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Simulation of ion beam direct structuring for 3D nanoimprint template fabrication
Online Contents | 2006| -
Maskless lithography and nanopatterning with electron and ion multibeam projection (Keynote Paper) [7637-02]
British Library Conference Proceedings | 2010| -
Temperature-dependent segregation reversal and (1x3) missing-row structure of Pt90Co10(110)
Online Contents | 2000| -
Trajectory-dependent neutralization of 1keV He+ ions scattered from Pb(111) and Pb films on Cu(100)
Online Contents | 1998| -
Temperature-dependent segregation and (1x2) missing-row reconstruction of Pt25Rh75(110)
Online Contents | 1999| -
Projection Charged Particle Nanolithography and Nanopatterning (5 pages)
British Library Online Contents | 2010| -
Projection Charged Particle Nanolithography and Nanopatterning (5 pages)
British Library Conference Proceedings | 2010| -
Electron multi-beam technology for mask and wafer writing at 0.1 nm address grid (Keynote Paper) [8680-3]
British Library Conference Proceedings | 2013| -
Projection maskless patterning for nanotechnology applications
British Library Online Contents | 2008| -
Performance of the proof-of-concept multi-beam mask writer (MBMW POC) (Invited Paper) [8880-50]
British Library Conference Proceedings | 2013| -
Projection maskless patterning for nanotechnology applications
British Library Conference Proceedings | 2008| -
Printing results of a proof-of-concept 50keV electron multi-beam mask exposure tool (eMET POC) [8522-52]
British Library Conference Proceedings | 2012| -
Results of proof-of-concept 50keV electron multi-beam mask exposure tool (eMET POC) [8441-58]
British Library Conference Proceedings | 2012| -
50 keV electron multibeam mask writer for the 11nm HP node: first results of the proof of concept tool (eMET POC) [8323-15]
British Library Conference Proceedings | 2012| -
Influence of FIB patterning strategies on the shape of 3D structures: Comparison of experiments with simulations
Free accessFraunhofer Publica | 2010|
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