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TILT-COLUMN MULTI-BEAM ELECTRON MICROSCOPY SYSTEM AND METHOD
Free accessEuropean Patent Office | 2024| -
PLASMA HYPERMODEL INTEGRATED WITH FEATURE-SCALE PROFILE MODEL FOR ACCELERATED ETCH PROCESS DEVELOPMENT
Free accessEuropean Patent Office | 2024| -
IMAGE PRE-PROCESSING FOR OVERLAY METROLOGY USING DECOMPOSITION TECHNIQUES
Free accessEuropean Patent Office | 2024| -
PULSE-ASSISTED LASER-SUSTAINED PLASMA IN FLOWING HIGH-PRESSURE LIQUIDS
Free accessEuropean Patent Office | 2024| -
Sensitive optical metrology in scanning and static modes
Free accessEuropean Patent Office | 2024| -
METHOD AND APPARATUS FOR POSITIONING OPTICAL ISOLATOR ASSEMBLY WITH REPLACEABLE MOTOR ASSEMBLY
Free accessEuropean Patent Office | 2024| -
Confocal Chromatic Metrology for EUV Source Condition Monitoring
Free accessEuropean Patent Office | 2024| -
MULTI-PITCH GRID OVERLAY TARGET FOR SCANNING OVERLAY METROLOGY
Free accessEuropean Patent Office | 2024| -
DIFFERENTIAL HEIGHT MEASUREMENT USING INTERSTITIAL MIRROR PLATE
Free accessEuropean Patent Office | 2024| -
LITHOGRAPHY MASK REPAIR BY SIMULATION OF PHOTORESIST THICKNESS EVOLUTION
Free accessEuropean Patent Office | 2024| -
Methods And Systems For X-Ray Scatterometry Measurements Employing A Machine Learning Based Electromagnetic Response Model
Free accessEuropean Patent Office | 2024| -
METROLOGY TARGET FOR ONE-DIMENSIONAL MEASUREMENT OF PERIODIC MISREGISTRATION
Free accessEuropean Patent Office | 2024| -
DETERMINING METROLOGY-LIKE INFORMATION FOR A SPECIMEN USING AN INSPECTION TOOL
Free accessEuropean Patent Office | 2024|
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