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Modelling MOSFET gate length variability for future technology nodes
British Library Conference Proceedings | 2008| -
Modelling MOSFET gate length variability for future technology nodes
British Library Online Contents | 2008| -
Material and process effects on line-edge-roughness of photoresists probed with a fast stochastic lithography simulator
American Institute of Physics | 2005| -
Monte Carlo study of surface and line-width roughness of resist film surfaces during dissolution
British Library Online Contents | 2005| -
Modelling and evaluation of a thermal microfluidic sensor fabricated on plastic substrate
Springer Verlag | 2011| -
Modelling and evaluation of a thermal microfluidic sensor fabricated on plastic substrate
Online Contents | 2011| -
Modelling and evaluation of a thermal microfluidic sensor fabricated on plastic substrate
Online Contents | 2011| -
Probabilistic gel formation theory in negative tone chemically amplified resists used in optical and electron beam lithography
American Institute of Physics | 2002| -
Effects of model polymer chain architectures and molecular weight of conventional and chemically amplified photoresists on line-edge roughness. Stochastic simulations
British Library Conference Proceedings | 2006| -
Fractals and device performance variability: The key role of roughness in micro and nanofabrication
British Library Online Contents | 2012| -
Modelling and evaluation of a thermal microfluidic sensor fabricated on plastic substrate
British Library Online Contents | 2012| -
Material and process effects on line-edge-roughness of photoresists probed with a fast stochastic lithography simulator
British Library Online Contents | 2005| -
Detailed resist film modeling in stochastic lithography simulation for line-edge roughness quantification
British Library Online Contents | 2010| -
Probabilistic gel formation theory in negative tone chemically amplified resists used in optical and electron beam lithography
British Library Online Contents | 2002|
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