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Damaged silicon contact layer removal using atomic layer etching for deep-nanoscale semiconductor devices
American Institute of Physics | 2013|Keywords: CF4 -
One‐Step Formation of a Single Atomic‐Layer Transistor by the Selective Fluorination of a Graphene Film
Wiley | 2014|Keywords: CF4 plasma -
Relationship between gas-phase chemistries and surface processes in fluorocarbon etch plasmas: A process rate model
American Institute of Physics | 2009|Keywords: CF4 -
Plasma etching of polydimethylsiloxane: Effects from process gas composition and dc self-bias voltage
American Institute of Physics | 2011|Keywords: CF4 -
Characteristic comparison of AlGaN/GaN enhancement-mode HEMTs with CHF3 and CF4 surface treatment
American Institute of Physics | 2012|Keywords: CF4 -
Effect of CF4 concentration on the discharge dynamics and reactive species distribution of atmospheric nanosecond pulsed He plasma jet
IOP Institute of Physics | 2023|Keywords: CF4 -
Characterization of gaseous species in scanning atmospheric rf plasma with transmission infrared spectroscopy
American Institute of Physics | 2008|Keywords: CF4 -
Mechanisms of hydrophobization of polymeric composites etched in CF4 plasma
Wiley | 2017|Keywords: CF4 plasma -
Role of chamber dimension in fluorocarbon based deposition and etching of and its effects on gas and surface-phase chemistry
American Institute of Physics | 2008|Keywords: CF4 -
Electron power absorption mode transition in capacitively coupled Ar/CF4 discharges: hybrid modeling investigation
IOP Institute of Physics | 2022|Keywords: Ar/CF4 -
Chemistry in long residence time fluorocarbon plasmas
American Institute of Physics | 2009|Keywords: tetrafluoromethane—CF4 -
Differences in erosion mechanism and selectivity between Ti and TiN in fluorocarbon plasmas for dielectric etch
American Institute of Physics | 2012|Keywords: CF4 -
Etching properties of Na0.5K0.5NbO3 thin films by using inductively coupled CF4/Ar plasma
Elsevier | 2013|Keywords: CF4/Ar -
Promoted CF4 Decomposition via Enhanced Tricoordinated Al Active Sites
American Chemical Society | 2024|Keywords: CF4 decomposition -
Plasma treatment of polymethyl methacrylate to improve surface hydrophilicity and antifouling performance
Wiley | 2021|Keywords: O2/CF4 plasma -
Origin of electrical signals for plasma etching end point detection: Comparison of end point signals and electron density
American Institute of Physics | 2012|Keywords: tetrafluoromethane (CF4) -
The current pulses characteristics of the negative corona discharge in SF6/CF4 mixtures
IOP Institute of Physics | 2023|Keywords: SF6/CF4 mixtures -
Experimental measurements and thermodynamic modelling of hydrate phase equilibrium conditions for CF4+TBAB aqueous solutions
Taylor & Francis Verlag | 2020|Keywords: CF4
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