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Ion-beam-induced silicidation and its use in very-large-scale integration processing
National licenceElsevier | 1986| -
Comparative study between gas‐ and liquid‐phase silylation for the diffusion‐enhanced silylated resist process
American Institute of Physics | 1991| -
Optical Lithography Techniques of 0.25m and Below: CD Control Issues (Invited)
British Library Conference Proceedings | 1995| -
Use of positive and negative chemically amplified resists in electron-beam direct-write lithography
British Library Conference Proceedings | 1995| -
Process Development of a 0.7/0.5 M DLM/TLM Process for CMOS Prototyping
British Library Conference Proceedings | 1992| -
Dry development of surface imaging resists: a major parameter for process optimization
Tema Archive | 1992| -
Optical Lithography Techniques for 0.25 Micron and Below
British Library Conference Proceedings | 1994|
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