A fast and manufacture-friendly optical proximity correction based on machine learning (English)
- New search for: Ma, Xu
- New search for: Ma, Xu
- New search for: Jiang, Shangliang
- New search for: Wang, Jie
- New search for: Wu, Bingliang
- New search for: Song, Zhiyang
- New search for: Li, Yanqiu
In:
Microelectronic engineering
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168
; 15-26
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2017
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ISSN:
- Article (Journal) / Print
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Title:A fast and manufacture-friendly optical proximity correction based on machine learning
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Contributors:
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Published in:Microelectronic engineering ; 168 ; 15-26
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Publisher:
- New search for: Elsevier
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Place of publication:Amsterdam [u.a.]
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Publication date:2017
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ISSN:
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ZDBID:
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DOI:
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Type of media:Article (Journal)
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Type of material:Print
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Language:English
- New search for: 535/5670
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Keywords:
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Classification:
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Source:
Table of contents – Volume 168
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 1
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High performance Ge ultra-shallow junctions fabricated by a novel formation technique featuring spin-on dopant and laser annealing for sub-10nm technology applicationsLi, Junkang / Cheng, Ran / Liu, Chang / Zhang, Pengzhan / Lu, Jiwu / Chen, Kunji / Zhang, Rui / Zhao, Yi et al. | 2016
- 5
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MEMS-based fabrication of high-performance inductors with back hollow structure and ferromagnetic filmWang, Gang / Liu, Houfang / Qiu, Haochuan / Ning, Keyu / Yang, Yi / Li, Xiaoli / Xu, Xiaohong / Lavanant-Jambert, Marion / Petit-Watelot, Sébastien / Lu, Yuan et al. | 2016
- 10
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Fractal inductors on flexible plastic substrate fabricated by laser ablationDjuric, Snezana M. / Dubourg, Georges et al. | 2016
- 15
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A fast and manufacture-friendly optical proximity correction based on machine learningMa, Xu / Jiang, Shangliang / Wang, Jie / Wu, Bingliang / Song, Zhiyang / Li, Yanqiu et al. | 2016
- 27
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Spin-coated silver nanocomposite resistive switching devicesRajan, Krishna / Bocchini, Sergio / Chiappone, Annalisa / Roppolo, Ignazio / Perrone, Denis / Bejtka, Katarzyna / Ricciardi, Carlo / Pirri, Candido Fabrizio / Chiolerio, Alessandro et al. | 2016
- 32
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Effect of SiO2 hexagonal pattern on the crystal and optical properties of epitaxial lateral overgrown semipolar (11-22) GaN filmLee, Jae-Hwan / Han, Sang-Hyun / Song, Ki-Ryong / Ryou, Jae-Hyun / Na, Hyunseok / Lee, Sung-Nam et al. | 2016
- 37
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Experimental study of LiNbO3 memristors for use in neuromorphic computingWang, Shu / Wang, Weisong / Yakopcic, Chris / Shin, Eunsung / Subramanyam, Guru / Taha, Tarek M. et al. | 2016
- 41
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On the spatial resolution limit of direct-write electron beam lithographyJiang, Nan et al. | 2016
- 45
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Fabrication and characterization of dual AFM probe with narrow-gapped silicon tips and switchable cantilevers with magneto-strictive FePd film actuatorMineta, Takashi / Kawashima, Kenta / Taguchi, Ryoga et al. | 2016
- 50
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Thermal convective inclinometer using carbon nanotube yarnHan, Maeum / Bang, Younghwan / Kim, Woojin / Lee, Gil S. / Jung, Daewoong et al. | 2016
- 55
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Observation of temperature effect on electrical properties of novel Au/Bi0.7Dy0.3FeO3/ZnO/p-Si thin film MIS capacitor for MEMS applicationsBhatia, Deepak / Roy, Sandipta / Nawaz, S. / Meena, R.S. / Palkar, V.R. et al. | 2016
- 62
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Comparative study of SML electron beam resist characteristics with different developersAassime, A. / Bayle, F. / Plante, M.P. / Hamouda, F. et al. | 2016
- 67
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A novel self-aligned charge plasma Schottky barrier tunnel FET using work function engineeringSingh, Sangeeta / Singh, Arun Pratap / Kondekar, P.N. et al. | 2016
- 76
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Removal rate and surface quality of the GLSI silicon substrate during the CMP processHong, Jiao / Niu, Xinhuan / Liu, Yuling / Wang, Chenwei / Zhang, Baoguo / Sun, Ming / Wang, Juan / Han, Liying / Zhang, Wenqian et al. | 2016
- 82
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RF performance of ink-jet printed microstrip lines on rigid and flexible substratesSim, Sung-min / Lee, Yeonsu / Kang, Hye-Lim / Shin, Kwon-Yong / Lee, Sang-Ho / Kim, Jung-Mu et al. | 2016
- 89
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Electron beam generated plasmas: Characteristics and etching of silicon nitrideWalton, S.G. / Boris, D.R. / Hernández, S.C. / Lock, E.H. / Petrova, Tz. B. / Petrov, G.M. / Jagtiani, A.V. / Engelmann, S.U. / Miyazoe, H. / Joseph, E.A. et al. | 2016
- IFC
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Editorial Board| 2014