Directed Self Assembly Materials for Semiconductor Lithography (English)
- New search for: Minegishi, Shinya
- New search for: Naruoka, Takehiko
- New search for: Nagai, Tomoki
- New search for: Minegishi, Shinya
- New search for: Naruoka, Takehiko
- New search for: Nagai, Tomoki
In:
Journal of Photopolymer Science and Technology
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26
, 6
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793-800
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2013
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ISSN:
- Article (Journal) / Print
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Title:Directed Self Assembly Materials for Semiconductor Lithography
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Additional title:Materialien mit gezielter Selbstassemblierung für die Halbleiter-Lithographie
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Contributors:
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Published in:Journal of Photopolymer Science and Technology ; 26, 6 ; 793-800
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Publisher:
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Publication date:2013
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Size:8 Seiten, 4 Bilder, 58 Quellen
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ISSN:
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Coden:
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DOI:
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Type of media:Article (Journal)
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Type of material:Print
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Language:English
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Keywords:
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Source:
Table of contents – Volume 26, Issue 6
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 691
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Novel EUV Resist Materials and Process for 20 nm Half Pitch and BeyondInukai, K. / Maruyama, K. / Kawakami, T. / Ramkrichnan, A. / Hishiro, Y. / Kimura, T. et al. | 2013
- 697
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EUV Extendibility: Challenges Facing EUV at 1x and beyondNaulleau, P.P. / Anderson, C.N. / Bhattarai, S. / Neureuther, A. et al. | 2013
- 705
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Electrification on Condensation Surface of Micro Particles with Atomic Force Microscope (AFM)Kawai, A. et al. | 2013
- 707
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Fluorescent Chemosensors for Fluoride Anion Based on Naphthalene Derivatives Bearing Two Urea GroupsSakamaki, M. / Fukushima, Y. et al. | 2013
- 713
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Local Heating System Integrated with Platinum Micro Heater and Photopolymer Microfluidic ChannelNoguchi, Y. / Kawai, A. et al. | 2013
- 717
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Fabrication of Micro Tube Array by Combining Positive with Negative Type Photoresists due to Solubility Difference in DeveloperOtsuka, K. / Takahashi, K. / Kawai, A. et al. | 2013
- 721
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Study on the Interaction between BSA and a Water-Soluble Cationic Poly(heteroarylene methine) Bearing Pyridinium SaltsSakamaki, M. / Kato, A. / Fukushima, Y. et al. | 2013
- 727
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Liquid Penetration Control of Photoresist/Perflurosulfonic Acid (PFSA) Double Layer Structure by Hydrophobic TreatmentSakurai, Y. / Takahashi, K. / Kawai, A. et al. | 2013
- 733
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Synthesis of Telechelic Acrylamide Oligomers by Photo-assisted Living Radical Telomerization in Water Using Disulfide InifertersHarashima, Susumu / Matsumoto, Toshihiko et al. | 2013
- 733
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Synthesis of Telechelic Acrylamide Oligomers by Photo-assisted Living Radical Telemerization in Water Using Disulfide InifertersHarashima, S. / Matsumoto, T. et al. | 2013
- 739
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Micro Pinhole Formation in Photoresist Multilayer Structure controlled with Hydrophilic TreatmentNoguchi, Y. / Takahashi, K. / Kawai, A. et al. | 2013
- 745
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Pulse Radiolysis Study on a Highly Sensitive Chlorinated Resist ZEP520AHosaka, Y. / Oyama, T.G. / Oshima, A. / Enomoto, S. / Washio, M. / Tagawa, S. et al. | 2013
- 751
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Fabrication and Durability of Single Chip Micro Direct Methanol Fuel Cell (SC-μDMFC) by Photolithography ProcessSakurai, Y. / Tanaka, D. / Ohata, S. / Kawai, A. et al. | 2013
- 757
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Effect of Photo-initiator on Photosensitive Emission PolymerLiu, T.-H. / Cheng, W.-T. / Lin, J.-J. et al. | 2013
- 765
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Effect of Low Surface Tension Developer on Micro Bubble Removal from Resist Square Window PatternTakahashi, K. / Kawai, A. et al. | 2013
- 769
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Photo-Alignment Characteristics of Charge-Transfer Complexes Forming Polymides with Tetramethyl Phenylene DiamineSato, S. / Matsumoto, H. et al. | 2013
- 777
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Preface for Special Issue of Directed Self Assembly (DSA)Ueno, T. / Nagahara, S. et al. | 2013
- 779
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Readying Directed Self-Assembly for Patterning in Semi-Conductor ManufacturingGronheid, R. / Delgadillo, P.R. / Singh, A. / Younkin, T.R. / Sayan, S. / Chan, B.T. / Van Look, L. / Bekaert, J. / Pollentier, I. / Nealey, P.F. et al. | 2013
- 793
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Directed Self Assembly Materials for Semiconductor LithographyMinegishi, S. / Naruoka, T. / Nagai, T. et al. | 2013
- 801
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Applicable Simulation Methods for Directed Self-Assembly -Advantages and Disadvantages of These MethodsMorita, H. et al. | 2013
- 809
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Large-Scale Simulations of Directed Self-Assembly with Simplified ModelYoshimoto, K. / Taniguchi, T. et al. | 2013
- 817
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Modeling Chemoepitaxy of Block Copolymer Thin Films using Self-Consistent Field TheoryGinzburg, V.V. / Weinhold, J.D. / Hustad, P.D. / Trefonas, P. et al. | 2013
- 825
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Super High Sensitivity Enhancement by Photo-Sensitized Chemically Amplified Resist (PS-CAR) ProcessTagawa, S. / Enomoto, S. / Oshima, A. et al. | 2013
- 831
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Scale-up of a Chemo-Epitaxy Flow for Feature Multiplication Using Directed Self-Assembly of Block-CopolymersRincon-Delgadillo, P. / Craig, G. / Gronheid, R. / Nealey, P.F. et al. | 2013
- 841
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Contents of Journal of Photopolymer Science and Technology Volume 26, No. 1-6, 2013| 2013