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Pulse length dependence of a reactive high power impulse magnetron (HiPIMS) discharge
Free accessIOP Institute of Physics | 2023| -
CuFeO2 prepared by electron cyclotron wave resonance-assisted reactive HiPIMS with two magnetrons and radio frequency magnetron sputtering
Free accessAmerican Institute of Physics | 2023| -
Deposition of tungsten oxide films by reactive magnetron sputtering on different substrates
Free accessAmerican Institute of Physics | 2022| -
Copper tungsten oxide (CuxWOy) thin films for optical and photoelectrochemical applications deposited by reactive high power impulse magnetron co-sputtering
Free accessAmerican Institute of Physics | 2022| -
Pressure dependence of singly and doubly charged ion formation in a HiPIMS discharge
American Institute of Physics | 2019| -
In-situ impedance spectroscopy of a plasma-semiconductor thin film system during reactive sputter deposition
American Institute of Physics | 2019| -
Photo-electrochemical stability of copper oxide photocathodes deposited by reactive high power impulse magnetron sputtering
British Library Online Contents | 2019| -
Floating harmonic probe for diagnostic of pulsed discharges
British Library Online Contents | 2019| -
Fe-Ti alloy layer plasma deposition – Monitoring of plasma parameters and properties of deposited alloys, anodization and photoelectrochemical characterization
British Library Online Contents | 2018| -
Measurement and modeling of plasma parameters in reactive high-power impulse magnetron sputtering of Ti in Ar/O2 mixtures
American Institute of Physics | 2017| -
Angular dependence of plasma parameters and film properties during high power impulse magnetron sputtering for deposition of Ti and TiO2 layers
American Institute of Physics | 2017| -
Enhanced oxidation of TiO2 films prepared by high power impulse magnetron sputtering running in metallic mode
American Institute of Physics | 2017|
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