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Oxygen chemisorption and oxide formation on Si(111) and Si(100) surfaces
American Institute of Physics | 1983| -
A simple, controllable source for dosing molecular halogens in UHV
American Institute of Physics | 1983| -
Structural properties of titanium dioxide films deposited in an rf glow discharge
American Institute of Physics | 1983| -
Hard diamondlike carbon films deposited by ionized deposition of methane gas
American Institute of Physics | 1983| -
The molecular and atomic states of oxygen adsorbed on Rh(100): Adsorption
American Institute of Physics | 1983| -
The effect of passivation thickness on the electromigration lifetime of Al/Cu thin film conductors
American Institute of Physics | 1983| -
Carburization of steel surfaces during implantation of Ti ions at high fluences
American Institute of Physics | 1983| -
Covalent interaction effects in electron/photon‐stimulated desorption
American Institute of Physics | 1983| -
Study of cleaved, oxidized, etched, and heat‐treated CdTe surfaces
American Institute of Physics | 1983| -
Recent progress on LADA growth of HgCdTe and CdTe epitaxial layers
American Institute of Physics | 1983| -
Chemical bonding and reactions at Ti/Si and Ti/oxygen/Si interfaces
American Institute of Physics | 1983| -
Band gap variation and lattice, surface, and interface ‘‘instabilities’’ in Hg1−xCdxTe and related compounds
American Institute of Physics | 1983|
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