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Synonyms were used for: Molekülphysik
Search without synonyms: keywords:(Molekülphysik)
Used synonyms:
- molecular physics
- molecules
- molekularphysik
-
Pattern profile control of polysilicon plasma etching
American Institute of Physics | 1985|Keywords: HYDROGEN MOLECULES -
In situ monitoring of GaAs etched with a Cl2/Ar discharge in an electron cyclotron resonance source
American Institute of Physics | 1995|Keywords: CHLORINE MOLECULES -
Influence of hydrogen evolution from plasma‐deposited silicon nitride on underlying aluminum deformations
American Institute of Physics | 1993|Keywords: HYDROGEN MOLECULES -
Anisotropic etching of Al by a directed Cl2 flux
American Institute of Physics | 1986|Keywords: CHLORINE MOLECULES -
Mass spectrometric studies of plasma etching of silicon nitride
American Institute of Physics | 1985|Keywords: NITROGEN MOLECULES -
Effects of Ar+ angle of incidence on the etching of Si with Cl2 and low‐energy Ar+ ions
American Institute of Physics | 1987|Keywords: CHLORINE MOLECULES -
Rapid thermal oxidation of Si using a mixture of N2O and O2 at various partial pressure of N2O
American Institute of Physics | 1996|Keywords: OXYGEN MOLECULES -
Photochemistry at adsorbate–metal interfaces: Issues and examples
American Institute of Physics | 1992|Keywords: OXYGEN MOLECULES -
Electrostatic probe analysis of microwave plasmas used for polymer etching
American Institute of Physics | 1987|Keywords: OXYGEN MOLECULES -
Reactive ion beam etching of polyimide thin films
American Institute of Physics | 1988|Keywords: OXYGEN MOLECULES -
Ion beam assisted etching of SiO2 and Si3N4
American Institute of Physics | 1988|Keywords: HYDROGEN MOLECULES -
Reactive ion etching of GaAs, AlGaAs, and GaSb in Cl2 and SiCl4
American Institute of Physics | 1990|Keywords: CHLORINE MOLECULES -
Effects of Cl incorporation during Si oxidation
American Institute of Physics | 1994|Keywords: CHLORINE MOLECULES -
Identification of the volatile reaction products of the Cl2+GaAs etching reaction
American Institute of Physics | 1993|Keywords: CHLORINE MOLECULES -
A simple model of the chemically assisted ion beam etching yield of GaAs with Cl2 at medium current densities
American Institute of Physics | 1990|Keywords: CHLORINE MOLECULES -
Si surface study after Ar ion‐assisted Cl2 etching
American Institute of Physics | 1986|Keywords: CHLORINE MOLECULES -
Comparison of etching processes of silicon and germanium in SF6–O2 radio‐frequency plasma
American Institute of Physics | 1995|Keywords: OXYGEN MOLECULES -
Electron beam induced modification of GaAs surfaces for maskless thermal Cl2 etching
American Institute of Physics | 1990|Keywords: CHLORINE MOLECULES -
Laser‐induced reactions of semiconductor surfaces
American Institute of Physics | 1992|Keywords: CHLORINE MOLECULES -
The significance of reactive ions and reactive neutrals in ion‐beam‐assisted etching
American Institute of Physics | 1985|Keywords: CHLORINE MOLECULES -
High‐resolution fabrication process for silicon ion masks
American Institute of Physics | 1988|Keywords: BROMINE MOLECULES -
Selective reactive ion etching of GaAs on AlGaAs using CCl2F2 and He
American Institute of Physics | 1988|Keywords: CHLORINE MOLECULES -
Ultraviolet laser‐induced interaction of Cl2 with GaAs(110)
American Institute of Physics | 1992|Keywords: CHLORINE MOLECULES -
Self‐aligned TiSi2 for bipolar applications
American Institute of Physics | 1985|Keywords: HYDROGEN MOLECULES -
Studies on the mechanism of chemical sputtering of silicon by simultaneous exposure to Cl2 and low‐energy Ar+ ions
American Institute of Physics | 1985|Keywords: CHLORINE MOLECULES -
Semiconductor damage from inert and molecular gas plasmas
American Institute of Physics | 1992|Keywords: OXYGEN MOLECULES -
Electron‐beam lithography and chemically assisted ion beam etching for the fabrication of grating surface‐emitting broad‐area AlGaAs lasers
American Institute of Physics | 1990|Keywords: CHLORINE MOLECULES -
Angular dependence of etching yield of single crystal Si in Cl2 reactive ion beam etching
American Institute of Physics | 1985|Keywords: CHLORINE MOLECULES -
Chlorine surface interaction and laser‐induced surface etching reactions
American Institute of Physics | 1985|Keywords: CHLORINE MOLECULES -
Characterization of photochemical processing
American Institute of Physics | 1985|Keywords: HYDROGEN MOLECULES -
Patterned, photon‐driven cryoetching of GaAs and AlGaAs
American Institute of Physics | 1995|Keywords: CHLORINE MOLECULES -
Oxide formation on GaAs exposed to CF4+O2 plasma
American Institute of Physics | 1985|Keywords: OXYGEN MOLECULES -
Photoemission study of oxygen adsorption on ternary silicides
American Institute of Physics | 1992|Keywords: OXYGEN MOLECULES -
Effect of wafer temperature during plasma exposure on charging damage
American Institute of Physics | 1996|Keywords: OXYGEN MOLECULES -
An investigation of CH4/H2 reactive ion etching damage to thin heavily doped GaAs metal–semiconductor field effect transistor layers during gate recessing
American Institute of Physics | 1990|Keywords: HYDROGEN MOLECULES -
On the possibility of MBE growth interface modification by hydrogen
American Institute of Physics | 1983|Keywords: hydrogen molecules -
Above‐bandgap optical anisotropies in the reflectance spectra of some cubic semiconductors
American Institute of Physics | 1985|Keywords: BROMINE MOLECULES -
Reduction of arsenic oxide contamination in molecular beam epitaxy vacuum chambers
American Institute of Physics | 1984|Keywords: hydrogen molecules -
Thermodynamics of the homogeneous and heterogeneous decomposition of trimethylaluminum, monomethylaluminum, and dimethylaluminumhydride: Effects of scavengers and ultraviolet‐laser photolysis
American Institute of Physics | 1991|Keywords: HYDROGEN MOLECULES -
Photo‐metal organic vapor phase epitaxy: A low temperature method for the growth of CdxHg1−xTe
American Institute of Physics | 1985|Keywords: HYDROGEN MOLECULES -
Ion beam etching of InGaAs, InP, GaAs, Si, and Ge
American Institute of Physics | 1986|Keywords: OXYGEN MOLECULES
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