Pulsed electron beam lithography in soft vacuum (English)
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In:
Journal of Vacuum Science and Technology, Part B (Microelectronics Processing and Phenomena)
;
8
, 1
;
39-46
;
1990
- Article (Journal) / Print
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Title:Pulsed electron beam lithography in soft vacuum
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Additional title:Gepulste Elektronenstrahllithographie bei leichtem Vakuum
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Contributors:Krishnaswamy, J. ( author ) / Li, L. ( author ) / Collins, G.J. ( author ) / Hiraoka, H. ( author ) / Caolo, M.A. ( author )
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Published in:
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Publisher:
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Publication date:1990
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Size:8 Seiten, 33 Quellen
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DOI:
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Type of media:Article (Journal)
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Type of material:Print
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Language:English
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Keywords:ELEKTRONENSTRAHLLITHOGRAPHIE , POLYMER , IMPULSTECHNIK , VAKUUM , POLYMETHYLMETHACRYLAT , POLYMERISAT , SUBMIKROMETERBEREICH , MASKE , MIKROELEKTRONIK , DUENNE SCHICHT , CHEMISCHE REAKTION , SCHICHTDICKE , ELEKTRONENLACK , ELEKTRONENSTRAHLUNG , INTEGRIERTE HALBLEITERSCHALTUNG , INTEGRIERTE SCHALTUNGSTECHNOLOGIE , LINIENBREITE , VERPACKUNGSTECHNIK
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Source: