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Towards 0.5 nm EOT Scaling of HfO~2/Metal Electrode Gate Stacks
British Library Conference Proceedings | 2004| -
Subnanometer Scaling of HfO~2/Metal Electrode Gate Stacks
Online Contents | 2004|Contributors: Gutt, J. -
Patchiness of the megabenthos at small scales: ecological conclusions by examples from polar shelves
British Library Online Contents | 2003| -
High-k gate stacks for planar, scaled CMOS integrated circuits
British Library Online Contents | 2003| -
Pathways for advanced transistors using hafnium-based oxides by Atomic Layer Deposition
British Library Conference Proceedings | 2003| -
HiK3_1 Invited: EOT Scaling and Device Issues for High-k Gate Dielectrics
British Library Conference Proceedings | 2003| -
Effect of Deposition Sequence and Plasma Treatment on ALCVD HfO~2 n-MOSFET Properties
British Library Conference Proceedings | 2003| -
Improved Scalability of High-K Gate Dielectrics by using Hf-Aluminates
British Library Conference Proceedings | 2003| -
The Antarctic ice shelf: an extreme habitat for notothenioid fish
British Library Online Contents | 2002| -
Improved Scalability of High-k Gate Dielectrics by using Hf-Aluminates
British Library Conference Proceedings | 2002| -
Effect of Deposition Sequence and Plasma Treatment on ALCVD HfO~2 n-MOSFET Properties
British Library Conference Proceedings | 2002| -
On the direct impact of ice on marine benthic communities, a review
British Library Online Contents | 2001| -
Quantification of iceberg impact and benthic recolonisation patterns in the Weddell Sea (Antarctica)
British Library Online Contents | 2001|
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