Introduction of PECVD carbon hardmasks (APF) for sub-90nm DRAM technology (English)
- New search for: Vogt, Mirko
- New search for: Buerger, Matthias
- New search for: Seamons, Martin
- New search for: Kirchhoff, Markus
- New search for: Stavrev, Momtchil
- New search for: Wege, Stephan
- New search for: Yeh, Wendy
- New search for: Sperlich, Hans-Peter
- New search for: Morgenstern, Thomas
- New search for: M'Saad, Hichem
- New search for: Vogt, Mirko
- New search for: Buerger, Matthias
- New search for: Seamons, Martin
- New search for: Kirchhoff, Markus
- New search for: Stavrev, Momtchil
- New search for: Wege, Stephan
- New search for: Yeh, Wendy
- New search for: Sperlich, Hans-Peter
- New search for: Morgenstern, Thomas
- New search for: M'Saad, Hichem
In:
ISTC, International Conference on Semiconductor Technology, 3
;
528-540
;
2004
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ISSN:
- Conference paper / Print
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Title:Introduction of PECVD carbon hardmasks (APF) for sub-90nm DRAM technology
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Contributors:Vogt, Mirko ( author ) / Buerger, Matthias ( author ) / Seamons, Martin ( author ) / Kirchhoff, Markus ( author ) / Stavrev, Momtchil ( author ) / Wege, Stephan ( author ) / Yeh, Wendy ( author ) / Sperlich, Hans-Peter ( author ) / Morgenstern, Thomas ( author ) / M'Saad, Hichem ( author )
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Published in:Electrochemical Society Proceedings Volume ; 11 ; 528-540
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Publisher:
- New search for: Electrochemical Society
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Place of publication:Pennington
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Publication date:2004
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Size:13 Seiten, 15 Bilder, 1 Tabelle, 11 Quellen
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ISSN:
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Type of media:Conference paper
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Type of material:Print
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Language:English
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Keywords:
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Source: