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SOLVENT ANNEAL PROCESSING FOR DIRECTED-SELF-ASSEMBLY APPLICATIONS
Free accessEuropean Patent Office | 2015| -
PREDICTING ACROSS WAFER SPIN-ON PLANARIZATION OVER A PATTERNED TOPOGRAPHY
Free accessEuropean Patent Office | 2021| -
Systems and methods to monitor particulate accumulation for bake chamber cleaning
Free accessEuropean Patent Office | 2022| -
Predicting across wafer spin-on planarization over a patterned topography
Free accessEuropean Patent Office | 2022| -
SYSTEMS AND METHODS TO MONITOR PARTICULATE ACCUMULATION FOR BAKE CHAMBER CLEANING
Free accessEuropean Patent Office | 2021| -
Method of evaluating aligned patterns in directed self-assembly and using in feedback control scheme
Free accessEuropean Patent Office | 2017| -
METHODS AND SYSTEMS TO MONITOR, CONTROL, AND SYNCHRONIZE DISPENSE SYSTEMS
Free accessEuropean Patent Office | 2021| -
METHODS AND SYSTEMS TO MONITOR, CONTROL, AND SYNCHRONIZE DISPENSE SYSTEMS
Free accessEuropean Patent Office | 2021| -
METHODS AND SYSTEMS TO MONITOR, CONTROL, AND SYNCHRONIZE DISPENSE SYSTEMS
Free accessEuropean Patent Office | 2021| -
System and method of planarization control using a cross-linkable material
Free accessEuropean Patent Office | 2022| -
SYSTEM AND METHOD OF PLANARIZATION CONTROL USING A CROSS-LINKABLE MATERIAL
Free accessEuropean Patent Office | 2021| -
Mitigation of EUV shot noise replicating into acid shot noise in photo-sensitized chemically-amplified resist (PS-CAR)
Free accessEuropean Patent Office | 2017| -
Subtractive methods for creating dielectric isolation structures within open features
Free accessEuropean Patent Office | 2019| -
METHODS FOR SENSITIZING PHOTORESIST USING FLOOD EXPOSURES
Free accessEuropean Patent Office | 2019|
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