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0.11-mum imaging in KrF lithography using dipole illumination [4404-35]
British Library Conference Proceedings | 2001| -
0.12-mum logic process using a 248-nm step-and-scan system [3999-29]
British Library Conference Proceedings | 2000| -
0.13-/0.15-mum production reticle process window qualification procedure for 200-mm manufacturing fab [5446-10]
British Library Conference Proceedings | 2004| -
0.13-mum optical lithography for random logic devices using 248-nm attenuated phase-shifting masks [4000-10]
British Library Conference Proceedings | 2000| -
0.13μm BiCMOS emitter window lithography with KrF scanners [7274-107]
British Library Conference Proceedings | 2009| -
0.15-m pattern formation using cell projection electron-beam direct writing with variable shot size [3048-02]
British Library Conference Proceedings | 1997| -
0.18μm CMOS inductorless AGC amplifier with 50dB input dynamic range for 10GBase-LX4 ethernet [7363-28]
British Library Conference Proceedings | 2009| -
0.18-m gate length CMOS devices with N + polycide gate for 2.5-V application [3212-25]
British Library Conference Proceedings | 1997| -
0.18-m lithography strategies: 248-nm DUV step-and-scanner and advanced chemical amplified resist [3679-100]
British Library Conference Proceedings | 1999|
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