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Synonyms were used for: Chemistry
Search without synonyms: International Journal of New Chemistry
Used synonyms:
- allgemeine chemie
- chemie
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X-ray and electron spectroscopy of (photo)electrocatalysts: Understanding activity through electronic structure and adsorbate coverage
American Institute of Physics | 2021|of (photo)electrocatalysis-relevant publications utilizing each of these techniques. Our objective is to provide those new to x-ray and ... -
Surface and bulk characterization of reservoir and cap-rocks: Past, present, and future
American Institute of Physics | 2020|governed by reactions at the interfaces of the reservoir and cap-rocks and are controlled by the complex chemistry and pore structures of rocks ... -
An electron impact emission spectroscopy flux sensor for monitoring deposition rate at high background gas pressure with improved accuracy
American Institute of Physics | 2008|processes for the fabrication of multicomponent thin film materials including the high-efficiency copper-indium-gallium-diselenide photovoltaic ...Keywords: PAPERS FROM THE 54TH INTERNATIONAL SYMPOSIUM OF AVS -
Deposition rates of high power impulse magnetron sputtering: Physics and economics
American Institute of Physics | 2010|Deposition by high power impulse magnetron sputtering (HIPIMS) is considered by some as the new paradigm of advanced sputtering
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Application-driven development of plasma source technology
American Institute of Physics | 2003|-frequency helicon source. We then introduce the important and relatively new issues of control of the ion energy distribution function and the ... -
Global plasma simulations using dynamically generated chemical models
American Institute of Physics | 2008|chemical models in a global plasma simulation to enable rapid testing and evaluation of new plasmas is presented. A global plasma model ...Keywords: PAPERS FROM THE 54TH INTERNATIONAL SYMPOSIUM OF AVS -
Synthesis of diamondlike carbon films with superlow friction and wear properties
American Institute of Physics | 2000|In this study, we introduce a new diamondlike carbon (DLC) film providing a friction coefficient of 0.001 and wear rates of
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History of atomic layer deposition and its relationship with the American Vacuum Society
American Institute of Physics | 2013|quickly organize the ALD community and create a primary conference home. Many new research areas have grown out of the original concepts of ... -
Progress in spectroscopic ellipsometry: Applications from vacuum ultraviolet to infrared
American Institute of Physics | 2003|promoting a new range of possible applications. For example, the VUV spectral region is capable of characterizing lithographic materials for 157 nm ...Keywords: PAPERS FROM THE 49TH INTERNATIONAL SYMPOSIUM OF THE AVS -
Area-selective molecular layer deposition of nylon 6,2 polyamide: Growth on carbon and inhibition on silica
American Institute of Physics | 2021|amorphous carbon (aC) hard masks. To maintain critical dimensions and tolerances of high-aspect-ratio device structures, new carbonaceous materials ... -
Optical radiation selective photodetectors based on III nitrides
American Institute of Physics | 2008|Wide direct band gap III nitride materials have opened up many new optoelectronic applications because they allow access to a very wide
...Keywords: PAPERS FROM THE 54TH INTERNATIONAL SYMPOSIUM OF AVS -
Photo-induced surface functionalization of carbon surfaces: The role of photoelectron ejection
American Institute of Physics | 2008|often requires controlling the surface chemistry to incorporate recognition moieties or reactive centers. The high stability of carbon also ... -
Electron beam-induced etching of SiO2, Si3N4, and poly-Si assisted by CF4/O2 remote plasma
American Institute of Physics | 2023|Electron-stimulated etching of surfaces functionalized by remote plasma is a flexible and novel approach for material removal. In
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Exploration of the nonideal behavior observed in engineered, multilayer MgO/Ag/MgO photocathodes
American Institute of Physics | 2021|particle accelerator performance, expanding the reach of both fundamental and applied science. Materials science expertise is needed to design new ... -
Rotary reactor for atomic layer deposition on large quantities of nanoparticles
American Institute of Physics | 2007|agitation during static ALD reactant exposures. In the design of this new reactor, a cylindrical drum with porous metal walls was positioned inside ... -
Quasiatomic layer etching of silicon oxide selective to silicon nitride in topographic structures using fluorocarbon plasmas
American Institute of Physics | 2017|The precision etch of dielectric materials (SiO2, Si3N4) in self-aligned contacts and self-aligned
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Practical guide for curve fitting in x-ray photoelectron spectroscopy
Free accessAmerican Institute of Physics | 2020|increased use has not been matched by the expertise of the new users, and the erroneous application of curve fitting has contributed to ambiguity ... -
Significance of plasma-photoresist interactions for atomic layer etching processes with extreme ultraviolet photoresist
American Institute of Physics | 2020|semiconductor devices. The commercial viability of this new lithographic technique requires compatible photoresist (PR) materials that satisfy both the ... -
History of industrial and commercial ion implantation 1906–1978
American Institute of Physics | 2000|semiconductor technology to travel the International Technology Roadmap for Semiconductors, where microns of junction depths in the mid-1960’s are now ... -
Plasma research activities in the association of super-advanced electronics technologies
American Institute of Physics | 1998|oxide etching in high aspect ratio, narrow contact holes, and will develop a new chemistry, a new plasma source, and a new monitoring method. ...
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