Non-delta-chrome optical proximity correction methodology for process models with three-dimensional mask effects (English)
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- New search for: Ng, Philip C.W.
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- New search for: Melvin, Lawrence S.
In:
Journal of Microlithography, Microfabrication and Microsystems
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10
, 3
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033010/1-033010/14
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2011
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ISSN:
- Article (Journal) / Print
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Title:Non-delta-chrome optical proximity correction methodology for process models with three-dimensional mask effects
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Contributors:
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Published in:Journal of Microlithography, Microfabrication and Microsystems ; 10, 3 ; 033010/1-033010/14
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Publisher:
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Publication date:2011
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Size:14 Seiten, 40 Quellen
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ISSN:
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Coden:
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DOI:
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Type of media:Article (Journal)
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Type of material:Print
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Language:English
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Keywords:
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Source:
Table of contents – Volume 10, Issue 3
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 30101
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New Impact Factor of JM3Lin, Burn J. et al. | 2011
- 32001
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Technology review and assessment of nanoimprint lithography for semiconductor and patterned media manufacturingMalloy, Matt et al. | 2011
- 33001
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Impact of post-litho linewidth roughness smoothing processes on the post-etch patterning resultFoubert, Philippe et al. | 2011
- 33002
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Combined effects of prepulsing and target geometry on efficient extreme ultraviolet production from laser produced plasma experiments and modelingHassanein, Ahmed et al. | 2011
- 33003
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Source mask polarization optimizationHansen, Steven G. et al. | 2011
- 33004
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Extreme-ultraviolet secondary electron blur at the 22-nm half pitch nodeGronheid, Roel et al. | 2011
- 33005
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Investigation of the influence of structural parameters of a Fresnel-type lens on the narrowing of light-emitting diode light beamsHsieh, Chi-Chang et al. | 2011
- 33006
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Optical position encoding and phase control of an electrostatically driven two-dimensional MOEMS scanner at two resonant modesTortschanoff, Andreas et al. | 2011
- 33007
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Active triangulation metrology system with high dynamic rangeHa¨rter, Daniel et al. | 2011
- 33008
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Statistical-noise effect on power spectrum of long-range-correlated line-edge and line-width roughnessHiraiwa, Atsushi et al. | 2011
- 33009
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Materials challenges for sub-20-nm lithographyThackeray, James W. et al. | 2011
- 33010
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Non-delta-chrome optical proximity correction methodology for process models with three-dimensional mask effectsNg, Philip C. W. et al. | 2011
- 33011
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Extreme ultraviolet-embedded phase-shift maskYan, Pei-yang et al. | 2011
- 33012
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Solid-immersion Lloyd's mirror as a testbed for plasmon-enhanced ultrahigh numerical aperture lithographyMehrotra, Prateek et al. | 2011
- 33013
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Development of a micropump for Bio-MEMS using a new biocompatible piezoelectric material MgSiO3Nakamachi, Eiji et al. | 2011
- 33014
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Fabrication of five-layer three-dimensional miniature SU-8 axial fans using ultraviolet lithographyKeramati, Hamed et al. | 2011
- 33015
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Nanofabrication of superzone solid immersion vortex lens and subwavelength antireflection surfaces for enhanced scanning laser imagingCoyne, Edward et al. | 2011
- 33016
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Novel microelectromechanical systems image reversal fabrication process based on robust SU-8 masking layersOstrow, Scott A. et al. | 2011
- 33017
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Overlay measurements by Mueller polarimetry in back focal planeFallet, Cle´ment et al. | 2011
- 33018
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Defect reduction of high-density full-field patterns in jet and flash imprint lithographySingh, Lovejeet et al. | 2011
- 33019
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Stochastic exposure kinetics of extreme ultraviolet photoresists: simulation studyMack, Chris A. et al. | 2011
- 33020
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Fabrication of densely patterned micro-arrayed multichannel optical filter mosaicYi, Dingrong et al. | 2011
- 33021
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Cost-driven mask strategies considering parametric yield, defectivity, and production volumeJeong, Kwangok et al. | 2011