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Synonyms were used for: ultraviolet lithography
Search without synonyms: keywords:("ultraviolet lithography")
Used synonyms:
- ultraviolettlithografie
- ultraviolettlithographie
- uv lithografie
- uv lithographie
- uv lithography
-
Optical and EUV lithography : a modeling perspective
TIBKAT | 2021|Keywords: Extreme ultraviolet lithography -
Talbot lithography: Self-imaging of complex structures
American Institute of Physics | 2009|Keywords: Extreme Ultraviolet Lithography -
Recent developments in photoresists for extreme-ultraviolet lithography
Elsevier | 2023|Keywords: Extreme-ultraviolet lithography -
EUV pattern defect detection sensitivity based on aerial image linewidth measurements
American Institute of Physics | 2009|Keywords: Extreme Ultraviolet Lithography -
Improved light emitting UV curable PbS quantum dots-polymer composite optical waveguides
Elsevier | 2017|Keywords: UV lithography -
Pushing extreme ultraviolet lithography development beyond 22 nm half pitch
American Institute of Physics | 2009|Keywords: Extreme Ultraviolet Lithography -
3D microfabrication with inclined/rotated UV lithography
Elsevier | 2003|Keywords: Inclined UV lithography, Rotated UV lithography -
Laser produced plasma EUV sources for device development and HVM (Invited Paper) [8322-53]
British Library Conference Proceedings | 2012|Keywords: Extreme ultraviolet lithography -
From performance validation to volume introduction of ASML's NXE platform (Invited Paper) [8322-51]
British Library Conference Proceedings | 2012|Keywords: Extreme ultraviolet lithography -
Out-of-band insensitive polymer-bound PAG for EUV resist [8322-33]
British Library Conference Proceedings | 2012|Keywords: Extreme ultraviolet lithography -
EUV mask line edge roughness [8322-23]
British Library Conference Proceedings | 2012|Keywords: Extreme ultraviolet lithography -
Line width roughness control for EUV patterning [8322-117]
British Library Conference Proceedings | 2012|Keywords: Extreme ultraviolet lithography -
Coat-develop track process for inorganic EUV resist [8322-67]
British Library Conference Proceedings | 2012|Keywords: Extreme ultraviolet lithography -
EUV OPC for the 20-nm node and beyond [8322-57]
British Library Conference Proceedings | 2012|Keywords: Extreme ultraviolet lithography -
The SEMATECH Berkeley MET: demonstration of 15-nm half-pitch in chemically amplified EUV resist and sensitivity of EUV resists at 6.x-nm [8322-37]
British Library Conference Proceedings | 2012|Keywords: Extreme ultraviolet lithography -
High sensitivity chemically amplified EUV resists through enhanced EUV absorption [8322-28]
British Library Conference Proceedings | 2012|Keywords: Extreme ultraviolet lithography -
Quantification of shot noise contributions to contact hole local CD nonuniformity [8322-21]
British Library Conference Proceedings | 2012|Keywords: Extreme ultraviolet lithography -
Mirror contamination and secondary electron effects during EUV reflectivity analysis [8322-81]
British Library Conference Proceedings | 2012|Keywords: Extreme ultraviolet lithography
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