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Deposition of amorphous silicon films from an electrostatically confined silane plasma
National licenceElsevier | 1987| -
Distribution of electron energy in an electrostatically confined silane plasma
National licenceAmerican Institute of Physics | 1988| -
Hydrogenated amorphous silicon films obtained by a low pressure DC glow discharge
Tema Archive | 1988| -
Hydrogenated amorphous silicon films obtained by a low pressure dc glow discharge
Tema Archive | 1988| -
Hydrogenated amorphous silicon films obtained by a low pressure dc glow discharge
National licenceSpringer Verlag | 1988| -
Hydrogenated amorphous silicon films obtained by a low pressure dc glow discharge
Online Contents | 1988| -
Influence of the technological parameters on the growth of a-Si:H by a low pressure d.c. plasma process
National licenceElsevier | 1990| -
Limited proteolysis of tubulin by subtilisin induces ring formation
American Institute of Physics | 1991| -
Equilibrium and nonequilibrium gap-state distribution in amorphous silicon
British Library Online Contents | 1993| -
Equilibrium and nonequilibrium gap-state distribution in amorphous silicon
National licenceAmerican Physical Society | 1993| -
Structure of a-Si: H/a-Si~1~-~xC~x: H multilayers deposited in a reactor with automated substrate holder
British Library Online Contents | 1993| -
On the determination of the interface density of states in a-Si:H/a-Si~1~-~xC~x:H multilayers
British Library Conference Proceedings | 1993| -
Fast Degradation with Pulsed Light of a-Si:H P-I-N Photodiodes
British Library Conference Proceedings | 1993|
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