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Effect of amorphization and carbon co-doping on activation and diffusion of boron in silicon
Online Contents | 2006| -
Influence of the anneal conditions on arsenic activation during solid-phase epitaxial regrowth
Online Contents | 2005| -
Enhanced boron activation in silicon by high ramp-up rate solid phase epitaxial regrowth
Online Contents | 2005| -
Papers from the Seventh International Workshop on the Fabrication, Characterization, and Modeling of Ultra-Shallow Doping Profiles in Semiconductors - Progress and New Ideas in USJ Fabrication - Chemical and electrical dopants profile evolution during solid phase epitaxial regrowth
Online Contents | 2004| -
Evidence on the mechanism of boron deactivation in Ge-preamorphized ultrashallow junctions
Online Contents | 2004| -
B profile alteration by annealing in reactive ambients (3 pages)
British Library Online Contents | 2009| -
2AO.3.6 Implantation for an Excellent Definition of Doping Profiles in Si Solar Cells
British Library Conference Proceedings | 2009|
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