Innovative nanoimprint lithography using PFP condensable gas (English)
- New search for: Hiroshima, Hiroshi
- New search for: Nakagawa, Masaru
- New search for: Hirai, Yoshihiko
- New search for: Matsui, Shinji
- New search for: Hiroshima, Hiroshi
- New search for: Nakagawa, Masaru
- New search for: Hirai, Yoshihiko
- New search for: Matsui, Shinji
In:
Journal of Photopolymer Science and Technology
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26
, 1
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87-96
;
2013
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ISSN:
- Article (Journal) / Print
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Title:Innovative nanoimprint lithography using PFP condensable gas
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Additional title:Innovative Nanopräge-Lithography mit PFP kondensierbaren Gas
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Contributors:Hiroshima, Hiroshi ( author ) / Nakagawa, Masaru ( author ) / Hirai, Yoshihiko ( author ) / Matsui, Shinji ( author )
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Published in:Journal of Photopolymer Science and Technology ; 26, 1 ; 87-96
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Publisher:
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Publication date:2013
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Size:10 Seiten, 16 Bilder, 2 Tabellen, 44 Quellen
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ISSN:
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Coden:
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DOI:
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Type of media:Article (Journal)
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Type of material:Print
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Language:English
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Keywords:
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Source:
Table of contents – Volume 26, Issue 1
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 3
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The Photopolymer Science and Technology AwardBowden, M.J. et al. | 2013
- 15
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The Hole Shrink Problem: Directed Self-Assembly Using Self-Consistent Field TheoryIwama, T. / Laachi, N. / Delaney, K.T. / Kim, B. / Hur, S.-M. / Bristol, R. / Shykind, D. / Weinheimer, C.J. / Fredrickson, G.H. et al. | 2013
- 21
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Electrical Via Chain Yield for DSA Contact Hole Shrink ProcessKato, H. / Seino, Y. / Yonemitsu, H. / Sato, H. / Kanno, M. / Kobayashi, K. / Kawanishi, A. / Imamura, T. / Omura, M. / Nakamura, N. et al. | 2013
- 27
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Directed Self Assembly Material Development for Fine Patterning and Pattern RepairMinegishi, S. / Namie, Y. / Izumi, K. / Anno, Y. / Buch, X. / Naruoka, T. / Hishiro, Y. / Nagai, T. et al. | 2013
- 31
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Opportunities and Challenges for Directed Self-Assembly for Advanced PatterningChang, S.-W. / Ginzburg, V.V. / Kramer, J.W. / Lee, C. / Li, M. / Murray, D.J. / Park, J. / Roy, R. / Sharma, R. / Trefonas, P. et al. | 2013
- 39
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Formation of Ultra Narrow Lamellar Structures in POSS-containing Triblock TerpolymersGoseki, R. / Ishizone, T. / Hirao, A. / Hayakawa, T. et al. | 2013
- 45
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Thin Film Block Copolymer Assembly in Mixtures of Highly Selective SolventsEllison, C.J. / Cushen, J.D. / Willson, C.G. et al. | 2013
- 49
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Spin-on Glass as Perpendicular Orientation Control Layer for Block CopolymerNakamura, H. / Mikoshiba, S. / Hieno, A. / Hattori, S. / Asakawa, K. et al. | 2013
- 55
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Topcoat Approaches for Directed Self-Assembly of Strongly Segregating Block Copolymer Thin FilmsYoshida, H. / Suh, H.S. / Ramirez-Hernandez, A. / Lee, J.I. / Aida, K. / Wan, L. / Ishida, Y. / Tada, Y. / Ruiz, R. / de Pablo, J. et al. | 2013
- 59
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Pattern Scaling of Holes, Bars, and Trenches with Directed Self-Assembly using Polymer BlendMatsui, Y. / Liu, C.-C. / Abdallah, J.A. / Tseng, C. / Xu, Y. / Colburn, M. et al. | 2013
- 65
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Comparison Molecular Orientation of Photoinduced Liquid Crystalline Polymer induced by Thermal Nanoimprinting to that by GraphoepitaxyOkada, M. / Nishioka, E. / Kondo, M. / Haruyama, Y. / Sasaki, T. / Ono, H. / Kawatsuki, N. / Matsui, S. et al. | 2013
- 69
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Fabrication of Low Dislocation Density GaN Template by Nano-channel FIELO Using Nanoimprint LithographyOkada, A. / Shoji, S. / Shinohara, H. / Nishihara, H. / Goto, H. / Sunakawa, H. / Matsueda, T. / Usui, A. / Yamaguchi, A.A. / Mizuno, J. et al. | 2013
- 73
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Thermal Imprint of P3HT and PCPDTBT: Layer Preparation and Imprint TemperatureWang, S. / Kowalski, S. / Mayer, A. / Dhima, K. / Steinberg, C. / Papenheim, M. / Scheer, H.-C. et al. | 2013
- 79
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Ordered P3HT/PCBM Heterostructured Organic Photodiode for Radiation Detection using Direct Nanoimprint LithographyTada, K. / Takada, E. / Fujii, K. / Uemura, K. / Tomohiro, K. / Hirai, Y. et al. | 2013
- 83
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Molecular Orientation of Photoinduced Liquid Crystalline Polymer with 3D Structure fabricated by Thermal NanoimprintingOkada, M. / Nishioka, E. / Kondo, M. / Haruyama, Y. / Sasaki, T. / Ono, H. / Kawatsuki, N. / Matsui, S. et al. | 2013
- 87
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Innovative Nanoimprint Lithography Using PFP Condensable GasHiroshima, H. / Nakagawa, M. / Hirai, Y. / Matsui, S. et al. | 2013
- 97
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Approach for High Aspect Ratio Pattern Transfer by Nanoimprint Lithography using Mixture Polymers of Molecular WeightsNishikura, N. / Kawata, H. / Hirai, Y. et al. | 2013
- 105
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UV-Nanoimprint Lithography with Film Mold for LED-PSS Fabrication ProcessKojima, R. / Takahashi, T. / Mizawa, T. et al. | 2013
- 109
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Pattern Size Trimming by UV Exposure for Resist Patterns Fabricated by Thermal Nanoimprint LithographyNoma, H. / Kawata, H. / Yasuda, M. / Hirai, Y. et al. | 2013
- 113
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Formation of Patterned Sapphire Substrate using UV Imprint ProcessesShinohara, H. / Fujiwara, S. / Tashiro, t. / Kitahara, H. / Goto, H. et al. | 2013
- 119
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Innovative and Tailor-made Resist and Working Stamp Materials for Advancing NIL-based Production TechnologySchleunitz, A. / Vogler, M. / Fernandez-Cuesta, I. / Schift, H. / Gruetzner, G. et al. | 2013
- 125
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Development of Film Mold for Roll to Roll Nanoimprintg Process and its ApplicationSuto, Y. / Mizawa, T. / Mizukami, Y. / Takahashi, T. et al. | 2013
- 129
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Surface Evaluation of Cationic UV-curable Resin with Fluorine Additive by X-ray Photoelectron SpectroscopyOyama, T. / Okada, M. / Iyoshi, S. / Haruyama, Y. / Miyake, H. / Mizuta, T. / Matsui, S. et al. | 2013
- 133
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Novel Fluorinated Compounds for Releasing Material in Nanoimprint LithographyYamashita, T. / Morita, M. et al. | 2013
- 137
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Evaluation of Template Releasing Energy in Nanoimprint LithographyNishino, T. / Honoka, F. / Kawata, H. / Hirai, Y. et al. | 2013
- 143
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Release Property Evaluation of Fluorinated Antisticking Layer by a Mixture of Release AgentsWakaba, H. / Okada, M. / Iyoshi, S. / Haruyama, Y. / Matsui, S. et al. | 2013