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Quantitative determination of electric and magnetic second-order susceptibility tensors of chiral surfaces
British Library Online Contents | 1997| -
Stabilization of ambient sensitive atomic layer deposited lanthanum aluminates by annealing and in situ capping (3 pages)
British Library Online Contents | 2011| -
Impact of Precursor Chemistry and Process Conditions on the Scalability of ALD HfO~2 Gate Dielectrics
British Library Online Contents | 2010| -
Impact of Hf content on negative bias temperature instabilities in HfSiON-based gate stacks
British Library Online Contents | 2005| -
Scalability of RuTiN barriers deposited by plasma-enhanced atomic layer deposition for advanced interconnects
British Library Online Contents | 2014| -
Second-harmonic generation reveals the oxidation steps in semiconductor processing (6 pages)
British Library Online Contents | 2012| -
5.5 Negative Bias Temperature Instabilities in HfSiON/TaN-Based pMOSFETs
British Library Conference Proceedings | 2004| -
Silicate formation and thermal stability of ternary rare earth oxides as high- dielectrics
American Institute of Physics | 2008| -
[Co/Ni]-CoFeB hybrid free layer stack materials for high density magnetic random access memory applications
American Institute of Physics | 2016|
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