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Spectroscopic measuring apparatus and method, and method for fabricating semiconductor device using the measuring method
Free accessEuropean Patent Office | 2022| -
SPECTROSCOPIC MEASURING APPARATUS AND METHOD, AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE USING THE MEASURING METHOD
Free accessEuropean Patent Office | 2022| -
Microsphere-assisted, nanospot, non-destructive metrology for semiconductor devices
Free accessSpringer Verlag | 2022| -
Microsphere-assisted ultra-small spot spectral reflectometry technique for semiconductor device metrology
British Library Conference Proceedings | 2021| -
FOCUS CONTROL METHOD FOR SPECTROSCOPIC MEASURING APPARATUS, INSPECTION METHOD FOR SEMICONDUCTOR DEVICE, AND SPECTROSCOPIC MEASURING APPARATUS FOR PERFORMING THE SAME
Free accessEuropean Patent Office | 2024| -
Microsphere-assisted hyperspectral imaging: super-resolution, non-destructive metrology for semiconductor devices
Free accessSpringer Verlag | 2024|
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