New search for: Dehm, C.
- New search for: Erlbacher, T.
- New search for: Jank, M.P.M.
- New search for: Ryssel, H.
- New search for: Frey, L.
- New search for: Engl, R.
- New search for: Walter, A.
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In:
Journal of the Electrochemical Society
;
155
, 9
; H693-
;
2008
- Article (Journal) / Electronic Resource
-
Title:Self-aligned growth of organometallic layers for nonvolatile memories: Comparison of liquid-phase and vapor-phase deposition
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Contributors:Erlbacher, T. ( author ) / Jank, M.P.M. ( author ) / Ryssel, H. ( author ) / Frey, L. ( author ) / Engl, R. ( author ) / Walter, A. ( author ) / Sezi, R. ( author ) / Dehm, C. ( author )
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Published in:Journal of the Electrochemical Society ; 155, 9 ; H693-
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Publisher:
- New search for: Fraunhofer Publica
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Publication date:2008
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DOI:
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Type of media:Article (Journal)
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Type of material:Electronic Resource
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Language:English
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Keywords:
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Source: