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157-nm lithography for 100-nm generation and beyond: progress and status [4186-29]
British Library Conference Proceedings | 2001|Contributors: Dao, G. T. -
Leaching behavior of water-soluble carbohydrates from almond hulls
British Library Online Contents | 2015| -
New approach to phase metrology for manufacturing 248-nm lithography-based embedded attenuated phase-shifting mask [2793-55]
British Library Conference Proceedings | 1996| -
Interferometric measurement of etch depths in phase-shift masks [1926-05]
British Library Conference Proceedings | 1993| -
248-nm DUV MoSiON embedded phase-shifting mask for 0.25-m lithography [2512-31]
British Library Conference Proceedings | 1995| -
157-nm lithography program at International SEMATECH (Invited Paper) [4754-85]
British Library Conference Proceedings | 2002| -
Impact of surface contamination on transmittance of modified fused silica for 157-nm lithography application [4186-84]
British Library Conference Proceedings | 2001|Contributors: Dao, G. T. -
Ever-increasing role of mask technology in deep submicrometer lithography (Invited Paper) [2254-01]
British Library Conference Proceedings | 1994| -
NGL process and the role of International SEMATECH (Invited Paper) [4688-02]
British Library Conference Proceedings | 2002| -
Predicting mask performance by numerical simulation [2621-50]
British Library Conference Proceedings | 1995| -
Modeling of optical constants of materials comprising photolithographic masks in the VUV [3873-88]
British Library Conference Proceedings | 1999| -
Progress in 157-nm lithography development at Intel: resists and reticles [4000-182]
British Library Conference Proceedings | 2000| -
Repair and imaging of 193-nm MoSiON phase-shift photomasks [4562-135]
British Library Conference Proceedings | 2002|Contributors: Dao, G. T. -
Rigorous 3D simulation of phase defects in alternating phase-shifting masks [4562-117]
British Library Conference Proceedings | 2002|Contributors: Dao, G. T. -
Model-based OPC methodology for 0.13 micron technology [4562-81]
British Library Conference Proceedings | 2002|Contributors: Dao, G. T. -
Cleaning of photomask substrates using CO~2 snow [4562-67]
British Library Conference Proceedings | 2002|Contributors: Dao, G. T. -
Dry etching characteristics of attenuated phase-shifting masks using Cl~2/CF~4/O~2/He plasmas [4562-62]
British Library Conference Proceedings | 2002|Contributors: Dao, G. T. -
Impact of graybeam method of virtual address reduction on image quality [4562-59]
British Library Conference Proceedings | 2002|Contributors: Dao, G. T. -
Use of nanomachining as a technique to reduce scrap of high-end photomasks [4562-23]
British Library Conference Proceedings | 2002|Contributors: Dao, G. T.
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