A complete system of nano-imprint lithography for IC production (English)
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In:
Emerging Lithographic Technologies, 6
;
214-222
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2002
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ISSN:
- Conference paper / Print
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Title:A complete system of nano-imprint lithography for IC production
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Contributors:White, D.L. ( author ) / Wood, O.R. II ( author ) / Chen, Cheng-fu ( author ) / Lovell, E.G. ( author ) / Engelstad, R.L. ( author )
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Published in:Emerging Lithographic Technologies, 6 ; 214-222Proceedings of the SPIE - The International Society for Optical Engineering ; 4688, pt.1-2 ; 214-222
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Publisher:
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Publication date:2002
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Size:9 Seiten, 7 Quellen
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ISSN:
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Coden:
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DOI:
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Type of media:Conference paper
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Type of material:Print
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Language:English
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Keywords:integrierte Schaltungstechnologie , Formverfahren , Photopolymer , Photochemie , Ionenstrahlätzen , Ultraviolettbestrahlung , Strahlungswirkung , Fertigung integrierter Schaltungen , Silicium-Wafer , Ultraviolettstrahlung , reaktives Ionenätzen , Inspektion , Nanometerbereich , Siliciumdioxid , Ultraviolettlithographie , Nanolithographie
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